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Supplier: SPIE - Education
Description: photoresist performance is therefore a key concern to every microlithography engineer. However, this requires a highly interdisciplinary understanding of many areas, from photochemistry to polymer science to optics, that are usually not taught in a unified way in most educational curricula.
- Modality: On-site / In Plant
- Technology / Subject: Photonics / Optics, Specialty / Other
- Type: Course
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Supplier: MacDermid Alpha Electronics Solutions
Description: Highly concentrated photoresist solutions, making feed-and-bleed control of the developer solution simple and consistent. Product Overview Our photoresist developers are highly concentrated aqueous solutions, enabling simple and consistent feed-and-bleed control. Developer 45 Plus
- Configuration / Form: Liquid / Solution
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Supplier: Mitsui Chemicals America, Inc.
Description: Photoresist Raw Materials Mitsui Chemicals America, Inc. markets raw materials for the manufacture of photoresist chemicals through its affiliation with Honshu Chemical Industry Co. Ltd. (Honshu Chemical), a subsidiary of its parent company, to the United States market.
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Supplier: LG Chemical of America Inc.
Description: LCD Photoresist A key material for implementing vivid LCD colors A photo-sensitive material is a key material for a LCD color filter and is made of liquid chemical that responds to the light to form three different pixels of red, green and blue and create various colors. It
- Application Specific: Visible (VIS)
- Filter Type: Spectral Filters
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Description: Superior resist handling The use of high-torque, stepper motor technology results in a consistent controllable discharge volume. The discharge volume is not affected by changes in viscosity or by filter performance. Repeatable accuracy of 0.3% of the discharge volume is maintained at all times.
- Housing Material: Plastic
- Maximum Discharge Pressure: 21.76 psi
- Maximum Discharge Flow: 0.0016 to 0.0634 GPM
- Media Temperature: 59 to 77 F
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Supplier: Ushio America, Inc.
Description: This ultraviolet irradiation device is used for photoresist curing in LSI manufacturing lines. Equipped with a super high-pressure UV lamp and an excimer lamp, this system is used for various applications such as enhancing plasma resistance during dry etching, photoresist outgassing
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Supplier: Technic, Inc.
Description: An advanced photoresist stripper that has a wide range of applications from DUV to thick negative resins and passivation layer reworking. It is especially ideal for use in back end applications like TSV, Cu pillar, bumping, etc. Offers complete resin dissolution of thick film
- Industry Applications: Semiconductor Wafer / Cleanroom
- Type: Cleaner / Cleaning Agent, Stripper (Paint, Resins)
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Supplier: Technic, Inc.
Description: An advanced photoresist stripper that has a wide range of applications from DUV to thick negative resins and passivation layer reworking. It is especially ideal for use in back end applications like TSV, Cu pillar, bumping, etc. Offers complete resin dissolution of thick film
- Thick Film Type: Resistor
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Supplier: Technic, Inc.
Description: A highly effective negative tone photoresist remover used mainly for TSV mask and solder bumping applications. Developed to address laminated photo-resins and liquid resins, the novel stripping formulation of this TMAH/DMSO chemistry exhibits high dissolution performance compared to standard
- Industry Applications: Semiconductor Wafer / Cleanroom
- Type: Cleaner / Cleaning Agent, Stripper (Paint, Resins)
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Supplier: Technic, Inc.
Description: Specially formulated to fully dissolve AZ EM advanced line of photoresist: AZ15nXt, AZ40XT and AZnLOF 2000 series. High metal compatibility from a DMSO and TMAH free solution.
