Semiconductor Manufacturing Handbook

Chapter 39: MICRO-VIBRATION AND NOISE DESIGN

Michael Gendreau

Hal Amick

Colin Gordon and Associates
San Bruno, California

39.1 INTRODUCTION

Noise and vibration are contaminants in semiconductor processing and research. Since the tools used in semiconductor manufacturing are sensitive to vibration and noise to varying degrees, excessive amounts of these contaminants can adversely impact yield, throughput, or the operating linewidth or resolution of the tools. In addition to the potential impact to tools, noise impacts personnel working in the cleanrooms and labs, and it is usually regulated in the external environment.

The vibration and noise performance of semiconductor and other advanced technology research and manufacturing buildings must be considered early in the conceptual design stage and throughout the design and construction of the project. This procedure applies not only to new buildings but also to retrofit projects, service or process modifications, and tool installations. It starts with site vibration and noise evaluations and reviews of manufacturers tools specifications or selection of generic criteria. The structural design of the building, layout of the process and mechanical equipment, and the tool layout in the lab or cleanroom, are all critical to a successful vibration and noise design. When vibration and noise cannot be controlled solely by equipment layout, as is often the case, specification of appropriate vibration and noise control devices (e.g., isolators and silencers) will be necessary. Finally, appropriate care must be taken in the tool hook-up stage, so that the vibration and noise environment of the base building is not excessively elevated. This chapter discusses these and...

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