Semiconductor Nanostructures for Optoelectronic Applications

7.7: InAsSb/InAsSbP for IR Lasers

7.7 InAsSb/InAsSbP for IR Lasers

The most thoroughly developed III-V semiconductor for MIR lasers is based on the InAsSb/InAsSbP quaternary alloy grown on InAs substrate. This material system is a promising candidate because it can cover the 3- to 5- ?m region by adjusting its alloy composition. Additionally, the InAsSbP material system has a fairly large growth window. The state-of-the-art growth, characterization, and operating characteristics for interband lasers based on the InAsSbP material system are presented and reviewed throughout this section.

InAsSbP is a quaternary alloy comprised of InAs, InSb, and InP binary materials. The physical properties of these binaries are summarized in Table 7.16. InAsSbP has a very wide range of energy gap and lattice constant values. Two binary substrates can be matched with the quaternary alloy: InAs and GaSb. However, InAs substrates are preferred because they are less expensive and of higher quality than GaSb substrates. Furthermore, GaSb has a relatively large refractive index that will reduce the optical confinement of the laser structures.

Table 7.16: Physical Properties of InAs, InSb, and InP

T (K)

InAs

InSb

InP

Crystal structure

Cubic (ZnS)

Cubic (ZnS)

Cubic (ZnS)

Lattice constant ( )

300

6.0584

6.4788

5.8688

Energy gap (eV)

300

0.36

0.18

1.35

0

0.41

0.36

1.42

Melting point (K)

1,215

803

1335

Coefficient of thermal expansion (10 -6K -1)

300

4.52

5.04

5.0

m e*/ m 0

4

0.024

0.014

0.077

m lh*/ m 0

4

0.025

0.018

0.12

m

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