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Description: This document describes laser radiation hazards arising in laser processing machines, as defined in 3.7. It also specifies the safety requirements relating to laser radiation hazards, as well as the information to be supplied by the manufacturers of such equipment (in addition
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Supplier: WDI Wise Device Inc.
Description: The LSCM has the advantages of a confocal laser scanning microscope with the size and price of an IR camera. The combination of high contrast imaging, infrared capabilities, extremely small size and low cost enables many new applications.
- Measurements: Area Mapping, Defects / ADC, Thickness - Film / Layer
- Applications: CVD / PVD Films, Flat Panel Displays, Optical Components, Packaged ICs / Ceramic Substrates, Photolithography / Patterning, Semiconductor Wafers
- Mounting / Loading: In-situ / System Mounted
- Form Factor: Monitor / Instrument
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Supplier: WDI Wise Device Inc.
Description: This is the only commercially available microscope guaranteeing transmission of more then 80% for all four YAG laser harmonics: 266, 355, 532, and 1064nm - without compromising the review channel fidelity. The MIC4 microscope is instrumental in laser repair of TFT arrays over the
- Applications: CVD / PVD Films, Electroplated Films, Flat Panel Displays, Optical Components, Packaged ICs / Ceramic Substrates, Photolithography / Patterning
- Measurements: Defects / ADC
- Mounting / Loading: Floor Mounted / Stand-alone, In-situ / System Mounted
- Form Factor: Monitor / Instrument
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Description: dealing with noise as a hazard from laser processing machines are not included in ISO 11553-1:2005. They will be included in a subsequent amendment. ISO 11553-1:2005 is not applicable to laser products, or equipment containing such products, which are manufactured solely and expressly
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Supplier: CSA Group
Description: dealing with noise as a hazard from laser processing machines are not included in ISO 11553-1:2005. They will be included in a subsequent amendment. ISO 11553-1:2005 is not applicable to laser products, or equipment containing such products, which are manufactured solely and expressly
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Description: dealing with noise as a hazard from laser processing machines are not included in ISO 11553-1:2005. They will be included in a subsequent amendment. ISO 11553-1:2005 is not applicable to laser products, or equipment containing such products, which are manufactured solely and expressly
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Description: provided with such machines. Excluded from the requirements of this document are: photolithography; holography; equipment used in medical applications; data storage; laser printers; and copiers.
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Supplier: Linde North America, Inc.
Description: For over twenty years, the excimer laser industry has relied on our SPECTRA™ lithography gases. SPECTRA gases were used in the development of the earliest lasers for lithography and are now the most widely used excimer gases for DUV photolithography in the semiconductor
- Product Form: Gas
- Supply Options: Gas Cylinder, Other
- Composition: Gas Mixture
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Supplier: WDI Wise Device Inc.
Description: WDI's Laser Auto-Focus ATF6 sensor is an active optical device (incorporating a class II semiconductor laser) designed to provide focusing servo systems with fast feedback signals needed to quickly and accurately focus all types of infinity corrected microscopes.
- Applications: CVD / PVD Films, Flat Panel Displays, Photolithography / Patterning, Semiconductor Wafers
- Mounting / Loading: In-situ / System Mounted
- Features: Non-contact, Non-destructive
- Technology: Optical / Imaging System
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Description: Novaclad® HDI is built upon the rock of our proprietary adhesiveless laminate that leverages vacuum deposition, additive copper processes, and photolithography to enable fine line circuitry coupled with laser-drilled micro-vias. Novaclad HDI circuitry withstands the toughest conditions
- Applications: Aerospace Equipment, Automotive Equipment, Commercial Equipment, Industrial Equipment, Medical Equipment, Military Equipment
- Features: Double Sided, Shielding, Single Sided
- Surface Finish: Gold, Nickel, Silver, Tin
- Mounting: Surface Mount, Through-Hole
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Supplier: Conax Technologies
Description: introduction of a laser into a photolithography tool used for interferometry measurements. Interferometers are used to accurately control stage movement for the proper positioning of the wafer and reticle stages relative to each other. The need for high accuracy in this area will
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Supplier: Bullen Ultrasonics, Inc.
Description: photolithography step. The material removal mechanism is based on propagation and intersection of cracks generated by the impact of abrasive particles on the brittle materials.
- Micro Machining Capabilities: CNC Machining, Drilling, Electrode EDM, Laser Machining, Milling, Wire EDM
- Materials: Carbide, Ceramics, Composites, Diamond / PCD, Glass, Glass Ceramics, Quartz, Sapphire / Ruby
- Special Services: Design Assistance, High Volume Production, Low Volume Production, Prototype Services
- Features: Midwest US Only, North America, Other, United States Only
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Description: cells- Power semiconductor packaging- Laser system- Fiber laser pump DBC vs DPC DBC being suited to high current capacity, however limited on circuit design. DPC allowing for finer tracks and through hole connection.
