Products & Services
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Supplier: Drytek Distribution
Description: Product Features: 150mm reticle size Reticle storge and transporation ABS material (static disspastive material) Shock absorpation design in reticle contact.
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Supplier: Drytek Distribution
Description: Product Features: 150mm retilce size. Prevent Haze contamination Metal shielding to protect retcile from ESD damage Use PEEK material for support to lower particle generationc Shock absorption to keep reticle safe during transportation
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Supplier: Aerotech, Inc.
Description: Design Features Three-axis photomask alignment stage Standard interface for six or eight-inch masks Integral vacuum groove for mask retention Low profile for easy integration into optics train Direct-drive brushless servomotors
- Axis Configuration: X-Y-Z Axes
- Carriage Load: 4.41 to 11.03 lbs
- Drive Specifications: None
- Motor Specifications: DC Brushless Servo
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Supplier: Accuris
Description: Recommended Practice for Determining Multiple Photomask Registration
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Supplier: SPIE
Description: Proceedings of SPIE Volume 6730 Editor(s): Robert J. Naber ; Hiroichi Kawahira Date Published: 2 October 2007
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Supplier: SPIE
Description: Proceedings of SPIE Volume 7488 Editor(s): Larry S. Zurbrick ; M. Warren Montgomery Date Published: 23 September 2009
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Supplier: SPIE
Description: Proceedings of SPIE Volume 6349 Editor(s): Patrick M. Martin ; Robert J. Naber Date Published: 20 October 2006
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Supplier: SPIE
Description: Proceedings of SPIE Volume 9235 Editor(s): Paul W. Ackmann ; Naoya Hayashi Date Published: 29 October 2014
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Supplier: CoorsTek
Description: CoorsTek photomask substrates are made from high-purity synthetic quartz glass to deliver superior UV and visible light transmittance, thermal stability, electrical insulation, low birefringence, and durable chemical stability. Advanced, scalable polishing technology makes these
- Applications: Chemical / Materials Processing, Dielectric / Electrical Insulation, Other
- Shape / Form: Wafer Carrier / Holder
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Supplier: ASTM International
Description: Recommended Practice for Determining Multiple Photomask Registration (Withdrawn 1981)
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Supplier: Accuris
Description: STANDARD DEFINITIONS OF TERMS RELATING TO PHOTOMASKING TECHNOLOGY FOR MICROELECTRONICS
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Supplier: Accuris
Description: Standard Test Method for Distortion of Optical Lenses Used in Photomask Fabrication
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Supplier: ASTM International
Description: Test Method for Distortion of Optical Lenses Used in Photomask Fabrication
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Supplier: ASTM International
Description: Test Method for Distortion of Optical Lenses Used in Photomask Fabrication (Withdrawn 1996)
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Supplier: ASTM International
Description: Definitions of Terms Relating to Relating to Photomasking Technology for Microelectronics (Withdrawn 1992)
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Supplier: Accuris
Description: STANDARD TEST METHOD FOR CALIBRATION VERIFICATION OF LASER DIFFRACTION PARTICLE SIZING INSTRUMENTS USING PHOTOMASK RETICLES
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Supplier: Drytek Distribution
Description: Product Features: Remove particles and haze on the glass side in Class 1 environment. Equipped exchange reticle between RSP 150 and photomask case function No need to detach frame before cleaning DI water for wet cleaning and air-knife for drying cleaning CCD to inspect particles on the glass
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Supplier: TSI Incorporated
Description: .MSP provides certified Wafer and Photomask (Reticle) Calibration Standards for calibrating, qualifying, and monitoring wafer and photomask inspection systems. Particles of specified size, composition, and count are deposited on your substrate of choice, including wafers, 6-inch
- Coating System Type: Other
- Technology / Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
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Supplier: IRD Glass
Description: IRD Glass is a World Class Supplier of precision glass, optical and ceramic components. For over twenty five years, IRD Glass has served the aerospace, defense, sensor, machine vision, laser, technical glass, optical, process control and medical industries (to name just a few). Their clients include
- Additional Operations: Chemical Treating, Glass to Metal Bonding, Glass to Ceramic Bonding, Etching / Blasting, Heat Treating, Hermetic Sealing, Lapping / Polishing
- Application Expertise: Electronics (Stems / Headers), Lighting, Optical / Semiconductor
- Coating Services: Anti-Reflective Coating, Silvering / Metallizing, Screen Coating
- Fabrication Services: Design Assistance, Glass Part Fabrication, Glass Cutting / Profiling, Material Selection, Photomask Fabrication, Inspection / Testing, Specialty / Other
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Supplier: WDI Wise Device Inc.
