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Supplier: Mitsui Chemicals America, Inc.
Description: Photoresist Raw Materials Mitsui Chemicals America, Inc. markets raw materials for the manufacture of photoresist chemicals through its affiliation with Honshu Chemical Industry Co. Ltd. (Honshu Chemical), a subsidiary of its parent company, to the United States market.
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Supplier: LG Chemical of America Inc.
Description: LCD Photoresist A key material for implementing vivid LCD colors A photo-sensitive material is a key material for a LCD color filter and is made of liquid chemical that responds to the light to form three different pixels of red, green and blue and create various colors. It is made using
- Filter Type: Spectral Filters
- Application: Visible (VIS)
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Description: Superior resist handling The use of high-torque, stepper motor technology results in a consistent controllable discharge volume. The discharge volume is not affected by changes in viscosity or by filter performance. Repeatable accuracy of 0.3% of the discharge volume is maintained at all times.
- Maximum Discharge Flow: 0.001585032315823775 to 0.063401292632951 GPM
- Maximum Discharge Pressure: 21.7557 psi
- Media Temperature: 59 to 77 F
- Pump Type: Metering Pumps, Positive Displacement Pumps
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Supplier: Ushio America, Inc.
Description: This ultraviolet irradiation device is used for photoresist curing in LSI manufacturing lines. Equipped with a super high-pressure UV lamp and an excimer lamp, this system is used for various applications such as enhancing plasma resistance during dry etching, photoresist outgassing
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Supplier: SPIE - Education
Description: as well as EUV) will be covered. The chemical changes occurring in photoresists during the different process steps will be discussed. Pitfalls and failure modes will be pointed out at every step and correlated to the underlying properties of the photoresist materials. The aim of the
- Type: Course
- Delivery: On-site / In Plant
- Technology / Subject Expertise: Photonics / Optics
- Features: Specialty / Other
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Supplier: Technic, Inc.
Description: Specially formulated to fully dissolve AZ EM advanced line of photoresist: AZ15nXt, AZ40XT and AZnLOF 2000 series. High metal compatibility from a DMSO and TMAH free solution.
- Type: Cleaner / Cleaning Agent, Stripper (Paint, Resins)
- Industry Applications: Semiconductor Wafer / Cleanroom
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Supplier: Accuris
Description: Characterization of photoresists used in semiconductor technology - Part 2: Determination of photosensitivity of positive photoresists
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Supplier: Kayaku Advanced Materials, Inc.
Description: TempKoat® P is a chemically amplified, positive‑tone temporary resist engineered for advanced packaging and MEMS applications. Designed for thick, single‑coat processing, it delivers high‑aspect‑ratio features with excellent photospeed, resolution, and strong chemical resistance. Offering clean,
- Applications: Electronics / Microelectronics
- Thick Film Type: Resistor
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Supplier: MacDermid Alpha Electronics Solutions
Description: Product Overview Our photoresist developers are highly concentrated aqueous solutions, enabling simple and consistent feed-and-bleed control. Developer 45 Plus includes effective descaling and anti-scumming additives, along with the convenience of a pure liquid concentrate. Developer 40
- Form: Liquid / Solution
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Supplier: Kayaku Advanced Materials, Inc.
Description: angle Aqueous alkaline development (standard 0.26N TMAH developers) Suitable for metal evaporation physical vapor deposition processes Pattern thermal stability up to 200°C Clean removal with standard photoresist removal chemistries Suitable as top imaging resist in bi-layer lift-off
- Applications: Electronics / Microelectronics
- Thick Film Type: Resistor
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Supplier: Accuris
Description: Standard Practice for Adjusting Photoresist Exposure Time
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Supplier: Accuris
Description: Standard Test Method for Photoresist Cleanness - Filterability
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Supplier: Accuris
Description: Standard Practice for Evaluating Safelights for Photoresists
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Supplier: ASTM International
Description: Practice for Accelerated Aging of Photoresist (Withdrawn 1996)
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Supplier: ASTM International
Description: Practice for Accelerated Aging of Photoresist
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Supplier: ASTM International
Description: Practice for Evaluating Safelights for Photoresists (Withdrawn 1996)
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Supplier: ASTM International
Description: Practice for Adjusting Photoresist Exposure Time (Withdrawn 1996)
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Supplier: RS Components, Ltd.