- Features: Other, Specialty / Other, Specialty Ceramic
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Supplier: SPIE - Education
Description: Applications of micro and nano-scale optics are widespread in essentially every industry that uses light in some way. A short list of sample application areas includes communications, solar power, biomedical sensors, laser-assisted manufacturing, and a wide range of consumer electronics.
- Type: Course
- Technology / Subject Expertise: Design / Engineering Methods (ESDU, DFx, etc.), Electronics, Nanomaterials / Nanotechnology, Photonics / Optics
- Delivery: Internet / Online, On-site / In Plant
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Supplier: Electro Optical Components, Inc.
Description: liquid phase epitaxy (LPE) and metalorganic chemical vapor deposition (MOCVD), photolithography, assembling, characteristics testing and producing of related electronic devices. IBSG produces the full line of light emitting diodes, laser diodes and photodiodes for mid-infrared spectral
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Supplier: Edmund Optics Inc.
Description: and Gold for the IR. Free from the problems of chromatic aberration and material absorption associated with standard microscope objectives, these components are ideal for applications requiring high throughput and excellent resolution, including FTIR spectroscopy and microscopy,
- Magnification: 25 X
- Numerical Aperture: 0.4 NA
- Working Distance: 14.500000000000002 mm
- Field of View: 0.7200000000000001 mm
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Supplier: Edmund Optics Inc.
Description: and Gold for the IR. Free from the problems of chromatic aberration and material absorption associated with standard microscope objectives, these components are ideal for applications requiring high throughput and excellent resolution, including FTIR spectroscopy and microscopy,
- Magnification: 15 X
- Numerical Aperture: 0.28 NA
- Working Distance: 24.5 mm
- Field of View: 1.2000000000000002 mm
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Supplier: Edmund Optics Inc.
Description: and Gold for the IR. Free from the problems of chromatic aberration and material absorption associated with standard microscope objectives, these components are ideal for applications requiring high throughput and excellent resolution, including FTIR spectroscopy and microscopy,
- Magnification: 15 X
- Numerical Aperture: 0.28 NA
- Working Distance: 24.5 mm
- Field of View: 1.2000000000000002 mm
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Supplier: Edmund Optics Inc.
Description: and Gold for the IR. Free from the problems of chromatic aberration and material absorption associated with standard microscope objectives, these components are ideal for applications requiring high throughput and excellent resolution, including FTIR spectroscopy and microscopy,
- Magnification: 15 X
- Numerical Aperture: 0.5 NA
- Working Distance: 23.2 mm
- Field of View: 1.2000000000000002 mm
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Description: fabricate components for CVD, ion implants, photolithography, and semiconductors. Industrial furnaces and thermal couple protectors use alumina tubes. Traditionally, alumina ceramics are ideal for products such as injector tubes, gas nozzles, and insulators. Because of its high hardness,
- Oxide Type: Alumina / Aluminum Oxide
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Supplier: Deposition Sciences, Inc.
Description: operating at temperatures as high as 1000°C and can withstand the thermal shock of direct transition from liquid nitrogen to boiling water. MicroDyn coatings, including complex filters, can be patterned using both contact masking and photolithography. IsoDyn™ Low Pressure Chemical Vapor
- Coating: Antireflection, Beamsplitter, Dielectric, Filter, Mirror
- Materials: Glass, Substrate Fabrication
- Wavelength Range: IR, UV, Visible
- Features: North America, Other, United States Only
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methods such as photolithography or laser direct imaging (LDI). Etching Process: Remove extra copper with chemical etching to form the circuit pattern. Lamination Rigid Lamination: laminate the pre-treatment inner (read more)
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More Information Top
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The Design Of Excimer Lasers For Use In Microlithography
That early work was done using a contact printing technique, and demonstrated many of the attributes of excimer laser photo- lithography .
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Industrial Applications Of Excimer Lasers
Excimer laser photolithography : .
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Industrial Applications Of Excimer Lasers
Excimer laser photolithography : .
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CCD Image Sensors in Deep-Ultraviolet
In addition to being technologically important in the microelectronics sec- tor, SiO2 has unique optical features that are favorable for use as DUV optics (e.g., glasses and lenses) in DUV excimer laser photolithography systems [53].
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Towards registered single quantum dot photonic devices
The registration process involves the fabrication of alignment markers at cryogenic temperatures by utilizing two-photon absorption (TPA) laser photolithography of SU-8 photoresist [7, 8].
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Impact on Diffraction Efficiency of Binary Optical Elements for Spot Exposure Superposing Ratio
In fabrication of free form optical surfaces, spot exposure is a typical mode in laser photolithography .
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A Negative Aqueous Developable Electron-Beam Resist Under Deep UV Exposure
14- F.N. Goodall and R.A. Lawes, "Excimer laser photolithography with 1:1 Wynne Dison optics ", SPIE vol.
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Japanese marketplace
Before I came to this show I talked to a couple people who are in the laser photolithography market.
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