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Supplier: Phenom-World BV
Description: that analyzes X-rays generated by the bombardment of the sample by an electron beam. EDS elemental analysis is fully embedded into the Phenom ProX system. X-ray detector and control software are combined in one package. This Elemental Identification (EID) software package allows
- Applications: Semiconductor Wafers, CVD / PVD Films, Packaged ICs / Ceramic Substrates
- Area Mapping: Yes
- Measurement Capability: Composition, Critical Dimension / Trench Geometry, Defects / ADC, Particle Contamination
- Mounting / Loading: Manual Loading
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Supplier: Edwards Vacuum
Description: The FC-4400A represents our largest scale design lift off oriented evaporation and our ultimate high throughput platform. This system is designed to support the metallization of thirty 6 inch wafers per load via high capacity e-beam evaporation. The load locked, 44 inch x 44 inch x 28
- Applications & Materials Processed: Research / Surface Analysis
- Gas Control Unit: Yes
- High Vacuum Pump Type: Cryogenic / Cryosorption
- Integral Process Controller: Yes
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Supplier: Edwards Vacuum
Description: The BJD-2000 & FC-2000 are our latest PVD tools for small production or R&D. These flexible evaporation systems accept a multitude of accessories to meet almost any requirement. The BJD-2000 is identical to the FC-2000 but without the load lock feature. Engineered for efficient
- Applications & Materials Processed: Research / Surface Analysis
- Coating System Type: Batch System (Single Chamber / Multiple Wafers)
- Gas Control Unit: Yes
- High Vacuum Pump Type: Cryogenic / Cryosorption
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Supplier: Edwards Vacuum
Description: The FC-3800, our latest large-scale evaporator, enables rapid processing of 6 inch diameter wafers for lift off and/or step coverage applications. In each load, this load lock system can coat twenty-five 6 inch diameter wafers for lift off or thirty-six 6 inch wafers for step coverage. The 38
- Applications & Materials Processed: Research / Surface Analysis
- Gas Control Unit: Yes
- High Vacuum Pump Type: Cryogenic / Cryosorption
- Integral Process Controller: Yes
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Supplier: Hiden Analytical
Description: Static and Dynamic SIMSAuger Electron SpectroscopyIon Beam SputteringSurface Science StudiesRastering / Depth Profiling
- Applications: Semiconductor Wafers, CVD / PVD Films
- Area Mapping: Yes
- Depth Profiling: Yes
- Measurement Capability: Defects / ADC
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Supplier: Edwards Vacuum
Description: The newly designed BCD-2800 provides an upgrade and improvement option for customers processing requirements formerly filled by our VES-2550 load lock evaporation system. This mid-sized system offers tooling options that support either lift off or conformal (step coverage) processes,
- Applications & Materials Processed: Research / Surface Analysis
- Coating System Type: Batch System (Single Chamber / Multiple Wafers)
- Gas Control Unit: Yes
- High Vacuum Pump Type: Cryogenic / Cryosorption
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are typical state-of-the-art narrowband pass filters from legacy deposition processes such as ion-assisted electron beam. Filters from 330 to >2000nm can be built to similar or even narrower specifications. Ultra-narrowband filters require extremely low extinction coefficients of the (read more)
Browse Optical Filters Datasheets for Alluxa, Inc.
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Characterisation of TiN and TiAlN thin films deposited on ground surfaces using focused ion beam milling
FIB cross-sections were used to examine TiN and dual- layer TiN/TiAlN coatings deposited on a number of ground steel substrates using a low voltage electron beam (LVEB) PVD system and a cathodic arc PVD process.
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ADVANCED GAS TURBINE SYSTEMS RESEARCH
All deposition experiments were performed in house using the electron - beam PVD system schematically depicted in Figure 2(a).
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Evaporation rate and composition monitoring of electron beam PVD processes
We believe that we are well along the path toward developinga practical, laser based Yapor rate and compositionmonitoring system for electron beam PVD .
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Porosity Effect on Surface Plasmon Resonance from Metallic Sculptured
Thin Films
CTFs of aluminum were deposited in an electron - beam evaporation system ( PVD -75, KJL Inc.).
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Porosity effect on surface plasmon resonance from metallic sculptured thin films
CTFs of aluminum were deposited in an electron - beam evaporation system ( PVD -75, KJL Inc.).
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NEDO Nano Coating Project: Outline and Achievements
An Electron Beam PVD (EB-PVD) system with substrate heating capability and a high-energy electron beam gun was provided with a number of targets.
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Proceedings of the 2nd International Conference on Intelligent Technologies and Engineering Systems (ICITES2013)
Ceria film was grown using an electron beam deposition (EB- PVD ) system with the influence of glancing angle deposition (GLAD) on crystal growth [7].
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Facile synthesis of Cr-decorated hexagonal Co3O4 nanosheets for ultrasensitive ethanol detection
The interdigital electrodes were then deposited on the Cr- decorated H-Co3O4 NS with an electron - beam evaporation deposition system ( PVD 75, Kurt J Lesker) at a background pressure of 7 × 10−6 torr with Au (100 nm)/Ti (5 nm) .
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Large-scale uniform Au nanodisk arrays fabricated via x-ray interference lithography for reproducible and sensitive SERS substrate
Afterwards, an Au layer was deposited upon the surface of Si wafer with PMMA nanohole template using electron - beam evaporation deposition system ( PVD 75, Kurt J Lesker) at a background pressure of 7 × 10−6 torr.
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Model-based control for semiconductor and advanced materials processing: an overview
Whether the system be electron - beam evaporative PVD , sputter PVD (Radio Frequency (RF) diode or magnetron sputtering), thermally evaporated PVD, or Molecular Beam Epitaxy (MBE), all involve transport of a non-reacting vapor from a source (e-beam, sputter target, etc.) to …