Products & Services
See also: Categories | Featured Products | Technical Articles | More Information-
Supplier: CIQTEK Co., Ltd
Description: High-speed scanning electron microscope for cross-scale imaging of large-volume specimensCIQTEK HEM6000 facilities technologies such as the high-brightness large-beam current electron gun, high-speed electron beam deflection system, high-voltage sample stage deceleration,
- Accelerating Voltage: 0.1000 to 30 kilovolts
- Application: Metallurgical, Semiconductor Inspection
- Computer Interface: Yes
- Digital Display: Yes
-
Supplier: CIQTEK Co., Ltd
Description: CIQTEK SEM4000Pro is an analytical field emission scanning electron microscope equipped with a high-brightness long-life Schottky field emission electron gun. With the three-stage condenser electron optics column design for beam currents up to 200 nA, SEM4000Pro delivers
- Accelerating Voltage: 0.2000 to 30 kilovolts
- Application: Metallurgical, Semiconductor Inspection
- Computer Interface: Yes
- Digital Display: Yes
-
Supplier: JEOL USA, Inc.
Description: "NEOARM" / JEM-ARM200F comes with JEOL’s unique cold field emission gun (Cold FEG) and a new Cs corrector (ASCOR) that compensates for higher order aberrations. The combination of a Cold FEG and ASCOR enables atomic-resolution imaging at not only 200 kV accelerating voltage, but also a low
- Accelerating Voltage: 30 to 200 kilovolts
- Microscope Type: Transmission Electron Microscope (TEM)
-
-
Description: Applies to electroheating installations with one or more electron guns as heating source. Covers test methods to determine the essential parameters and contains technical data and characteristics.
-
Supplier: Hitachi High Technologies America, Inc.
Description: The Cold Field Emission source is ideal for high-resolution imaging with a small source size and energy spread. Innovative CFE Gun technology contributes the ultimate FE-SEM with superior beam brightness and stability, affording high-resolution imaging and high-quality elemental analysis.
- Application: Biological / Life Science, Medical / Forensic
- Microscope Type: Scanning Electron Microscope (SEM)
-
Description: IEC 60703:2008 lays down the test methods to determine the essential parameters, technical data and characteristics of electroheating installations comprising one or more electron guns. The significant changes with respect to the previous edition are as follows: the latest edition of
-
Description: Deals with safety of electroheat installations with electron guns and applies to all electroheat applications with electron guns. May also be used for non-thermal applications with electron guns and equipment employing glow discharge systems. Applies also to
-
Description: Deals with the safety of electroheating installations with electron guns and is to be read in conjunction with IEC 60519-1. Applies also to the high-voltage source supplied to electron guns and may also be used for equipment employing glow discharge heating systems, where
-
Supplier: Accuris
Description: Test Methods for Electroheating Installations with Electron Guns
-
Supplier: Accuris
Description: Test methods for electroheating installations with electron guns
-
Supplier: Electron Beam Engineering, Inc.
Description: The "BEAMER" line is a completely new design of electron beam welders taking advantage of all the latest developments in the fields of electronic control systems, high voltage power supplies, vacuum technology and electron gun design. It is available in four different cubed
-
Supplier: Accuris
Description: Safety in Electroheat Installations Part 7: Particular Requirements for Installations with Electron Guns
-
Supplier: Accuris
Description: Safety in electroheat installations Part 7: Particular requirements for installations with electron guns
-
Supplier: Hiden Analytical
Description: Static and Dynamic SIMSAuger Electron SpectroscopyIon Beam SputteringSurface Science StudiesRastering / Depth Profiling
-
Supplier: Leister USA
Description: Powerful Compact Robust Construction site tried and tested
-
Supplier: CSA Group
Description: IEC 60703:2008 lays down the test methods to determine the essential parameters, technical data and characteristics of electroheating installations comprising one or more electron guns. The significant changes with respect to the previous edition are as follows: the latest edition of
-
Supplier: HiTek Power Ltd.
Description: , ripple voltages as low as 500µV, temperature coefficients as low as 2ppm/ºC over the operating temperature range and unipolar and bipolar output voltages from 200V to 60kV. More information can be found in the Custom Built Gun Power Supplies overview sheet. Features
-
Supplier: CSA Group
Description: Deals with safety of electroheat installations with electron guns and applies to all electroheat applications with electron guns. May also be used for non-thermal applications with electron guns and equipment employing glow discharge systems. Applies also to
-
Supplier: Hiden Analytical
Description: Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package.
