Products & Services
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Supplier: JST Manufacturing, Inc.
Description: JST's Single Wafer Etching and Stripping System utilizes an automated chemical spray process on a single wafer. The system includes oscillating spray nozzles, adjustable wafer speed (RPM) and precision adjustment of the distance between the nozzles and the surface of the wafer. It
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Supplier: JST Manufacturing, Inc.
Description: JST offers affordable semi-automated systems in both rotary and linear transfer designs. Rotary Transfer stations can accomodate single or dual rotary arms. JST's robot uses DC servo motors for efficient transfers with high reliability. This servomotor technology provides precise position
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Supplier: Jiangyin Deli Laser Solutions Co., Ltd.
Description: Advantages: Single step operation 24hour/day and 7days/week reliable production with minimum maintenances No need of extra toxic and polluting materials High accuracy and good resolutions Very high process speed Features: X-Y-Z- ? four dimensional adjustment for automatic positioning CCD assisted
- Applications: Other
- Automation: Automatic
- Media Handling: Metals, Plastics, Semiconductors / Electronics
- Operation: Electric
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Supplier: Jiangyin Deli Laser Solutions Co., Ltd.
Description: Large market share; State-of-the-art process; Experienced maintenance and technical support personnel Simple and practical equipment design – easy to disassemble and assemble for maintenance; Reduces maintenance costs Applicable materials: Ag, ITO, Cu
- Applications: Other
- Automation: Automatic
- Media Handling: Metals, Plastics, Semiconductors / Electronics
- Operation: Electric
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Supplier: Plasma Etch, Inc.
Description: The generous aluminum chamber accommodates a properly sized active processing surface with our standard configurations having as few as 6 or as many as 24 plasma processing levels, each 24” by 18.” Our oxygen service vacuum pump and booster is equipped with a two point purge system to minimize any
- Applications & Materials Processed: Research / Surface Analysis, Other
- Automated Loading: Yes
- Coating System Type: Factory / Free Standing
- Gas Control Unit: Yes
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Supplier: Plasma Etch, Inc.
Description: Benefits to you are better adhesion or marking, cleaner parts with less labor and reduced chemical expense by eliminating unwelcome and often expensive chemical waste associated with cleaning and priming. The large all aluminum chamber accommodates a generously sized active processing surface, our
- Applications & Materials Processed: Research / Surface Analysis, Other
- Automated Loading: Yes
- Coating System Type: Factory / Free Standing
- Gas Control Unit: Yes
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Supplier: LPKF Laser & Electronics North America
Description: The LPKF ProtoLaser S is a NIR laser with a 25 µm focused beam diameter developed for HF and microwave circuits, as well as digital and analog designs. Rapid surface metal removal is achieved with an LPKF developed laser delamination process or with ablation settings. A wide range of substrates can
- Automation / Control: Windows / PC Control
- Laser Type: Other
- Materials Processed: Semiconductors / Electronics
- Options / Components: Laser Head / Focusing Unit, Laser Optics / Beam Delivery, Laser System Enclosure
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Supplier: Jiangyin Deli Laser Solutions Co., Ltd.
Description: Uses roll-to-roll feeding and unloading for improved processing speeds and more efficient material usage High processing stability and yield rates Save on labor costs and improve production efficiency Technical Specifications (Etching): Size of working area
- Applications: Other
- Automation: Semi-automatic
- Media Handling: Metals, Plastics, Semiconductors / Electronics
- Operation: Electric
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Supplier: Jiangyin Deli Laser Solutions Co., Ltd.
Description: Technical Specifications for LTCC: Processable materials: low temperature co-fired ceramic (LTCC) Processing aperture: =20µm Processing precision: ±5µm Working area: 400mmX400mm Processing speed: 1000-2000 holes per second Technical Specification for Laser Exposure: Working area: 800mmX800mm Minimum
- Applications: Other
- Automation: Semi-automatic
- Media Handling: Metals, Plastics, Semiconductors / Electronics
- Operation: Electric
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Supplier: HORIBA Instruments, Inc.
