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Supplier: PTB Sales, Inc.
Description: Output Impedance Range Each MDX is equipped with a built in impedance matching transformer. These tap-selectable transformers are available in high Z, standard Z or low Z configurations. With the proper transformer and tap, load impedances requiring voltages from 400 V to 1,250 V can be
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Supplier: PTB Sales, Inc.
Description: Output Impedance Range Each MDX is equipped with a built in impedance matching transformer. These tap-selectable transformers are available in high Z, standard Z or low Z configurations. With the proper transformer and tap, load impedances requiring voltages from 400 V to 1,250 V can be
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Supplier: Advanced Energy Industries, Inc.
Description: With breakthrough stability, accuracy, and reliability, Crystal innovation powered large area dual-magnetron applications into the high-tech era. Single box solution Robust communications (Analog, Profibus, RS-232, 422, 485) Water and air cooling combined
- AC Input Voltage: 480 volts
- AC Output Current: 220 to 700 amps
- AC Output Voltage: 1100 to 1460 volts
- DC Output Power: 60000 to 180000 watts
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Supplier: Advanced Energy Industries, Inc.
Description: pulsing Ascent® AP power supplies deliver unprecedented plasma control in a compact solution for single-magnetron and dual-magnetron sputtering. Advanced Energy’s patented pulsing technology enables remarkable arc prevention, higher power levels, and increased
- DC Output Current: 75 to 80 amps
- DC Output Power: 30000 watts
- DC Output Voltage: 1000 volts
- Output Frequency: 5.00E-4 to 0.1500 MHz
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Supplier: Advanced Energy Industries, Inc.
Description: , repeatable process through arcing conditions Primary/secondary for high power applications Higher power levels with reduced arc damage As manufacturing techniques advance, new materials and cathode designs pose greater challenges to process stability and film
- AC Input Voltage: 400 to 480 volts
- DC Output Power: 30000 to 60000 watts
- Input Frequency: 50 to 60 Hz
- Type: DC Power Supply, Plasma Power Supply
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Supplier: Advanced Energy Industries, Inc.
Description: organization Tight regulation, superior arc quenching, and low stored output energy make MDX Series DC power supplies an industry leader. Intended for continuous hard use in a vacuum environment, these rugged power supplies are most commonly used as DC magnetron sputtering
- AC Input Voltage: 115 to 230 volts
- DC Output Power: 500 to 2000 watts
- Input Frequency: 50 to 60 Hz
- Technology: Linear, Switching
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Description: This new edition contains many new terms associated with pulse operation of microwave tubes as well as new terminology relating specifically to amplifier tubes and oscillator tubes. Four new sections covering terminology applicable to disk seal tubes, magnetrons, high-power klystrons
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Description: This new edition contains many new terms associated with pulse operation of microwave tubes as well as new terminology relating specifically to amplifier tubes and oscillator tubes. Four new sections covering terminology applicable to disk seal tubes, magnetrons, high-power klystrons
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Supplier: CSA Group
Description: This new edition contains many new terms associated with pulse operation of microwave tubes as well as new terminology relating specifically to amplifier tubes and oscillator tubes. Four new sections covering terminology applicable to disk seal tubes, magnetrons, high-power klystrons
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Description: . At frequencies above about 200 megacycles,the power is generated by devices other than a conventionalvacuum tube, such as a magnetron, Klystron or othermicrowave device. A dielectric heating generator is normallya high-voltage generator, and application requireshigh-voltage
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Supplier: Deposition Sciences, Inc.
Description: MICRODYN TECHNOLOGY MicroDyn is DSI’s proprietary version of magnetron sputtering optimized for high throughput. MicroDyn utilizes an octagonally shaped chamber, where electrically conductive (metal or semiconductor) coating targets are arranged around the periphery, and the parts
- Coating Process: Thin Film Coating
- Functional / Performance: Abrasion Resistant, Antireflective, Chemical Resistant, Dielectric, Heat Resistant / High Temperature, Reflective
- Industry Served: Aerospace, Automotive, Electronics, Government, Medical / Healthcare, Military Specification, OEM / Industrial, Other
- Location: North America
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Supplier: Nikon Metrology
Description: scanning electron microscope. This coater uses a low voltage discharge technique with a magnetron electrode for high efficiency, cold sputtering. Low voltage sputtering, as well as having the sample isolated from the electrode, minimizes sample damage. JEOL’s Smart Coater is simple
- Applications & Materials Processed: Research / Surface Analysis
- Coating System Type: Batch System (Single Chamber / Multiple Wafers), Laboratory / Benchtop
- Materials Processed (Deposit or Substrate): Metal
- Maximum Part Diameter / Width: 49.5 mm
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Description: 300?) guarantee the quality of ceramic and the metallized layer, also reduce the cost. Direct Plated Copper Substrate Applications:- High Power LED Packaging- Hybrid and electric automobile power management electronics- RF microwave communication- Substrates for solar
- Applications: Other
- Material Type: Specialty Ceramic
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Description: Feedthroughs Gas Detectors Microscopes (TEM, SEM)High Voltage Feedthroughs High-temperature Feedthroughs RF Feedthroughs Optoelectronics and Power Tube Laser Tubes Thyristors Diodes And etc
- Applications: Other
- Material Type: Specialty Ceramic
- Performance Features: Metallized / Silvered
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Supplier: Denton Vacuum
Description: Compact, High Performance Sputtering Platform The Desktop Pro provides high performance sputtering in a compact and economical system. Save Space The Desktop Pro requires less than 36" of countertop space. Cost Efficient Operation Power two cathodes from a
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Supplier: Anton Paar
Description: two reliable magnetrons of 850 W each. Reaction control Unpulsed microwave power over the whole range ensures precise control of critical reactions. Cooling: fast and quiet The integrated forced-air cooling system with air gap design cools the vessels within
- Digestion Type: Acid Digestion, Microwave Digestion
- Display Type: Digital Numerical Display
- Local Interface: Digital Front Panel
- Pressure Range: 290 to 1160 psi
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Supplier: ValueTronics International, Inc.