- Industry Applications: Semiconductor Wafer / Cleanroom
- Type: Cleaner / Cleaning Agent, Stripper (Paint, Resins)
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Supplier: Accuris
Description: Standard Practice for Accelerated Aging of Photoresist
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Supplier: Accuris
Description: Standard Test Method for Photoresist Cleanness - Filterability
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Supplier: Accuris
Description: Standard Practice for Evaluating Safelights for Photoresists
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Supplier: Accuris
Description: Standard Practice for Adjusting Photoresist Exposure Time
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Supplier: ASTM International
Description: Practice for Accelerated Aging of Photoresist
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Supplier: ASTM International
Description: Practice for Accelerated Aging of Photoresist (Withdrawn 1996)
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Supplier: ASTM International
Description: Test Method for Photoresist Cleanness--Filterabi lity (Withdrawn 1996)
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Supplier: ASTM International
Description: Practice for Evaluating Safelights for Photoresists (Withdrawn 1996)
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Supplier: DigiKey
Description: TO-18 PHOTOCELL (CDS PHOTORESIST
- Operating Temperature: -60 to 75 C
- Photodiode Package / Mounting: Through Hole Technology (THT), Other
- Spectral Response: Visible
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Supplier: StellarNet, Inc.
Description: Measurement systems can be used to locate and identify the cause of failure in integrated circuits. Systems are also used during MEMS patterning processes to measure photoresist thickness and uniformity. These systems are also being used during silicon etching to measure etch rate and
- Applications: Semiconductor Wafers, CVD / PVD Films, Polishing / CMP, Polymers / Photoresists, Other
- Form Factor: Monitor / Instrument
- Measurement Capability: Thickness - Film / Layer, Thickness - Wafer / Disc (TTV)
- Non-contact: Yes
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Supplier: DigiKey
Description: CDS PHOTORESIST 12K-30KOHM 11MM
- Mounting Option: Other
- Operating Temperature: -30 to 75 C
- Peak Wavelength: 520 nm
- Resistance On: 12000 to 30000 ohms
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Supplier: DigiKey
Description: CDS PHOTORESIST 15K-60KOHM 7.2MM
- Mounting Option: Other
- Peak Wavelength: 520 nm
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Supplier: DigiKey
Description: CDS PHOTORESIST 9K-20KOHM 4.20MM
- Mounting Option: Other
- Operating Temperature: -30 to 75 C
- Peak Wavelength: 520 nm
- Resistance On: 9000 to 20000 ohms
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Supplier: Imego
Description: MERMAID is a unique measurement instrument for analysis of liquid and thin film properties using magnetoelastic resonance (MER) sensors. Dynamic events such as viscosity change, phase transitions or bio film growth can be analyzed. The MER sensor can measure properties of either a coating on top of
- Applications: CVD / PVD Films, Polymers / Photoresists, Other
- Form Factor: Wafer Probing System, Sensor / Sensing Element
- Measurement Capability: Deposition Rate, Endpoint Detection / Plasma Diagnostics, Thickness - Film / Layer, Other
- Mounting / Loading: In-situ / System Mounted, Floor Mounted / Stand-alone
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Supplier: Radwell International
Description: DISCONTINUED BY MANUFACTURER, WAFERGARD PHOTO-RESIST HSG FOR 18-STACK GAS FILTER. FREE 2 YEAR RADWELL WARRANTY
- Media: Gas
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Supplier: Matexcel
Description: Pitch: 288nm Surface feature: Photoresist Parallel Ridges Substrate: Silicon Mounting: Mounted on 12 or 15 mm steel disk
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Supplier: Matexcel
Description: Pitch: 700 nm Surface feature: Hardened photoresist ridges covered with Tungsten Substrate: Silicon Mounting: Mounted on 12 or 15 mm steel disk
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Supplier: MacDermid Alpha Electronics Solutions
Description: Kolon dry film photoresists offer high reliability for all commonly used substrates at the lowest possible cost (Europe only). Product Overview Kolon series dry film photoresists deliver high first-pass yields through fine-line resolution, strong adhesion, excellent tenting
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Supplier: MacDermid Alpha Electronics Solutions
Description: Resist stripping system designed to strip fully aqueous and tough-to-strip LDI dry films and conventional dry film photoresists. Product Overview The UltraStrip product line represents our most advanced, high-performance photoresist strippers. Designed to strip fully aqueous dry
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Supplier: Radwell International
Description: MEMBRANE FILTER CARTRIDGE, MEMBRANE FOR USE W/ BULK CHEMICAL/PHOTORESIST APPLICATION, HIGH-RETENTION MEMBRANE, PRE-FLUSHED W/ 18 MEGOHM-CM ULTRAOURE DI WATER, PLEATED MEMBRANCE CONSTRUCTION, 2.75 INCH O.D. FREE 2 YEAR RADWELL WARRANTY
- Filtration Product: Hydraulic Fluid
- Trigger: Filter Element / Cartridge
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Supplier: Ellsworth Adhesives
Description: Versum Materials, formerly Dynaloy, Dynasolve 750 Blue is a solvent that is used to dissolve cured epoxies, photoresist films, silicones, and urethanes. It can also be used for cleaning industrial machinery. 1 qt Bottle.