Description: This emission analysis type end-point monitor is intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process. The newly-developed Rapture Intensity algorithm allows accurate end-point detection by capturing faint signal changes. The ability
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Supplier: JTEKT North America, Inc.
Description: For the semiconductor and LCD production equipment, various performance is needed in high-temperature, corrosion resistance, magnetism resistance and low dust generation characteristics according to each process as well as cleanliness. JTEKT supplies special specification bearings for
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Supplier: Technic, Inc.
Description: both chemistry and equipment. Applications Base and precious metals plating Copper flash plate, panel plate, pattern plate Developing, etching, stripping Chemical cleaning MP100 Advantages Edge-to-edge processing forms a
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Supplier: Terra Universal, Inc.
Description: Terra’s comprehensive range of constant-temperature baths, etching baths, dump risers, and other processing equipment is ideally suited for the high-purity requirements of the semiconductor industry. Microprocessor controls ensure the integrity of your operations.
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Supplier: Plasma Etch, Inc.
Description: Built as an extension of our MK-II platform, it offers you the same repeatability, reliability and long life, as well as low maintenance costs. The Reactive Ion Etch (RIE) electrode offers the highest directional plasma effect. Etching with our roll to roll plasma etcher in the large all
- Applications & Materials Processed: Research / Surface Analysis, Other
- Gas Control Unit: Yes
- Integral Process Controller: Yes
- Materials Processed (Deposit or Substrate): Metal, Compound Semiconductors / GaAs, Tungsten / Refractory Metal, Other
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Supplier: Plasma Etch, Inc.
Description: This system is made for smaller production facilities, R&D facilities and universities. The system features an implosion proof 8” w x 8” d x 4” h Rectangular welded Aluminum Vacuum Chamber and a direct powered RF electrode. Applications include medical devices, solar cells, printed circuit boards,
- Coating System Type: Laboratory / Benchtop
- Materials Processed (Deposit or Substrate): Metal, Compound Semiconductors / GaAs, Tungsten / Refractory Metal, Other
- Technology / Process: Plasma Etching / Cleaning
- Vacuum / Pressure Range: Medium (< 1, >10-3 torr), Other
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Supplier: Technic, Inc.
Description: foils, and other flexible substrates. Applications include: Base and precious metal plating Copper seed, overall panel and pattern plate Alloy plating Electro coating Electro forming Electro polishing Chemical etching Chemical cleaning
- Applications & Materials Processed: Semiconductor Manufacturing, Other
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Supplier: Terra Universal, Inc.
Description: Continuously filters process chemistry to increase purity and maximize product yield Reduced acid consumption generally pays for bath in three months Select semiconductor-grade natural polypropylene or PVDF seamless process tank 360° serrated overflow weir
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Supplier: Terra Universal, Inc.
Description: Ideal for etching, stripping and cleaning Ultra-pure, 99.995% contaminant-free processing vessel is ideal for critical chemistries Externally bonded 5-sided circuit heating element provides efficient, even heating for improved process yields Redundant safety
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Supplier: Terra Universal, Inc.
Description: Ideal for etching, stripping and cleaning Seamless quartz vessel is 99.995% contaminant-free Externally bonded 5-sided circuit heating element provides efficient, even heating for improved process yields Redundant safety features minimize potential damage caused
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Supplier: HORIBA Instruments, Inc.
Description: The CS-137 is a high-precision chemical solution concentration monitor designed to meet the strict demands of semiconductor wet-etching processes. Etching processes use BHF solution to etch silicon oxide and remove particles from the wafer surface. The CS-137 continually
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Supplier: 3X Ceramic Parts Company Limited
Description: Zirconia Ceramic Wafer Clamp for Semiconductor Industry Zirconia ceramic wafer clamp is a kind of ceramic accessory commonly used in solar photovoltaic equipment, and it is also an important component applied in photovoltaic production equipment. The processing of ceramic top
- Compressive / Crushing Strength: 290074 psi
- Density: 6.02 g/cc
- MOR / Flexural Strength: 36549 psi
- Material Type: Zirconia, Specialty Ceramic
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Supplier: Ushio America, Inc.