Description: The LLC6 is a precise linear lens changer with 6 lens ports providing ultra fast, automatic lens changing without the need of re-qualifying the lens. It is the ideal tool for TFT-LCD and Photomask Inspection/Repair applications or other tasks where multiple optical magnifications are required
- Applications: Semiconductor Wafers, Flat Panel Displays
- Form Factor: Other
- Mounting / Loading: In-situ / System Mounted
- Non-contact: Yes
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Supplier: Mitsui Chemicals America, Inc.
Description: Mitsui Pellicle is a dust proof membrane applied to photomask in the lithography process of the semiconductor manufacturing process. Pellicle's membrane materials and membrane thickness are designed to optimize different light exposures and achieve excellent transmission rates. To ensure
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Supplier: Abrisa Technologies
Description: Abrisa Technologies provides precision custom machined optical components from prototype to high volume and OEM production. We can apply a variety of precision processes, individually or in combination, to any glass substrate. 90% of Glass Fabrication requirements are unique, consequently when you
- Additional Operations: Chemical Treating, Glass to Metal Bonding, Glass to Ceramic Bonding, Etching / Blasting, Heat Treating, Lapping / Polishing, Other
- Application Expertise: Architectural, Lighting, Optical / Semiconductor, Packaging (Ampules / Containers), Vehicular / Marine (OEM Autoglass), Other
- Coating Services: Anti-Glare Coating, Anti-Reflective Coating, Silvering / Metallizing, Screen Coating, Safety Coating, Other
- Fabrication Services: Design Assistance, Glass Part Fabrication, Glass Cutting / Profiling, Photomask Fabrication, Inspection / Testing
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Supplier: CoorsTek
Description: CoorsTek provides high-performance, critical-duty ceramic components for Flat Panel Display (FPD) manufacturing from a range of specialized, high-purity engineered ceramics. Large-scale synthetic quartz LCD photomask substrates Etch processing components CVD deposition processing Ultra-flat
- Applications: Electrical / HV Parts
- Coeff. of Thermal Expansion (CTE): 8 to 10 µm/m-C
- Compressive / Crushing Strength: 174044 to 424958 psi
- Density: 3.72 to 5.91 g/cc
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Supplier: TSI Incorporated
Description: -pure water (UPW). This suspension is dispersed into clean air or nitrogen and deposited onto wafers and reticles in specific patterns and sizes. Particle Standards are used to produce high-quality calibration standards for calibrating, qualifying, and monitoring the performance of wafer and
- Coating System Type: Other
- Technology / Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
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Supplier: HG Optronics, Inc.
