SilicideTechnology for Integrated Circuits

REFERENCES

[1] G. Ottaviani, K.N. Tu, J.W. Mayer [ Phys. Rev. B (USA) vol.24 (1981) p.3354]

[2] T.G. Finstad, J.W. Mayer, M.-A. Nicolet [ Thin Solid Films (Netherlands) vol.51 (1978) p.391]

[3] K.N. Tu [ J. Appl. Phys. (USA) vol.48 (1977) p.3379]

[4] R. Pretorius, C.L. Ramiller, S.S. Lau, M.-A. Nicolet [ Appl. Phys. Lett. (USA) vol.30 (1977) p.501]

[5] K. Nakamura, J.O. Olowolafe, S.S. Lau, et al. [ J. Appl. Phys. (USA) vol.47 (1976) p.1278]

[6] S. Petersson, E. Mgbenu, P.A. Tove [ Phys. Stat. Sol. A (Germany) vol.36 (1976) p.217]

[7] N.F. Podgrushko, N.F. Selivanova, L.A. Dvorina [ Izvestiya Akademii Nauk SSSR, Neorganicheskie Materialy (Russia) vol.10 (1974) p.150]

[8] K.E. Sundstrom, S. Petersson, P.A. Tove [ Phys. Stat. Sol. A (Germany) vol.20 (1973) p.653]

[9] R. Anderson, J. Baglin, J. Dempsey, et al. [ Appl. Phys. Lett. (USA) vol.35 (1979) p.285]

[10] M.W. Kleinschmit, M. Yeadon, J.M. Gibson [ Appl. Phys. Lett. (USA) vol.75 (1999) p.3288]

[11] C. Canali, F. Catellani, G. Ottaviani, M. Prudenziati [ Appl. Phys. Lett. (USA) vol.33 (1978) p.187]

[12] J.O. Olowolafe, M.-A. Nicolet, J.W. Mayer [ Thin Solid Films (Netherlands) vol.38 (1976) p.143]

[13] V. Koos, U. Beck, H.-G. Neumann [ Phys. Stat. Sol. A (Germany) vol.37 (1976) p.193]

[14] F.M. d Heurle [ Thin Films and Interfaces II. Materials Research Society Symposium Proceedings (1984) p.3]

[15] F.M. d Heurle, C.S. Petersson, J.E.E. Baglin, S.J. La Placa, C.Y. Wong [ J. Appl.

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