-
Supplier: Leister USA
Description: Powerful Compact Robust Construction site tried and tested
- Equipment Type: Gun / Iron / Torch
-
Description: ISO 24236:2005 specifies a method for evaluating the constancy and repeatability of the intensity scale of Auger electron spectrometers, for general analytical purposes, using an electron gun with a beam energy of 2 keV or greater. It is only applicable to instruments that
-
Supplier: JEOL USA, Inc.
Description: Features Electron Probe Microanalyzer (EPMA) has been utilized as a tool for research development and quality assurance in a variety of industrial fields such as steel, automobile, electric component, battery material and its application are expanding more and more. In addition, in
-
Description: instruments used in either direct or differential mode, where the resolution is less than or equal to 0,5 % and the modulation amplitude for the differential mode, if used, is 2 eV peak-to-peak. It is applicable to those spectrometers equipped with an inert gas ion gun or other method for
-
Description: operated at relative resolutions poorer than 0,2 % in the constant delta E/E mode or 1,5 eV in the constant delta E mode, those requiring tolerance limits of plus or minus 0,05 eV or less, nor those with an electron gun that cannot be operated in the energy range 5 keV to 10 keV. It
-
Supplier: Hitachi High Technologies America, Inc.
Description: As a new brand of FE-SEMs, the Regulus series lineup comprises four models: the Regulus8100, Regulus8220, Regulus8230, and Regulus8240, all of which extend the functions of the SU8200 series with the use of a common platform. With optimized electron optical systems, the new Regulus series
- Application: Biological / Life Science, Medical / Forensic
-
Supplier: Hitachi High Technologies America, Inc.
Description: The HD-2700 is an 80-200 kV field-emission-gun scanning transmission electron microscope (STEM) with secondary electron (SE) imaging capability. Bulk and surface structures of a specimen can be imaged simultaneously. With the option for a probe-forming aberration corrector,
- Application: Biological / Life Science, Medical / Forensic
-
Supplier: Hitachi High Technologies America, Inc.
Description: The SU8200 FE-SEM is equipped with a novel CFE gun which employes Hitachi's patented "Mild Flashing" technology and a new vacuum system, minimizing gas mulecule deposition on the emitter tip. Hitachi's next generation Cold Field Emission SEM offers unmatched low-voltage imaging and
- Application: Biological / Life Science, Medical / Forensic
-
Supplier: CSA Group
Description: ISO 24236:2005 specifies a method for evaluating the constancy and repeatability of the intensity scale of Auger electron spectrometers, for general analytical purposes, using an electron gun with a beam energy of 2 keV or greater. It is only applicable to instruments that
-
Supplier: CSA Group
Description: instruments used in either direct or differential mode, where the resolution is less than or equal to 0,5 % and the modulation amplitude for the differential mode, if used, is 2 eV peak-to-peak. It is applicable to those spectrometers equipped with an inert gas ion gun or other method for
-
Supplier: ASTM International
Description: specimen to the analyzer entrance. Some of the methods described here require an auxiliary electron gun mounted to produce an electron beam of variable energy on the specimen (“electron-gun method”). Other experiments require a sample with a sharp edge, such as a wafer
-
Supplier: ASTM International
Description: specimen to the analyzer entrance. Some of the methods described here require an auxiliary electron gun mounted to produce an electron beam of variable energy on the specimen (“electron-gun method”). Other experiments require a sample with a sharp edge, such as a wafer
-
Supplier: ASTM International
Description: , and in which an auxiliary electron gun can be mounted to produce an electron beam of variable energy on the specimen. 1.2 This practice is recommended as a useful means for determining the specimen area viewed by the analyzer for different conditions of spectrometer operation,
-
Supplier: AENOR
Description: Test methods for electroheating installations with electron guns (Endorsed by AENOR in April of 2009.)
-
Supplier: AENOR
Description: TEST METHODS FOR ELECTROHEATING INSTALLATIONS WITH ELECTRON GUNS. (Endorsed by AENOR in April of 1996.)
-
Supplier: AENOR
Description: Safety in electroheat installations -- Part 7: Particular requirements for installations with electron guns
-
Supplier: Integrated Engineering Software
Description: Multipaction Photomultiplier tubes Charged Particle Beams Electron guns Ion guns Ion implanters Nanotube field emitters Sputtering sources X-ray Ion propulsion
-
Description: ISO 23830:2008 specifies a method for confirming the repeatability and constancy of the positive-ion relative-intensity scale of static secondary-ion mass spectrometers, for general analytical purposes. It is only applicable to instruments that incorporate an electron gun for charge
-
Supplier: HiTek Power Ltd.