- Type: Cleaner / Cleaning Agent
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Supplier: Matexcel
Description: Pitch: 700 nm Surface feature: Hardened photoresist ridges covered with Tungsten Substrate: Silicon (3 x 4mm. Line height: approximately 30 nm (not calibrated). Line width: Approximately 130 nm (not calibrated).) Mounting: Unmounted
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Supplier: SPIE
Description: This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry,
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Supplier: MacDermid Alpha Electronics Solutions
Description: Full range of UltraStrip photoresist strippers and eliminator products used in outer-layer tin stripping. Product Overview The UltraStrip product line represents our most advanced, high-performance photoresist strippers. These formulas are optimized for market-leading dry films and
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Supplier: Ellsworth Adhesives
Description: Versum Materials, formerly Dynaloy, Dynasolve 711 Blue is a solvent that is used to dissolve cured epoxies, photoresist films, silicones, and urethanes. It can also be used for cleaning industrial machinery. It is aluminum-safe and will not cause discoloration. 1 gal Pail.
- Type: Cleaner / Cleaning Agent
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Supplier: Ellsworth Adhesives
Description: Versum Materials, formerly Dynaloy, Dynasolve 750 Cleaner Blue is a solvent that is used to dissolve cured epoxies, photoresist films, silicones, and urethanes. It can also be used for cleaning industrial machinery. It is aluminum-safe and will not cause discoloration. 1 gal Can.
- Type: Cleaner / Cleaning Agent
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Description: FSH-CM series of micro fluid_metering pump systemis a new microfluid metering pump system with high efficiency, high precision,high stability and digital-control. It is suitable for all kinds of automatic dispensing,lineation and continuous filling. Typical Application: PhotoResist coating
- Housing Material: Stainless Steel
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Supplier: GFS Chemicals, Inc.
Description: ITEM#:5910 CAS#: F.W.: NFPA#: Specific Gravity: 1.107 DOT:8/II Descriptions: Contains Cerium IV and Perchloric Acid. A superior etchant solution for preparing printed circuits. Particularly useful with chrome or nichrome photoresists. Specification TEST 1. Cerium IV concentration 0.22 +/-
- Other: Other
- State of Matter: Liquid / Solution
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Supplier: Ushio America, Inc.
Description: Hardening photoresist and coating curved lens surfaces. FEATURES & BENEFITS Ushio’s unique lens design miniaturizes systems by 56% while increasing energy efficiency over standard devices (in the 200 mm type case). Because there is almost no illuminance reduction, no fine adjustment is needed
- Application: Other
- Lamp Intensity: 150 mW/cm²
- Spectral Range: UVA (Long Wave)
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Supplier: Ushio America, Inc.
Description: Hardening photoresist and coating curved lens surfaces. FEATURES & BENEFITS Our telecentric optical system and unique electrical control of our optical manufacturing enable high-intensity parallel light and individual output controls for each irradiation area
- Application: Other
- Configuration: Chamber
- Lamp Intensity: 100 mW/cm²
- Spectral Range: UVA (Long Wave)
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Supplier: Wacker Chemical Corp.
