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  • Wet Scrubbing of Acidic Gases
    Wet scrubbing is a tried-and-true method for treating. toxic gas discharges. This article describes how. certain acidic gases are treated using wet scrubbing. techniques.
  • Lime/Limestone Wet Scrubbing System for Flue Gas Desulfurization
    Wet scrubbers are used in utilities, paper mills, and chemical plants to remove sulfur dioxide (SO2) and other pollutants from gas streams. Undesirable pollutants are removed by contacting the gases with an aqueous solution or slurry containing a sorbent. The most common sorbents are lime (Ca[OH]2
  • Magnesium Oxide Wet Scrubbing System for Flue Gas Desulfurization
    Wet scrubbers are used in utilities, paper mills, and chemical plants to remove sulfur dioxide (SO2) and other pollutants from gas streams. Undesirable pollutants are removed by contacting the gases with an aqueous solution or slurry containing a sorbent. Lime / limestone systems are most common
  • Industrial Processing - Sewage Sludge Incinerator
    The solid residues from sewage treatment are destroyed by burning in a boiler. The flue gases are scrubbed of particles, acid gases and, finally, mercury. The preferred method for mercury removal is to pass the gases through a scrubber containing powdered activated carbon (PAC). However PAC
  • TCS Process Vent Scrubbing (.pdf)
    The production of trichlorosilane (TCS) is a critical step in the production of polysilica for the solar cell industry. TCS production creates a variety of waste gas streams, including TCS, dichlorosiliane (DCS), Silicon tetrachloride (STC), and HCl. These waste gases must be removed at high
  • Ammonia Scrubbing in Semiconductor Manufacturing (.pdf)
    Semiconductor chip manufacturing utilizes a variety of inorganic acids and ammonia solutions. Mixing of acid gases and ammonia in a ventilation system can result in a gas phase reaction producing very fine particulate that is difficult and expensive to remove. For this reason a large semiconductor
  • Central Air Abatement System (CAAS) Scrubbing in Semiconductor Manufacturing (.pdf)
    A number of sources in the semiconductor manufacturing process produce diluted levels of acid gases, silanes, ammonia and some organics. The most common gases are hydrochloric acid (HCl), hydrofluoric acid (HF), hydrobromic acid (HBr), phosphoric acid (H3PO4), nitric acid (HNO3) and ammonia (NH3).
  • How to Control Odors in Air
    Machines for air scrubbing are used for gas absorption including acid gases such as S02, HCl and others. This equipment can also...
  • Analysis of Pipeline Quality Using a C6+ with Trace H2S Application
    with H2O forms hydrosulfuric acid, which can cause pipeline metals to become brittle. Contractual obligation may require scrubbing or limiting of the H2S in natural gas before it is sold. Each pipeline company has its own acceptable limits of how much H2S can be present.
  • Measurement of Fluorine Content in Alumina
    Aluminium is produced by electrolytic reduction of alumina (Al2O3) in molten cryolite (Na3AlF6) to which aluminium fluoride (AlF3) has been added to further reduce the melting point. This process results in the emission of fluorine compounds, either as gases (mainly hydrogen fluoride) or dust
  • Crossflow Scrubber and Air Filtration Pilot System
    This design utilizes stage-wise scrubbing and filtering of gases and contaminants in a compact, easy to maintain package. Inherent in the design is the flexibility to collect a diverse range of contaminants and at a high gas flow turndown (allowing for large swings in the gas volume). Kimre TM