Description: Improvement of plasma resistance during dry etching Resist outgassing and densification for ion implantation Charge neutralization and stress erasure Low-k curing Interlayer insulating film formation for thin-film magnetic heads Compound semiconductor lift-off processing Surface
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Supplier: Metrigraphics LLC
Description: The Metrigraphics Division of DRC is a leading worldwide supplier of ultra-high, precision, custom components for Original Equipment Manufacturers (OEMs). We have applied our core technologies of electroforming, photolithography, and thin-film sputtering to help customers increase the
- Functional / Performance: Conductive, Dielectric
- Industry: Electronics, OEM / Industrial
- Material / Substrate Capabilities: Aluminum, Ceramic, Composites, Copper / Copper Alloys, Glass, Metal, Nickel / Nickel Alloys, Precious Metals, Plastic, Stainless Steel, Steel / Steel Alloys, Titanium
- Regional Preference: North America, United States Only, Northeast US Only
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Supplier: Gems Sensors & Controls
Description: Low Particle Generation-One piece Molded Design Corrosion Resistant 1 to 4 Actuation Levels in a Single Unit Lengths to 24" (610 mm) Applications: Semiconductor Process Equipment Pure Chemical Delivery System Wafer Cleaning and Etching Systems Cabinet Leak Sensing
- Device Classification: Sensor-Only
- Level Measurement Type: Point Level / Multi-Point Levels
- Material Temperature Range: -40 to 250 F
- Maximum Operating Pressure: 50 psi
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Supplier: Denton Vacuum
Description: your budget and process. Typical Applications Nanotechnology Electronics Semiconductor (Compound or Other) Materials Research Research & Development Medical Devices Precision Milling Via Etching
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Supplier: Zygo Corporation
Description: local (die-level) flatness, surface roughness, and total thickness variation (TTV), and sub-arcsec tolerances for perpendicularity and parallelism specifications. Our unique glass and ceramic machining equipment, combined with years of experience developing process-oriented techniques, enable
- Additional Operations: Etching / Blasting, Lapping / Polishing, Other
- Application Expertise: Optical / Semiconductor
- Coating Services: Anti-Reflective Coating, Other
- Fabrication Services: Design Assistance, Glass Part Fabrication, Materials Development / R&D, Material Selection, Inspection / Testing
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Description: Can't be eroded by all kinds of molten metals and molten hydrochloric acid. Hot- Pressed aluminum nitride ceramic part application: Semiconductor heaters Magnetic resonance imaging equipment Etching machine Integrated circuit part Structural packaging materials High-power heat
- Applications: Other
- Material Type: Aluminum Nitride, Specialty Ceramic
- Performance Features: Metallized / Silvered
- Shape / Form: Plate / Board (e.g., Fiberboard)
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Supplier: Nilfisk Industrial Vacuums
Description: Designed for the unique cleaning requirements of the semiconductor industry, the Nilfisk SS Vapor Industrial Vacuum captures toxic gases such as arsine, phosphine, and chlorinated solvents released during the cleaning of process equipment such as molecular beam epitaxy chambers, ion
- Airflow: 87 SCFM
- Applications: Cleanroom, General Cleaning, Toxic Media
- Capacity: 3.25 gallons
- Features: HEPA / ULPA Filter
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Supplier: Fountyl Technologies Pte. Ltd.
