-
Supplier: Accuris
Description: Permanent Magnetic Chucks
-
Supplier: Industrial Magnetics, Inc.
Description: Manufactured with high power neodymium magnets Full magnetic surface to all edges - powerful holding over entire chuck surface Fine pole divisions - for more uniform magnetic holding of small parts Solid construction top plate - protects permanent magnetic pack
- Width: 6 to 12 inch
- Length: 12 to 24 inch
- Application: EDM, Grinding, Milling / Machining Center
- Features: Other Workholding
-
Supplier: Industrial Magnetics, Inc.
Description: area Neodymium magnetic system generating 30 % higher force compared to other micro pitch chucks Maximum work holding surface 100% active with no weak areas Very low magnetic field allowing easy disposal of grinding debris Low height allowing maximum wheel head clearance and
- Width: 4 to 12 inch
- Length: 7 to 24 inch
- Application: Grinding
- Features: Other Workholding
-
-
Supplier: Industrial Magnetics, Inc.
Description: These permanent magnetic chucks are designed using Neodymium magnets for milling applications. The dual Neodymium magnet pack generates an exceptionally high holding force on workpieces with an uneven or rough contact surface. Standard Features & Benefits: Double Neodymium
- Width: 6 to 12 inch
- Length: 10 to 24 inch
- Application: Milling / Machining Center
- Features: Other Workholding
-
Supplier: CS UNITEC
Description: • Ideal for industrial, construction, marine and mining applications • Hydraulic motor safe for underwater use • Drill structural steel and other metals • Stainless steel construction resists corrosion • Manually operated permanent magnet with ratchet control has holding strength of 1300 lbs.
- Weight: 48.5 lbs
- RPM: 0 to 630 rpm
- Pneumatic Motor Power: 1.5 HP
- Type: Inline
-
Supplier: Dexter Magnetic Technologies, Inc.
Description: applications including arc shaped magnets for motors, magnetic chucks and magnetic tools. The raw material - iron oxide - for these magnets is mixed with either strontium or barium and milled down to a fine powdered form. The powder is then mixed with a ceramic binder and
- Electrical Resistivity: 10 ohm-cm
- Max Use / Curie Temperature: 450 to 460 C
- Coeff. of Thermal Expansion (CTE): 7 to 15 µm/m-C
- Modulus of Elasticity: 24,656,262.6907235 psi
-
Supplier: Dexter Magnetic Technologies, Inc.
Description: applications including arc shaped magnets for motors, magnetic chucks and magnetic tools. The raw material - iron oxide - for these magnets is mixed with either strontium or barium and milled down to a fine powdered form. The powder is then mixed with a ceramic binder and
- Maximum Energy Product, BHmax: 1.1 to 4 MGOe
- Residual Induction, Br: 2.3 to 4.1 kilogauss
- Coercive Force, Hc: 2,000 to 3,600 Oersted
- Intrinsic Coercive Force, Hci: 2,500 to 4,800 Oersted
-
Supplier: Autotronics, Inc.
Description: both the TI-701 and TI-702 are explained on these two pages to give you the best usage of the instrument. Many applications are made possible by the attachment of a chuck or various adaptors. The Torque Indicator is shock resistant, non-magnetic, permanently calibrated and has built-in
-
Supplier: Spectral Dynamics, Inc.
Description: and nut assembly is furnished for typical sized stingers and several stingers are available as part of an accessory kit. The magnetic field is generated by an AlNiCo permanent magnet. The magnetic field is conducted to the desired air gap by building the shaker in the shape of a
- Peak Sinusoidal Force: 44.96 lbs
- Frequency Range: 4,500 Hz
- Displacement: 0.75590592 inch
- Peak Acceleration: 80 g
Find Suppliers by Category Top
Featured Products Top
-
The porous ceramic vacuum chuck is designed for high-stability wafer handling and precision processing. Its controlled micro-porous structure ensures uniform vacuum distribution, improving adhesion reliability and processing accuracy across semiconductor and (read more)
Browse Chucks Datasheets for Suntech Applied Materials (Hefei) Co.,Ltd -
Compact design for multiple clamping in limited space
(read more)
Browse Chucks Datasheets for Imao-Fixtureworks -
instability, high defect rates, and costly equipment adjustments in ion implantation, etching, and thin-film deposition processes. Our electrostatic chucks deliver high-density, durable, and customizable solutions that address (read more)
Browse Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
, contamination, deformation under high temperatures, and material wear. The Wafer Pin Silicon Carbide (SiC) Chuck addresses these challenges with a high-performance material and advanced design, ensuring wafers remain stable, clean, and accurately positioned during processing (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
Product Overview Used in plasma etch chambers, CVD systems, and PVD equipment for wafer clamping and backside gas cooling. Fountyl high-precision ring groove ceramic chucks feature machined concentric groove patterns on the wafer-facing surface. These grooves distribute (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
Semiconductor and precision manufacturing demand stable, flat, and contamination-free wafer handling, yet standard chucks often struggle with uniform adsorption, wear, and thermal stress. Inaccurate handling can (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
Durable and Precise Porous Ceramic Chuck for Semiconductor Processing (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
handling of fragile, ultra-thin wafers requires uniform contact force to eliminate stress concentrations. These specialized porous ceramic chucks are micro-engineered to deliver high-performance workholding with advanced material properties (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
High-purity alumina and aluminum nitride ceramic chucks, including porous ceramic chucks and electrostatic chucks (E-Chucks), provide high-precision positioning, uniform holding force, excellent thermal management, and outstanding plasma corrosion resistance. They (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
Silicon carbide wafer pins and chucks are used in plasma etch chambers, CVD systems, and ion implantation equipment for wafer support, lifting, and clamping during processing. The material must withstand aggressive plasma chemistry while maintaining dimensional stability and minimizing particle (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd.
More Information Top
Indicates content that may require registration and/or purchase.
-
Reconfigurable Manufacturing Systems and Transformable Factories
In essence, the patented ARMF system comprises a powerful electro- permanent magnetic chuck and several specially de- signed autonomous modular hydraulic elements and the system is to be operated directly by any multi-axis NC machining center [24, 25].