Description: Arc and short circuit protected Local or remote operation Filtered Unit Option – below 100kV CE marked Applications: Ion implantation Ion vapour deposition Chemical vapour deposition Electron beam welding Electron guns High voltage testing Particle accelerators
-
Supplier: HiTek Power Ltd.
Description: circuit protected CE marked RoHS available on request Applications: Ion implantation Ion vapour deposition Chemical vapour deposition Electron beam welding Electron guns High voltage testing Particle accelerators
-
Supplier: HiTek Power Ltd.
Description: Arc and short circuit protected Local or remote operation Filtered Unit Option – below 100kV CE marked Applications: Ion implantation Ion vapour deposition Chemical vapour deposition Electron beam welding Electron guns High voltage testing Particle accelerators
-
Supplier: IMI Life Science
Description: Precision high voltage modules delivering exceptionally low levels of noise and drift, designed for easy integration into systems requiring multiple high voltages. Applications include mass spectrometry and electron gun operations. Exceptionally low levels of low frequency (LF
- DC Input Voltage: 24 volts
- DC Output Current: 2.50E-4 to 0.0050 amps
- DC Output Voltage: 15000 volts
- Number of Outputs: 1 #
-
Supplier: Abrisa Technologies
Description: Abrisa Technologies provides high-efficiency coatings for industrial, commercial, and opto-electronic applications. Our broad selection of coatings is applied via electron beam guns or ion-assisted deposition to influence and control reflection, absorbance, resistance, glare, and
- Additional Services / Processes: Inspection / Monitoring, Material Selection / Design Assistance, New / OEM Parts, Specialty / Other
- Cleaning / Parts Washing: Pressure / Spray Washing, Scrub Tank / Immersion Washing, Ultrasonic Cleaning
- Coating Process: Ceramic Coating, Screen Printing / Selective Coating, Thin Film Coating
- Finishing / Surface Treatment: Buffing / Polishing, Mirror Finishing, Sanding / Grinding, Other
-
Supplier: National Bronze & Metals Inc.
Description: C18200 Chromium Copper RWMA Class II Used in resistance welding machine electrodes, seam welding wheels, electrical switch gear, electrode holder jaws, cable connectors, current carrying arms and shafts, circuit breaker parts, arcing and bridging parts, grid side rods in electron tubes
- AISI / AA / CDA Grade: 182
- Applications: Electrical / HV Parts, Resistance Alloy / Heating
- Features: Heat Resistant / Hot Work
- Metal / Alloy Types: Copper, Brass or Bronze Alloy (UNS C)
-
Supplier: National Bronze & Metals Inc.
Description: C18200 Chromium Copper RWMA Class II Used in resistance welding machine electrodes, seam welding wheels, electrical switch gear, electrode holder jaws, cable connectors, current carrying arms and shafts, circuit breaker parts, arcing and bridging parts, grid side rods in electron tubes
- Applications / Industry: Circuit Breakers, Contactors, Electronics (IC Packaging / Interconnect), Switches / Relays
- Conductivity: 80 %IACS
- Form / Shape: Application Specific / Custom, Bar Stock, Rod Stock, Wire
- Length: 144 inch
-
Supplier: Advanced Energy Industries, Inc.
Description: offers dependable, high-stability power supplies for scanning electron microscopes (SEM) with built-in flexibility to accommodate various Schottky emission electron gun configurations. The EG353 series includes Advanced Energy’s Direct Drive Digital Control (D3C) which enables a
-
Supplier: Abrisa Technologies
Description: Abrisa Technologies provides high-efficiency coatings for industrial, commercial, and opto-electronic applications. Our broad selection of coatings is applied via electron beam guns or ion-assisted deposition to influence and control reflection, absorbance, resistance, glare, and
- Functional / Performance: Abrasion Resistant, Antireflective, Chemical Resistant, Conductive, Dielectric, Corrosion / Rust Preventive, Heat Resistant / High Temperature, Oil & Grease Resistant, Reflective, Protective, Waterproof / Water Repellant, Wear / Erosion Resistant
- Hard Coating / Treatment: Yes
- Industry: Aerospace, Automotive, Electronics, Machine Tools, Medical / Healthcare, Military Specification, OEM / Industrial
- Material / Substrate Capabilities: Ceramic, Composites, Glass
-
Description: Implantation Particle Accelerators Electron Guns Features: 160kV - 360kV Outputs Low Ripple, High Stability Overcurrent, Overvoltage and Arc Protection Lightweight, Compact Size
-
Supplier: Abrisa Technologies
Description: Abrisa Technologies provides high-efficiency coatings for industrial, commercial, and opto-electronic applications. Our broad selection of coatings is applied via electron beam guns or ion-assisted deposition to influence and control reflection, absorbance, resistance, glare, and