Description: CIF ABB20 Photoresist Board
- Thickness: 0.031496062992125984 inches
- Width: 7.874015748031496 inches
- Length: 0.9842525000000001 ft
- Materials: Copper Foil / Cladding
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Supplier: DigiKey
Description: TO-18 PHOTOCELL (CDS PHOTORESIST
- Operating Temperature: -60 to 75 C
- Features: Other
- Photodiode Package: Through Hole Technology (THT)
- Photodiode Spectral Response: Visible
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Supplier: Radwell International
Description: DISCONTINUED BY MANUFACTURER, WAFERGARD PHOTO-RESIST HSG FOR 18-STACK GAS FILTER. FREE 2 YEAR RADWELL WARRANTY
- Media: Gas
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Supplier: Matexcel
Description: Pitch: 288nm Surface feature: Photoresist Parallel Ridges Substrate: Silicon Mounting: Mounted on 12 or 15 mm steel disk
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Supplier: Matexcel
Description: Pitch: 700 nm Surface feature: Hardened photoresist ridges covered with Tungsten Substrate: Silicon Mounting: Mounted on 12 or 15 mm steel disk
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Supplier: Ellsworth Adhesives
Description: Versum Materials, formerly Dynaloy, Dynasolve 750 Blue is a solvent that is used to dissolve cured epoxies, photoresist films, silicones, and urethanes. It can also be used for cleaning industrial machinery. 1 qt Bottle.
- Type: Cleaner / Cleaning Agent
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Supplier: Matexcel
Description: Pitch: 700 nm Surface feature: Hardened photoresist ridges covered with Tungsten Substrate: Silicon (3 x 4mm. Line height: approximately 30 nm (not calibrated). Line width: Approximately 130 nm (not calibrated).) Mounting: Unmounted
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Supplier: SPIE
Description: This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry,
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Supplier: Kayaku Advanced Materials, Inc.
Description: Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices. High resolution capability (~ 40 – 50 nm) High wet and dry etch resistance Aqueous alkaline development Easy to remove
- Applications: Electronics / Microelectronics
- Thick Film Type: Resistor
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Supplier: Radwell International
Description: MEMBRANE FILTER CARTRIDGE, MEMBRANE FOR USE W/ BULK CHEMICAL/PHOTORESIST APPLICATION, HIGH-RETENTION MEMBRANE, PRE-FLUSHED W/ 18 MEGOHM-CM ULTRAOURE DI WATER, PLEATED MEMBRANCE CONSTRUCTION, 2.75 INCH O.D. FREE 2 YEAR RADWELL WARRANTY
- Features: Filter Element / Cartridge
- Filtration Product: Hydraulic Fluid
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Supplier: Ellsworth Adhesives
Description: Versum Materials, formerly Dynaloy, Dynasolve 711 Blue is a solvent that is used to dissolve cured epoxies, photoresist films, silicones, and urethanes. It can also be used for cleaning industrial machinery. It is aluminum-safe and will not cause discoloration. 1 gal Pail.
- Type: Cleaner / Cleaning Agent
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Supplier: Newark, An Avnet Company
Description: PCB, PRESENSITIZED, EPOXY, 1F, 100X160; Board Type:Photoresist Board; Board Material:Epoxy; Hole Diameter:-; External Height:100mm; External Width:160mm; Board Thickness:-; SVHC:No SVHC (15-Jan-2018); External Length / Height:100mm; RoHS Compliant: Yes
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Supplier: Ellsworth Adhesives
Description: Versum Materials, formerly Dynaloy, Dynasolve 750 Cleaner Blue is a solvent that is used to dissolve cured epoxies, photoresist films, silicones, and urethanes. It can also be used for cleaning industrial machinery. It is aluminum-safe and will not cause discoloration. 1 gal Can.