Description: Electrostatic chuck has the function of normal use in vacuum atmosphere, and plays the role of holding and temperature control of wafer in high vacuum plasma or special gas environment, assisting semiconductor process equipment to realize the change of electrical characteristics and
- Application: Wafer Chuck
- Chuck Geometry: Round
- Materials of Construction: Ceramic, Other
- Number of Jaws: None / NA
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Supplier: Plansee SE
Description: susceptibility to particle formation throughout the sputtering process. One-step Mo/Cu wet etching. In electrode layers, copper is mostly used in combination with a molybdenum adhesion promotion layer/diffusion barrier. To structure the Mo-Cu multilayers, we have worked together with
- Type: Sputtering Target
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Supplier: 3X Ceramic Parts Company Limited
Description: type of alumina has higher mechanical strength, excellent corrosion resistance, can produce large component products, in addition, because of its excellent plasma resistance is widely used in the semiconductor industry, such as CVD equipment, etching equipment and other
- Density: 3.92 g/cc
- Material Type: Alumina / Aluminum Oxide
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Supplier: ASTM International
Description: parameter of interest. This practice is intended for layer growth and deposition techniques such as epitaxy, implantation, thermal and chemical vapor deposition (CVD) oxidation, and metallization, as well as for layer modification such as various means of layer etching. 1.4 This practice can
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Supplier: ASTM International
Description: deposition techniques such as epitaxy, implantation, thermal and CVD oxidation, and metallization, as well as for layer modification such as various means of layer etching. 1.4 This practice can be used with any measurement method, procedure or instrumentation that can measure the needed film
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Featured Products Top
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In semiconductor equipment manufacturing, engineers often face the challenge of finding materials that can withstand plasma corrosion, extreme temperatures, and demanding precision requirements. Traditional metals cannot deliver the necessary (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
Silicon carbide carrier disk, silicon carbide etching disk, ICP etching disk Silicon carbide tray for LED etching (SiC tray) φ 600mm is a special accessory for deep silicon etching (ICP etching machine) Wafer carrier, also known as wafer carrier and silicon (read more)
Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for 3X Ceramic Parts Company Limited -
feedthroughs engineered specifically for semiconductor equipment operating in ultra-high vacuum (UHV) and controlled environments. Our solutions are designed to maintain stable vacuum integrity down to 10?? Torr, ensuring moisture, gas, and particulate contamination are fully isolated from (read more)
Browse Feedthroughs Datasheets for Douglas Electrical Components -
and solvents used in etching and cleaning. Broad chemical resistance: Withstands the corrosive substances common in semiconductor processes. Heat resistance: Performs reliably in environments above 260°C, (read more)
Browse Industrial Coatings Datasheets for AGC Chemicals Americas, Inc. -
Challenge: Semiconductor manufacturing involves complex processes—including photolithography, etching, deposition, ion implantation, polishing, and cleaning—to produce functional chips, which are then packaged, tested, and (read more)
Browse Wastewater Treatment Equipment Datasheets for KINTEP NEW POWER -
Applications The ESC design is fully optimized for critical steps in semiconductor fabrication, including: Plasma Etching: Conductor, dielectric, and polysilicon etch processes. Chemical Vapor Deposition (CVD): High-temperature PECVD and ALD (read more)
Browse Oxide Ceramics Datasheets for Fountyl Technologies Pte. Ltd. -
are widely used to monitor and control vacuum levels during processes, such as etching and deposition. The challenge: Precision and accuracy requirements Semiconductor manufacturing processes demand extremely high precision (read more)
Browse Pressure Sensors Datasheets for Endress + Hauser – Sensors & Components -
electrochemical detector (XPS-7II) provide users with lightweight and ready-to-go equipment needed for unforeseen events. To browse a range of products intended for the Semiconductor industry, (read more)
Browse Gas Instruments Datasheets for DOD Technologies Inc. -
The manufacturing processes for semiconductors, microchips, and integrated circuits differ significantly. Semiconductors undergo purification and doping to achieve the desired electrical properties. Microchips are fabricated through a series of steps, including photolithography, etching, and layering (read more)
Browse Microcontrollers (MCU) Datasheets for ODG (Origin Data Global) -
High-Precision Ring Groove Chuck for Wafer Fixation and Transfer The ring groove chuck is an essential component in semiconductor (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd.
Conduct Research Top
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Semiconductor Case Study: ETCHING SEMICONDUCTOR WAFERS RELIES ON TIGHT TEMPERATURE CONTROL
All semi-conductor wafers, as part of their micro-fabrication, must undergo an etching process which chemically removes layers from the surface of a wafer during manufacturing. Since the depth of these etched cavities are extremely critical, the etch rate must be precisely controlled through
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What is Photo Etching?
