-
Supplier: Titan Tool Supply, Inc.
Description: The Z Axis Vertical Measuring Displacement Microscope was designed to measure minute variations in height that do not lend themselves to mechanical means. It is proven to be ideally suited to many applications in the electronics industry. In the semiconductor field measurement
- Eyepiece Style: Monocular
- Grade: Benchtop
- Total Magnification: 50 to 400 X
-
Supplier: Titan Tool Supply, Inc.
Description: Extra 10X, 20X & 40X Objectives Available Optional 20X Eyepiece Available The Z Axis Depth Measuring Displacement Microscope was designed to measure minute variations in height that do not lend themselves to mechanical means. It is proven to be ideally
- Eyepiece Style: Monocular
- Resolution: 400 to 600 nm
- Total Magnification: 100 to 400 X
-
Supplier: Titan Tool Supply, Inc.
Description: The Z Axis Depth Measuring Displacement Microscope was designed to measure minute variations in height that do not lend themselves to mechanical means. It is proven to be ideally suited to many applications in the electronics industry. In the semiconductor field
- Eyepiece Style: Monocular
- Grade: Benchtop
- Total Magnification: 100 to 400 X
-
-
Supplier: Titan Tool Supply, Inc.
Description: & Pinion focusing, three objective lenses revolving nosepiece with a positive stop, depth measuring attachment with a zeroing screw and many other advantageous features. Microscope Details & Specs The TM-8 and TM-10 Toolmakers High Magnification Microscopes as purchased
- Eyepiece Style: Monocular
- Grade: Benchtop
- Mechanical Stage: Yes
- Total Magnification: 10 to 400 X
-
Supplier: Edmund Optics Inc.
Description: Depth Measurements (up to 22mm) Removable Clear Acrylic Base Peaks stand microscopes are high-power instruments for precision measurement. An adjustable eyepiece controls the focus of the reticle while a separate ring controls the orientation of the reticle by
- Application: Measuring / Toolmaker
- Total Magnification: 75 X
-
Supplier: Edmund Optics Inc.
Description: Depth Measurements (up to 22mm) Removable Clear Acrylic Base Peaks stand microscopes are high-power instruments for precision measurement. An adjustable eyepiece controls the focus of the reticle while a separate ring controls the orientation of the reticle by
- Application: Measuring / Toolmaker
- Total Magnification: 50 X
-
Supplier: Edmund Optics Inc.
Description: Depth Measurements (up to 22mm) Removable Clear Acrylic Base Peaks stand microscopes are high-power instruments for precision measurement. An adjustable eyepiece controls the focus of the reticle while a separate ring controls the orientation of the reticle by
- Application: Measuring / Toolmaker
- Total Magnification: 100 X
-
Supplier: Edmund Optics Inc.
Description: Depth Measurements (up to 22mm) Removable Clear Acrylic Base Peaks stand microscopes are high-power instruments for precision measurement. An adjustable eyepiece controls the focus of the reticle while a separate ring controls the orientation of the reticle by
- Application: Measuring / Toolmaker
- Total Magnification: 25 X
-
Supplier: KEYENCE
Description: ,800x magnification 0.5 nanometer Z-axis resolution on almost any material High-resolution, large depth-of-field observation Profile and roughness measurements with zero sample preparation Measures thickness and uniformity of clear layers No data loss - even on steep angles Perform
- Digital Display: Yes
- Grade: Benchtop
- Mechanical Stage: Yes
- Microscope Type: Laser / Confocal
-
Supplier: Unitron Ltd.
Description: Portable depth measuring
- Digital Display: Yes
- Eyepiece Style: Monocular
- Fine Focus: Yes
- Grade: Benchtop
-
Supplier: Phenom-World BV
Description: and nano fiber samples. Recent developments have enabled us to extend the range of measurements of the Fibermetric application to provide even more in-depth information. It is possible to measure and analyse complicated fiber structures, ranging from spunbond and electrospun fibers to
- Measurement Type: Shape, Size
- Particle Size Range: 0.1000 to 40 µm
- Sample Type: Specialty / Other
- Technology / Operating Principle: Microscopy / Image Analysis
-
Supplier: RS Components, Ltd.
Description: depth of field. In addition, only minor refocussing at the zoom enlargement is needed. Another feature of this variable and simultaneously robust microscope is the stable and precisely adjustable mechanism. The large working surface offers the best possible ease of use. Optimally
- Total Magnification: 1.8 to 6.5 X
-
Supplier: Park Systems, Inc.
Description: Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becoming an essential tool choice in applications involving surface roughness, trench width,
- Application: Semiconductor Inspection
- Digital Display: Yes
- Grade: Benchtop
- Image Analysis Processing Software: Yes
-
Supplier: Nikon Metrology
Description: The iNEXIV VMA series CNC video measuring system offers the ultimate in usability for automatic measuring of various 3D components with a large FOV, long working distance and wide XYZ stroke. Suitable for large samples (450 x 400 x 200 mm or larger) and simultaneous measurement of
- Applications / Capabilities: Electronics or Semiconductor Inspection
- Image Source: Optical Microscope
- System Type: Turnkey / Complete System
-
Supplier: Alliance Calibration
Description: Our certified calibration technicians have decades of experience in calibration CMM's and Optical Comparators. Don't take the risk of using inexperienced technicians on these expensive machines. You can depend on Alliance Calibration to posses the depth of knowledge necessary to calibrate
- Equipment Expertise: Coordinate Measuring Machines (CMM), Dimensional Gages / Instruments, Hardness Testers, Microscopes / Optical Instruments, Video / Imaging Equipment, Specialty / Other
- Location: North America, United States Only, Midwest US Only
- Services Offered: Bench (Off-site), Field / On-site, Calibration Service, Calibration Documentation, Online Documentation, Installation / Start-up, Troubleshooting
-
Supplier: CSA Group
Description: , - too low visual contrast between the coating and substrate, and - film thicknesses that are larger than the depth of field of the measuring microscope.
