TABLE OF CONTENTS Werner Kern and Klaus K. Schuegraf
The aim of this book is to provide a concise reference and description of the processes, methods, and equipment for depositing technologically important materials. Emphasis is placed on the most recently developed processes and techniques of film deposition for applications in high technology, in particular, advanced microelectronic device fabrication that requires the most sophisticated and demanding approaches. The volume is intended to serve as a handbook and guide for the practitioner in the field, as a review and overview of this rapidly evolving technology for the engineer and scientist, and as an introduction to the student in several branches of science and engineering.
The discussions of the principles of operation of deposition equipment and its suitability, performance, control, capabilities, and limitations for production applications are intended to provide the reader with a basic understanding and appreciation of these systems. Key properties and areas of application of industrially important materials created by thin-film deposition processes are described. Extensive use of references, reviews, and bibliographies is made to provide source material for specific use and more detailed study.
The chapter topics have been carefully selected to include primarily advanced and emerging deposition technologies in this rapidly evolving field. Many other important deposition technologies have not been included if adequate recent reviews are already available, or if the technologies are primarily intended for forming thick films or coatings that generally exceed a thickness of about ten micrometers, but the importance...