Description: SEMICOSIL® HMN-EL is Hexamethyldisilazane of high purity. Special features high purity low metal content low chloride content low residue on evaporation Application SEMICOSIL® HMN-EL was developed for photoresists used in the semiconductor manufacture. It can be used e.g. as adhesion promoter
- Applications: Adhesives / Sealants, Electronics / Semiconductors
- Form: Liquid / Solution
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Description: FSH-CM series of micro fluid_metering pump systemis a new microfluid metering pump system with high efficiency, high precision,high stability and digital-control. It is suitable for all kinds of automatic dispensing,lineation and continuous filling. Typical Application: PhotoResist coating
- Automation / Control: Automatic
- Spray Technology: Spray / Atomization (Wet Coating)
- System Option / Component: Pump / Compressor
- Wet Spray / Atomization Technology: Mini-spray / Airbrush
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Supplier: Gelest, Inc.
Description: Additional Properties Hydrolytic Sensitivity 4: no reaction with water under neutral conditions Application Comonomer with chloromethylstyrene for RIE resistant photoresist.1 Reference 1. Mixon, D. et al. J. Vac. Sci. Technol., B 1989, 7(6), 1723. Safety Packaging Under Nitrogen Store Cold
- Flash Point: 145 F
- Inorganic Compounds: OrganoMetallics
- Ionic Component: Metalloids (B, Si, Ge, etc.), Non-Metals (C, N, O, P, S)
- Purity: 97 %
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Supplier: Gelest, Inc.
Description: Additional Properties Hydrolytic Sensitivity 4: no reaction with water under neutral conditions Application UV sensitizer for poly(t-butoxycarbony loxystyrene) chemically amplified photoresist.1 Reference 1. Hinsberg, W. et al. J. Vac. Sci. Technol., B 1998, 16, 3689. Safety Packaging Under
- Flash Point: 293 F
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Mitsui Chemicals America, Inc. markets raw materials for the manufacture of photoresist chemicals through its affiliation with Honshu Chemical Industry Co. Ltd. (Honshu Chemical), a subsidiary of its parent company, to the United States market. Photoresists are light sensitive polymers that are (read more)
Browse Monomers, Intermediates, and Base Polymers Datasheets for Mitsui Chemicals America, Inc. -
removal with standard photoresist removal chemistries Suitable as top imaging resist in bi-layer lift-off processes Material uses Deposition patterning of insulator layers MEMS and sensor devices Optical and photonic components, such as optical filters RF and microwave device fabrication (read more)
Browse Conformal Coatings Datasheets for Kayaku Advanced Materials, Inc. -
Positive-tone temporary photoresist.
(read more)
Browse Conformal Coatings Datasheets for Kayaku Advanced Materials, Inc. -
What is Photo Chemical Machining? Before diving into its applications, it's important to briefly understand the PCM process. PCM involves coating a metal sheet with a photoresist, which is then exposed to UV light through a photomask with the desired design (read more)
Browse Electrochemical, Photochemical, and Chemical Milling Services Datasheets for Conard Corporation (The) -
innovation and technological advancement. This latest product represents the next generation within MacDermid Alpha's MICROFAB TS-650 process, enhancing its wafer level packaging (WLP) solder plating portfolio. It provides significant improvements over the existing process including photoresist (read more)
Browse Plating Chemicals and Anodizing Chemicals Datasheets for MacDermid Alpha Electronics Solutions -
times, excessive temperatures can lead to over-etching, loss of precision, and undercutting (where etchant removes material under the photoresist mask). Lower (read more)
Browse Electrochemical, Photochemical, and Chemical Milling Services Datasheets for Conard Corporation (The) -
) pleated filter cartridges are widely used in these applications due to their chemical resistance, high filtration efficiency, and durability. Electronic chemicals:ultra-pure solvents, photoresists, etchants, and cleaning agents, are critical in the production of (read more)
Browse Filter Elements Datasheets for Harbory Filtration -
medications and IV solutions. Electronics Manufacturing: Filtration of photoresists and organic solvents in panel production. These filter cartridges are widely adopted in industries requiring stringent contamination control, such as pharmaceuticals, food processing (read more)
Browse Filter Elements Datasheets for Harbory Filtration -
is in continuous motion. Marposs infrared and white-light interferometers can also be used in front-end processes to monitor ultra-thin coatings immediately after deposition. These include photoresists, trench depths, or TSVs with high aspect ratios, all measured with high accuracy (read more)
Browse Dimensional Gages and Instruments Datasheets for Marposs Corp
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Dual-band Photoresists for Better HDI PCB Yield and Productivity
Continuing advances in equipment and materials are necessary to support high-density interconnect (HDI) printed circuit boards (PCBs) with ever-increasing feature densities.