- Type: Cleaner / Cleaning Agent
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Supplier: Newark, An Avnet Company
Description: PCB, PHOTO RESIST, 440X305MM; Board Type:Photoresist Board; Board Material:Epoxy Glass Composite; Hole Diameter:-; External Height:440mm; External Width:305mm; Board Thickness:-; SVHC:No SVHC (15-Jan-2019); Copper Coating Density:35 RoHS Compliant: Yes
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Supplier: Newark, An Avnet Company
Description: PCB, PRESENSITIZED, EPOXY, 2F, 200X300; Board Type:Photoresist Board; Board Material:Epoxy; Hole Diameter:-; External Height:200mm; External Width:300mm; Board Thickness:-; SVHC:No SVHC (15-Jan-2018); External Length / Height:200mm; RoHS Compliant: Yes
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Supplier: Newark, An Avnet Company
Description: PCB, PRESENSITIZED, EPOXY, 2F, 300X600; Board Type:Photoresist Board; Board Material:Epoxy; Hole Diameter:-; External Height:300mm; External Width:600mm; Board Thickness:-; SVHC:No SVHC (15-Jan-2019); External Length / Height:300mm; RoHS Compliant: Yes
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Supplier: Gelest, Inc.
Description: Additional Properties Hydrolytic Sensitivity 4: no reaction with water under neutral conditions Application Comonomer with chloromethylstyrene for RIE resistant photoresist.1 Reference 1. Mixon, D. et al. J. Vac. Sci. Technol., B 1989, 7(6), 1723. Safety Packaging Under Nitrogen Store Cold
- Flash Point: 145.4 F
- Purity: 97 %
- Features: Metalloids (B, Si, Ge, etc.), Non-Metals (C, N, O, P, S)
- Type: OrganoMetallics
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Supplier: Gelest, Inc.
Description: Additional Properties Hydrolytic Sensitivity 4: no reaction with water under neutral conditions Application UV sensitizer for poly(t-butoxycarbonyloxystyrene) chemically amplified photoresist.1 Reference 1. Hinsberg, W. et al. J. Vac. Sci. Technol., B 1998, 16, 3689. Safety Packaging Under
- Flash Point: 293 F
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Mitsui Chemicals America, Inc. markets raw materials for the manufacture of photoresist chemicals through its affiliation with Honshu Chemical Industry Co. Ltd. (Honshu Chemical), a subsidiary of its parent company, to the United States market. Photoresists are light sensitive polymers that are (read more)
Browse Monomers, Intermediates, and Base Polymers Datasheets for Mitsui Chemicals America, Inc. -
removal with standard photoresist removal chemistries Suitable as top imaging resist in bi-layer lift-off processes Material uses Deposition patterning of insulator layers MEMS and sensor devices Optical and photonic components, such as optical filters RF and microwave device fabrication (read more)
Browse Conformal Coatings Datasheets for Kayaku Advanced Materials, Inc. -
Positive-tone temporary photoresist.
(read more)
Browse Conformal Coatings Datasheets for Kayaku Advanced Materials, Inc. -
deionized and reagent-grade water applications. 4. Photoresist and Lithography Chemicals Photoresist (read more)
Browse Filter Housings Datasheets for Harbory Filtration -
What is Photo Chemical Machining? Before diving into its applications, it's important to briefly understand the PCM process. PCM involves coating a metal sheet with a photoresist, which is then exposed to UV light through a photomask with the desired design (read more)
Browse Electrochemical, Photochemical, and Chemical Milling Services Datasheets for Conard Corporation (The) -
innovation and technological advancement. This latest product represents the next generation within MacDermid Alpha's MICROFAB TS-650 process, enhancing its wafer level packaging (WLP) solder plating portfolio. It provides significant improvements over the existing process including photoresist (read more)
Browse Plating Chemicals and Anodizing Chemicals Datasheets for MacDermid Alpha Electronics Solutions -
times, excessive temperatures can lead to over-etching, loss of precision, and undercutting (where etchant removes material under the photoresist mask). Lower (read more)
Browse Electrochemical, Photochemical, and Chemical Milling Services Datasheets for Conard Corporation (The) -
) pleated filter cartridges are widely used in these applications due to their chemical resistance, high filtration efficiency, and durability. Electronic chemicals:ultra-pure solvents, photoresists, etchants, and cleaning agents, are critical in the production of (read more)
Browse Filter Elements Datasheets for Harbory Filtration -
- Photoresist and chemical dispensing systems - Precision dosing pumps in analytical and pharmaceutical equipment - Fluid handling in CVD and ALD precursor delivery systems - High-purity liquid transfer in fab chemical delivery modules Manufacturing Capability (read more)
Browse Industrial Ceramic Materials Datasheets for Fountyl Technologies Pte. Ltd. -
is in continuous motion. Marposs infrared and white-light interferometers can also be used in front-end processes to monitor ultra-thin coatings immediately after deposition. These include photoresists, trench depths, or TSVs with high aspect ratios, all measured with high accuracy (read more)
Browse Dimensional Gages and Instruments Datasheets for Marposs Corp
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Dual-band Photoresists for Better HDI PCB Yield and Productivity
Continuing advances in equipment and materials are necessary to support high-density interconnect (HDI) printed circuit boards (PCBs) with ever-increasing feature densities.
