Mixed Analog-Digital Vlsi Devices and Technology

References

  1. S. M. Sze, VLSI Technology, 2d ed., McGraw-Hill, New York, 1988.

  2. W. S. Ruska, Microelectronics Processing, McGraw-Hill, New York, 1987.

  3. S. K. Ghandi, VLSI Fabrication Principles Silicon and Gallium Arsenide, 2d ed., Wiley, New York, 1994.

  4. J. Y. Chen, CMOS Devices and Technology for VLSI, Prentice-Hall, Englewood Cliffs, NJ, 1990.

  5. D. A. Antoniadis, "MOS Transistor Fabrication," in Y. P. Tsividis, Operation and Modeling of the MOS Transistor, McGraw-Hill, New York, 1987.

  6. E. Demoulin, "Fabrication Technology of MOS IC's for Telecommunications," chap. 1 in Y. Tsividis and P. Antognetti, eds., Design of MOS VLSI Circuits for Telecommunications, Prentice-Hall, Englewood Cliffs, NJ, 1985.

  7. S. K. Tewksbury, Wafer Scale Integrated Systems: Implementation Issues, Kluwer Academic Publishers, Boston, 1989.

  8. D. J. Allstot and W. C. Black, Jr., "Technological Design Considerations for Monolithic Switched-Capacitor Filtering Systems," Proceedings of the IEEE, 71(8):967-986, August 1983.

  9. W. H. Hayt, Jr., and J. E. Kemmerly, Engineering Circuit Analysis, 2d ed., McGraw-Hill, New York, 1993.

  10. J. McCreary, "Matching Properties, and Voltage and Temperature Dependence of MOS Capacitors," IEEE Journal of Solid-State Circuits, 16:608-616, December 1981.

  11. J. B. Shyu, G. C. Temes, and K. Yao, "Random Errors in MOS Capacitors," IEEE Journal of Solid-State Circuits, 17:1070-1076, December 1982.

  12. J. B. Shyu, G. C. Temes, and F. Krummenacher, "Random Error Effects in Matched MOS Capacitors and Current Sources," IEEE Journal of Solid-State Circuits, 19:948-955, December 1984.

  13. A. T. Behr, M. C. Schneider, S. N. Filho, and C. G. Montoro, "Harmonic...

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