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What is Photo Etching?
Photo etching is a process used in the creation of integrated circuits, that combines photolithography with the etching process. Photolithography is used to form patterns on semiconductor substrates coated with photoresist, resulting in selective developing of the photo-resist, when exposed
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
photoresist removal tool. Gasonics, a supplier of photoresist and residue removal systems, previously said it was buying the Fremont, Calif.-based company to expand its presence in Asia as well as to add new development capabilities. Monterey snags patent for IC physical design software Surge
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
for Quad Data Rate SRAM IBM to disclose details of new photoresist for 0.10-micron processing Cambridge Silicon Radio demonstrates single-chip Bluetooth radio IC Chip capacity is so tight 'overshooting' isn't likely in 2000 ST Micro teams with Rise Technology to tackle Internet appliance market Japanese
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
, ASICs to new logic devices LSI Logic to acquire NeoMagic's optical mixed-signal engineering business Coming soon: 'smart' cardboard boxes with RFID chips from Motorola Samsung claims breakthrough in photoresist for 193-nm lithography PMC-Sierra earnings take off, but investors punish share price MIPS
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
for the North American semiconductor equipment industry. A book-to-bill of 1.28 means that $128 worth of new orders were received for every $100 of product billed for the month. Researchers probe photoresists for next-gen ICs Government, industry and university researchers have joined forces to search
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
plans to pare back its electrochemical mechanical deposition (ECD) and wafer handling units. Sematech opens EUV resist center Chip-making consortium International Sematech announced the opening of an R &D center that will explore and develop next-generation photoresists for extreme ultraviolet (EUV
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
the Enviro Advanced Dry Strip System, is a multi-chamber, single-wafer photoresist stripper and polymer-removal tool that incorporates both microwave downstream and low-energy plasma. Singapore's STATS lowers forecast for next two quarters SINGAPORE -- Citing a slowdown in its IC-packaging, assembly
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Resistive technique ‐ a contribution of the chemistry to the electronics
… components will be influenced by the chemistry deciding: Whether in the region the photoresist for the production …
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Practice knowledge Mikrosystemtechnik
… in visible or durchstrahlt UV vicinity and used a photosensitive layer (so-called photoresist ) of only 1 …
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Sensor technique
… first step, the substrate or the semiconductor wafers with a photosensitive lacquer (photoresist, photoresist ) are laminated and …
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Soft lithography
The photo resistive layer projected becomes.
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Polymer Engineering
Two types of resists that can be used give it: an etching resist ( photoresist ) or a Galvanoresist …
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Materials for the optical data storage
… research of the GeschbyisbereichsInformationstechnik of the Hoechsi AG and rnit of the development of photoresist was charged.
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Polymers: synthesis, properties and applications
… copolymers (COCs) find the application as technical plastics, material for medical packages, optical waveguide, adhesives and photoresist .
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Bioinspired adhesion of system ‐ competing with the gecko
A of wafers transferring the, photo commonly silicone, is coated with a UV-curable to maggot of resist and exposed through a lithography mask, pattern .