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What is Photo Etching?
Photo etching is a process used in the creation of integrated circuits, that combines photolithography with the etching process. Photolithography is used to form patterns on semiconductor substrates coated with photoresist, resulting in selective developing of the photo-resist, when exposed
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
photoresist removal tool. Gasonics, a supplier of photoresist and residue removal systems, previously said it was buying the Fremont, Calif.-based company to expand its presence in Asia as well as to add new development capabilities. Monterey snags patent for IC physical design software Surge
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
for Quad Data Rate SRAM IBM to disclose details of new photoresist for 0.10-micron processing Cambridge Silicon Radio demonstrates single-chip Bluetooth radio IC Chip capacity is so tight 'overshooting' isn't likely in 2000 ST Micro teams with Rise Technology to tackle Internet appliance market Japanese
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
, ASICs to new logic devices LSI Logic to acquire NeoMagic's optical mixed-signal engineering business Coming soon: 'smart' cardboard boxes with RFID chips from Motorola Samsung claims breakthrough in photoresist for 193-nm lithography PMC-Sierra earnings take off, but investors punish share price MIPS
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
for the North American semiconductor equipment industry. A book-to-bill of 1.28 means that $128 worth of new orders were received for every $100 of product billed for the month. Researchers probe photoresists for next-gen ICs Government, industry and university researchers have joined forces to search
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
plans to pare back its electrochemical mechanical deposition (ECD) and wafer handling units. Sematech opens EUV resist center Chip-making consortium International Sematech announced the opening of an R &D center that will explore and develop next-generation photoresists for extreme ultraviolet (EUV
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
the Enviro Advanced Dry Strip System, is a multi-chamber, single-wafer photoresist stripper and polymer-removal tool that incorporates both microwave downstream and low-energy plasma. Singapore's STATS lowers forecast for next two quarters SINGAPORE -- Citing a slowdown in its IC-packaging, assembly
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Resistive technique ‐ a contribution of the chemistry to the electronics
… components will be influenced by the chemistry deciding: Whether in the region the photoresist for the production …
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Practice knowledge Mikrosystemtechnik
… in visible or durchstrahlt UV vicinity and used a photosensitive layer (so-called photoresist ) of only 1 …
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Sensor technique
… first step, the substrate or the semiconductor wafers with a photosensitive lacquer (photoresist, photoresist ) are laminated and …
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Soft lithography
The photo resistive layer projected becomes.
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Polymer Engineering
Two types of resists that can be used give it: an etching resist ( photoresist ) or a Galvanoresist …
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Materials for the optical data storage
… research of the GeschbyisbereichsInformationstechnik of the Hoechsi AG and rnit of the development of photoresist was charged.
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Polymers: synthesis, properties and applications
… copolymers (COCs) find the application as technical plastics, material for medical packages, optical waveguide, adhesives and photoresist .
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Bioinspired adhesion of system ‐ competing with the gecko
A of wafers transferring the, photo commonly silicone, is coated with a UV-curable to maggot of resist and exposed through a lithography mask, pattern .