Photo etching is a process used in the creation of integrated circuits, that combines photolithography with the etching process. Photolithography is used to form patterns on semiconductor substrates coated with photoresist, resulting in selective developing of the photo-resist, when exposed
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Semiconductor Manufacturing - Etching and Rinsing
To divert corrosive used rinse water to either the waste treatment facility or ion exchange equipment.
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Achieving Sub-ppb Impurity Detection to Ensure the Purity of Electronic Specialty Gases
Electronic specialty gases (ESGs) are used throughout the electronics sector, but the largest users, with the most diverse needs are semiconductor manufacturers. Various ESGs are used in most semiconductor processes, such as film deposition, film etching, substrate doping, and chamber cleaning
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
signs of a slowdown expanding to other parts of the world, " said John T. Chambers, president and chief executive. "We also now believe that this slowdown in capital spending could extend beyond two quarters. " Hynix (formerly Hyundai) mulls cut in DRAM production WASHINGTON -- Hynix Semiconductor
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
Heard on the Beat (July 13) Commentary & analysis of week's chip news Applied offers deep-trench silicon etch chamber for sub-100-nm DRAM processes SANTA CLARA, Calif.--Applied Materials Inc. today announced a new silicon etch chamber for 200- and 300-mm wafer DRAM fabs needing deep-trench etching
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Measuring the Volume of Integrated Circuit Chipping After the Dicing Process Using a Digital Microscope
Integrated circuit (IC) manufacturing can be broken down into two processes-forming circuits on bare wafers and packaging. The circuit formation process begins with cylindrical pieces of semiconductor material. The cylinders are sliced into thin, circular pieces called bare wafers. The bare wafers
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Metrigraphics Article in Today's Medical Developments
their manufacturing facility and their development laboratories located in Wilmington, MA. If you need a little more precision and the parts need to be a bit smaller, the next process to move to would be chemical etching - similar to electroforming. "Chemical etching traditionally uses
More Information Top
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Advances in Neural Networks – ISNN 2013
This paper presents a model of Elman recurrent neural network (ERNN) for time series fault prediction in semiconductor etch equipment .
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A novel key-variable sifting algorithm for virtual metrology
This illustrative example is based on a piece of semiconductor etching equipment in Taiwan.
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Federal Register > Monday, September 8, 2014 > [79 FR 53166] Notice of Foreign Availability Assessment: Anisotropic Plasma Dry Etching Equipment
This type of semiconductor etching equipment is used in the production process of a variety of dual-use semiconductor devices such as flash memories, microwave monolithic integrated circuits, transistors, and analog-to-digital-converters.
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Federal Register > Monday, February 9, 2015 > [80 FR 6948] Foreign Availability Determination: Anisotropic Plasma Dry Etching Equipment
This type of semiconductor etching equipment is controlled for national security reasons under Export Control Classification Number (ECCN) 3B001.c on the Commerce Control List (CCL).
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New strategy for image and video quality assessment
He was a senior engineer with the Department of Etching, Tokyo Electronic AT Ltd., Japan, from 2000 to 2002, dealing with the development of an advance process control APC system for etching semiconductor equipment .
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A Novel Spatial–Spectral Similarity Measure for Dimensionality Reduction and Classification of Hyperspectral Imagery
From 2000 to 2002, he was a Senior Supervisor with the Department of Etching, Tokyo Electron AT Ltd., Tokyo, Japan, dealing with the development of advanced process control systems for etching semiconductor equipment .
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A Fully Constrained Linear Spectral Unmixing Algorithm Based on Distance Geometry
He was with the Department of Etching, Tokyo Electron AT Ltd., Tokyo, Japan, as a Senior Supervisor, from 2000 to 2002, dealing with the development of advanced process control systems for etching semiconductor equipment .
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http://dspace.mit.edu/bitstream/handle/1721.1/9289/45753625-MIT.pdf?sequence=2
How often does your business replace its semiconductor equipment ( etch , CVD, etc)?
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