Description: surface, integrating optical devices within the body of a substrate. Defects in photomasks can be repaired without disturbing neighbouring patterns. And it is now possible to achieve cellular resolution in vivo for medical diagnosis with femtosecond pulse lasers. Descriptions: Ti
- Damage Threshold: 750000 W/cm²
- Features: AR-Coated
- Material: Other / Specialty Material
- Optical Application: Ultraviolet
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MITSUI PELLICLE is employed in the exposure process that facilitates the production of semiconductors, LCD panels and more. Photomask pellicles serve as a protective cover for intricately patterned photomasks, preventing dust from attaching to the photomask and affecting the imaging on the (read more)
Browse Resins and Compounds Datasheets for Mitsui Chemicals America, Inc. -
Custom ECU for Semiconductor Application One of the biggest challenges in using lithography in high-volume semiconductor fabrication is photomask defectivity. A global supplier to the semiconductor and photomask making (read more)
Browse Environmental Control Systems Datasheets for Air Innovations LLC -
What is Photo Chemical Machining? Before diving into its applications, it's important to briefly understand the PCM process. PCM involves coating a metal sheet with a photoresist, which is then exposed to UV light through a photomask with the desired design (read more)
Browse Electrochemical, Photochemical, and Chemical Milling Services Datasheets for Conard Corporation (The) -
Tolerances on Temperature/Humidity – Most of our customers working with environmental control in a semiconductor environment require material stability and measurement accuracy that comes from semiconductor temperature control. Whether you work in lithography, photomask (read more)
Browse Environmental Control Systems Datasheets for Air Innovations LLC -
Applications Semiconductor Industry: PFA pleated filters are widely used in semiconductor manufacturing, where high-purity filtration is critical for producing microchips, photomasks, and other components. Pharmaceutical and Biotech: In (read more)
Browse Filter Elements Datasheets for Harbory Filtration
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
preview of its future roadmap, including bold plans to expand or enter the separate phase-shifting photomask and optical proximity correction (OPC) software markets. ASML MaskTools--a supplier of so-called resolution enhancement technique (RET) software for lithography and reticle-mask writing tools
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What is Photo Etching?
to ultra-violet light through a photomask.
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
DFM provider BindKey suspends operations BindKey Technologies, a provider of design for manufacturability (DFM) software for IC design, has suspended product development and sales, has learned. BindKey's parent company, DuPont Photomasks, is seeking a buyer for the technology. Schematic, PCB tools
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
trial is set to start Monday in San Francisco. Toppan Photomasks ramps Korean plant Toppan Photomasks Inc. has begun customer qualifications for photomasks supporting 90-nm production and 65-nm prototype development in a new facility in Ichon, Korea. Analysis: Intel results mar so-far good Q1 Early
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
DDR-II device that will actually begin shipping much sooner as a specialty memory for graphics. Skyworks Solutions Inc., apparently unafraid of the downward spiral the wireless handset market finds itself in, is launching into the struggling sector. Photronics' new CEO sees rebound in photomask market
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
Can 'CARS' and e-beams lower mask costs? SAN JOSE -- What are semiconductor-equipment and materials providers doing to reduce the soaring costs of the lowly photomask? Most agree that next-generation tools and materials will be required for the photomask shops--and for good reason. The cost
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
-over-IP networking product Nikon goes outside for key stepper component White Oak adds an Advantest system New Orders & Design Wins Intel, memory leaders form Next-Generation DRAM alliance DPI plans new photomask plant in France after it buys IBM operation Intel to aid LightWork in adapting 3-D
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
. has acquired CoreSim, a leader in advanced design analysis and redesign services. Photronics to acquire remaining shares of PK Ltd. Photomask supplier Photronics, Inc. has announced a tender offer for the remaining publicly held shares of Korea-based photomask maker PK Ltd. UMC riled by TSMC comments
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Silicon-semiconductor technology
Finally can be etched adjusting marks, the structures for alignment of individual photo masks , in the oxide to anchor the landmarks on the wafer surface.
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Introduction into the semiconductor-circuit technology
As last can the residue of the photoresist is removed now, so that the desired remains (Abb. 12.4 the structure defined through the photo mask on the substrate, i).
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Introduction into the semiconductor-circuit technology
As last can the residue of the photoresist is removed now, so that the desired remains (Abb. 11.4 the structure defined through the photo mask on the substrate, i).
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Introduction into the semiconductor-circuit technology
As last can the residue of the photoresist is removed now, so that the desired remains (Abb. 11.4 the structure defined through the photo mask on the substrate, i).
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Clean room technique
E.g., the formation of particles through vibrationsbedingte friction between a photo mask and its transport container investigated Yook et al. [3].
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Efficient photochemical method for spatially resolved surface functionalization
The spatially aufgelçste deprotection through 60 min irradiation in presence of a photo mask by l = 365 nms was carried out in a saturated Semicarbazidlçsung.
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Thiol‐En‐Klickchemie
The thiol-En reaction has developed into an extremely popular surface modification method, as they the possibility offers inter alia to produce simply the surface patterns by the use of photo masks .
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Electronic components
pen ") remains the oxide areas on silicon edges of which are passed through the photo mask .