Semiconductor Nanostructures for Optoelectronic Applications

| AAO | anodized aluminum oxide |
| AES | Auger Electron Spectroscopy |
| AFM | Atomic Force Microscope |
| ALE | atomic layer epitaxy |
| CL | cathololuminescence |
| CMOS | complimentary metal-oxide-semiconductor |
| CNT | carbon nanotube |
| CVD | chemical vapor deposition |
| CZ | Czochralski crystal growth method |
| DFT | density functional theory |
| DH | double heterostructure |
| EL | electroluminescence |
| FET | field effect transistor |
| FTIR | Fourier transform infrared spectroscopy |
| FWHM | full width at half maximum |
| FZ | float zone crystal growth method |
| GSMBE | gas source molecular beam epitaxy |
| HRTEM | high-resolution transmission electron microscope |
| LCC | light-current characteristic |
| LD | laser diode |
| LO | longitudinal optical phonon |
| LPE | liquid phase epitaxy |
| LWIR | long wave infrared (8 12 microns) |
| MBE | molecular beam epitaxy |
| MCT | mercury cadmium telluride, HgCdTe |
| MEE | migration enhanced epitaxy |
| MIR | mid infrared, also MWIR (2 5 microns) |
| ML | monolayer |
| MOCVD | metal organic chemical vapor deposition |
| MOMBE | metal organic molecular beam epitaxy |
| MQD | multiple quantum dot |
| MQW | multiple quantum well |
| MWIR | medium-wave infrared (2 5 microns) |
| NIR | near infrared |
| OCL | optical confinement layer |
| PC | photoconductivity spectroscopy |
| PECVD | plasma enhanced chemical vapor deposition |
| PIG | punctuated island growth |
| PL | photoluminescence spectroscopy |
| PLE | photoluminescence exitation spectroscopy |
| QCL | quantum cascade laser |
| QD | quantum dot |
| QDIP | quantum dot infrared photodetector |
| QW | quantum well |
| QWIP | quantum well infrared photodetector |
| QWR | quantum wire |
| RHEED | reflection high-energy electron diffraction |
| RIE | reactive ion etching |
| SAQD | self-assembled quantum dots |
| SCH | separate confinement heterostructure |
| SEG | selective epitaxial growth |
| SEM | scanning electron microscope |
| SK | Stranski-Krastinov growth method |
| SL | superlattice |
| SLS | strained layer superlattice |
| SWNT | single-wall nanotube |
| TEM | transmission electron microscope |
| TO | transverse optical phonon |
| VCSEL | vertical cavity surface emitting laser |
| VLWIR | very long wavelength infrared (16 25 microns) |