- Coating: Antireflection, Beamsplitter, Dielectric, Filter, High-Reflector, ITO, Metal, Mirror, Protective, Other
- Regional Preference: North America, United States Only, Southwest US Only
- Substrate Materials: Glass
- Wavelength Range: UV, Visible, IR
-
Supplier: CST - Computer Simulation Technology
Description: CST PARTICLE STUDIO® (CST PS) is a specialist tool for the fast and accurate analysis of charged particle dynamics in 3D electromagnetic fields. Powerful and versatile, it is suitable for tasks ranging from designing magnetrons and tuning electron tubes to modeling particle sources and
- Source Code: Proprietary
- Use: Professional
-
Supplier: Vistec Electron Beam Lithography Group
Description: The Vistec EBPG5200 Series is a further evolutionary progression of Vistec's high-end electron-beam lithography systems now providing full 200mm wafer writing performance. The NEW system is available alongside the successful and field proven 150mm platform in the EBPG5000plus Series. The
-
Supplier: Sonel Test
Description: Easy way to quick and accurate temperature measurements Professional and compact infrared (IR) thermometers are a solution for problems in every area where specific thermal conditions are required. The intuitive one-hand operation of the devices and the ergonomically designed gun
- Interface Options: Other Computer Interface
- Local Interface: Digital Front Panel
-
Supplier: Deposition Sciences, Inc.
Description: evaporative coating chambers are used for complex infrared coatings. Advanced thin film designs are deposited in precision, cryo pumped vacuum chambers using electron beam guns and resistance sources with the option of ion assist. Coatings have minimum scatter and absorption, are
- Coating: Antireflection, Beamsplitter, Dielectric, Filter, Mirror, Other
- Regional Preference: North America, United States Only
- Substrate Materials: Glass, Other
- Substrate Fabrication: Yes
Find Suppliers by Category Top
Featured Products Top
-
your Electron Beam Guns or Magnetron Sputtering applications. We also offer standard coaxial feedthroughs that support the needed signal information for your Crystal Sensor Holders and Crystal Sensing Devices to ensure your coating thicknesses are being deposited correctly. We understand your (read more)
Browse Feedthroughs Datasheets for MPF Products, INC. -
Die/Laser Cut Preforms Gun Applicators View all packaging options (read more)
Browse Epoxy Adhesives Datasheets for Master Bond, Inc. -
Die/Laser Cut Preforms Gun Applicators View all packaging options (read more)
Browse Specialty Adhesives, Sealants, and Compounds Datasheets for Master Bond, Inc.
Conduct Research Top
-
Database For Trace Analysis (.pdf)
Coupled with an Energy Dispersive x-ray System (EDS), the Scanning Electron Microscope (SEM) is often used to analyze trace evidence. Automated identification of gun shot residue is an excellent example of this. The traditional approach has been to mount the unknown in some fashion, insert
More Information Top
Indicates content that may require registration and/or purchase.
-
Intense Electron and Ion Beams
Electron Guns . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
-
Thin-Skin Deployable Mirrors for Remote Sensing Systems
A thin-skin piezoelectric bimorph mirror will bend in response to an applied electric field and can therefore be deformed into desirable shapes using a scanning electron gun .
-
Electron Beams and Microwave Vacuum Electronics
Single-Component Flows 3.5.3 Meltzer Flow 3.5.4 Laminar Noncongruent Beams 4 Electron Guns 4.1 Introduction 4.2 Pierce’s Synthesis Method for Gun Design 4.3 Internal Problems of Synthesis.
-
Proceedings of the XIX international Linac conference
Electron Gun Simulation Using MAGIC .
-
Investigation of multi-charged heavy ion production in an electron beam ion source
This test model utilized an electron gun placed .
-
Deployable large aperture optics system for remote sensing applications.
This report summarizes research into effects of electron gun control on piezoelectric polyvinylidene fluoride (PVDF) structures.
-
Electron Lenses for Super-Colliders
… acting on high-energy protons, do not present any material close to the beam, thus, avoiding material damage and impedance increase; (b) In a typical e-lens configuration, electrons are produced at the cathode of an electron gun and right after interaction …
-
Experimental Innovations in Surface Science
Electron Gun Design and Behavior . . . . . . . . . . . . . . . . . . .
-
Development of an Ultrafast Low-Energy Electron Diffraction Setup
4 Numerical Analysis of a Tip-Based Ultrafast Electron Gun . . . . . .
-
Vacuum Electronics
Gridded electron guns and introduction of the impregnated cathodes in the 1970s.