-
Supplier: Shimadzu Scientific Instruments, Inc.
Description: Convenient, Accurate Micro Hardness Measurements Shimadzu’s HMV-G series of Micro Hardness Testers determine hardness by indenting a material and then measuring the size of the resulting indentation. Systems range from standalone models with manual stage movement and indentation
- Hardness Testers: Brinell, Vickers and Knoop
- Mounting: Fixtured or Permanent
- Test Method: Micro
-
Supplier: ASTM International
Description: central illumination), 1.1.1.2 Apparent depth of microscope focus (the method of the Duc de Chaulnes), 1.1.1.3 Critical Angle Refractometers (Abbe type and Pulfrich type), 1.1.1.4 Metricon2 system, 1.1.1.5 Vee-block refractometers, 1
-
Supplier: ASTM International
Description: illumination), Apparent depth of microscope focus (the method of the Duc de Chaulnes), Critical Angle Refractometers (Abbe type and Pulfrich type), Metricon system, Vee-block refractometers, Prism spectrometer, and Specular reflectance. 1.1.2 Test methods
-
Supplier: ASTM International
Description: (method of central illumination), 1.1.1.2 Apparent depth of microscope focus (the method of the Duc de Chaulnes), 1.1.1.3 Critical Angle Refractometers (Abbe type and Pulfrich type), 1.1.1.4 Metricon2 system, 1.1.1.5 Vee-block refractometers
-
Supplier: ASTM International
Description: central illumination), 1.1.1.2 Apparent depth of microscope focus (the method of the Duc de Chaulnes), 1.1.1.3 Critical Angle Refractometers (Abbe type and Pulfrich type), 1.1.1.4 Metricon2 system, 1.1.1.5 Vee-block refractometers
Find Suppliers by Category Top
Conduct Research Top
-
Designing Atmospheric-Pressure Plasma Sources for Surface Engineering of Nanomaterials
nonuniformities. necessary for DEP, as opposed to the electrode. geometry required in traditional DEP [17-19]. Since these. insulating structures typically traverse the entire depth of. the channel, a greater area of the sample channel is affected. by the gradient of the inner product of the electric
-
MSilica Nanoparticles Treated by Cold Atmospheric-Pressure Plasmas Improve the Dielectric Performance of Organic-Inorganic Nanocomposites
with the design. Then the exposed photoresist was removed using Potassium-based. buffered developer AZ 400K (AZ Electronic. Materials, Somerville, NJ, USA). Deep Reactive Ion Etching. (DRIE) was used to etch the silicon master stamp to a depth. of 50 mm. The scalloping effect, which is unfavorable
More Information Top
Indicates content that may require registration and/or purchase.
-
On the study of loop profiles in improving the sweep stiffness of wire bond
The overall length of wire bond is measured by a high-precision non-contact depth measuring microscope , Hisomet DH2, provided by Union Optical Co., Ltd.
-
Advanced Composite Materials
depth measuring microscope , and the surface topography was observed by 3D digit microscope.
-
Design of shrinkage microvalve in microchannel with hydrophilic and hydrophobic walls
The experimental results are recorded by MEIJI EMZ-TR ste- reoscopic microscope, Union DH2/IMH non-contact depth measurement microscope and Nikon Coolpix 4500 CCD camera.
-
A Si stencil mask for deep X-ray lithography fabricated by MEMS technology
The depth measurements of these holes were made with a high-precision non-contact depth measuring microscope .
-
Microfluidic devices for size-dependent separation of liver cells
However, the actual depths obtained with a depth measuring microscope (DH2, Union Optical Co. Ltd., Tokyo, Japan) were 37∼39 μm for Microdevice 1, and ∼29 μm for Microdevice 2.
-
CONTOUR forward imager on the Comet Nucleus Tour mission
After the CCD was assembled to its heatsink at APL, a depth measuring microscope was used determine the distance and tilt from the imaging surface to the shim interface locations.
-
Corning's approach to segment blank manufacturing for an extremely large telescope
Inclusions are inspected using index matching oil on the surface of the boule to make it transparent, a high intensity light to illuminate the glass and a depth measuring microscope to measure the depth and size of inclusions found in the material.
-
Corning: supplier of multiple optical materials for telescope projects
Index matching oil, high intensity light and a depth measuring microscope are used to locate and measure inclusions that are larger than 0.12mm (0.005”).
-
Review of Corning's capabilities for ULE mirror blank manufacturing for an extremely large telescope
Index matching oil, high intensity light and a depth measuring microscope are used to locate and measure inclusions that are larger than 0.12mm (0.005”).
-
Quarterly progress report, Metallurgy Research sub-section, April 1955--June 1955
penetrztion of the uranium into the aluminum i s measured directly with a depth measuring microscope .