Description: The N2771A is a used Voltage Probe from Agilent. Use an electrical probe to test equipment and measure currents and voltages. Probes are an integral part of any electrical power testing toolbox to ensure accurate measurements, reliability, and safety. Use a high-voltage probe meter for
- Bandwidth: 50 MHz
- Probe Configuration: Alligator Clip, Hook
- Probe Type: Voltage, Current
- Voltage Rating: 30000 volts
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Supplier: Fredericks Company - Televac
Description: Vacuum Sensor Range: (1x10-2 to 1x10-11 Torr) Ignites 10 times faster than standard cold cathodes during power interruption at ultra high vacuum. Robust Construction: All wetted materials are 304 stainless. Metal
- Device Category: Sensor
- Media: Gas
- Operating Temperature: 32 to 122 F
- Pressure Reading: Gauge, Vacuum
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Description: can be welded with stainless steel by argon arc welding, so as to realize the airtight connection between the ceramic part and the metal structural part. Ceramic Metal Brazing Parts Applications Ceramic metal brazing parts are used in vacuum switches for electric power and
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Supplier: Plansee SE
Description: sensitive to temperature and can be sputtered at extremely high power densities of up to 30 kW/m. Monolithic targets now with ID-coating. You want to save costs? Then we have something new for you: A polymer-based inner diameter coating for monolithic sputtering targets. Find
- Type: Sputtering Target
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Traveling wave tube X-ray tube assembly Electrosurgical instruments Implantable packaging and feedthrough Gas detector Microscope (TEM, SEM) High-voltage feedthrough High-temperature feed component Radio frequency feedthrough Photoelectric and power tubes Laser tube Thyristor Diode (read more)
Browse Industrial Ceramic Materials Datasheets for 3X Ceramic Parts Company Limited -
. Another characteristic that makes it suited for both thin film and thick film metalization is its smooth surface. 96% alumina substrate is widely utilized in LED packages, chip resistor substrates, HIC substrates for heat dissipation, high-frequency power electronics, and other applications (read more)
Browse Industrial Ceramic Materials Datasheets for Xiamen Unipretec Ceramic Technology Co., Ltd. -
-MWIR 5um. Capabilities include antireflective (AR) and highly reflective (HR) metallic coatings, conductive, beam splitter coatings, and high laser damage capability. Coating techniques include Magnetron sputtering, ion assisted E-beam, and fluoride deposition. And finally, the heritage of your (read more)
Browse Optical and Light Microscopes Datasheets for Zygo Corporation -
magnetron. After use, you must discharge them carefully. Because they contain dangerous amounts of energy. Electrolytic Capacitors Electrolytic capacitors are used very largely in power supplies and in audio systems. They come in a small size and have high capacitance. This (read more)
Browse Aluminum Electrolytic Capacitors Datasheets for ODG (Origin Data Global)
More Information Top
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Phase locking of two long-pulse, high-power magnetrons
In a subsequent experiment we determined that the free running frequencies of the two high power magnetrons were separated by 5 MHz.
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Series resonant ZCS‐PFM DC‐DC power converter with high‐frequency high‐voltage transformer link for high‐power magnetron drive
Transformer parasitic parameters and lossless inductive snubber assisted zero current soft switching DC-DC converter for high power magne- tron drive.
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A Scientist's War: The diary of Sir Clifford Paterson 1939-45
Randall coming on Friday re. high power magnetron .
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An ionization region model for high-power impulse magnetron sputtering discharges
…p 11 [25] Andersson J and Anders A 2009 Self-sputtering far above the runaway threshold: an extraordinary metal-ion generator Phys. Rev. Lett. 102 045003 [26] Kadlec S 2007 Simulation of neutral particle flow during high power magnetron impulse Plasma Process.
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Hysteresis-free deposition of niobium oxide films by HiPIMS using different pulse management strategies
Technol. 204 2159–64 [40] Kadlec S 2007 Simulation of neutral particle flow during high power magnetron impulse Plasma Process.
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Development and Optimization of High-Voltage Power Supply System for Industrial Magnetron
Moreover, the parallel operation of two converters with phase shifted gating signal is proposed to reduce the output current ripple and increase power capability for higher power magnetron drive.
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High frequency transformer linked direct high frequency soft switching inverter type AC-DC power converter with boost function for consumer magnetron drive
Abstmct -The oscillationcut-oN voltage (Ebm) is an important parameter of the characteristic constant of a high power magnetron .
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Linear Analysis Of The High-Power Magnetron
H. Uhm and H. Brandt, "Linear Dispersion Relation for High Power Magnetron ," Proc. of High Power Microwave Workshop, May 1987.
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New experimental results at long pulse and high repetition rate, from Varian's phase-locked magnetron array program
High power magnetron array experiment with schematic diagram at left and end view at right.
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The high-power pulsed magnetron: a review of early developments
(2) CENTIMETRE-WAVE DEVELOPMENT: THE INITIAL STEPS It is generally known that early in 1940 an experimental high power magnetron using cylindrical cavity resonators as circuit elements was independently produced by J. T. Randall and H. A. H. Boot* at Birmingham University…
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