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Supplier: Advanced Energy Industries, Inc.
Description: Lower cost of ownership than competitive solutions The Litmas® Remote Plasma Source (RPS) system delivers high concentrations of reactive gas species to enable advanced fluorinated gas abatement. Its small-footprint, high-performance, ease-of-use, and low
- Applications: Specialty / Other
- Substrates / Surfaces: Semiconductors / Wafers
- Technology Type: RF Plasma (ICP)
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Supplier: Advanced Energy Industries, Inc.
Description: Lower cost of ownership than competitive solutions The Litmas® Remote Plasma Source (RPS) system delivers high concentrations of reactive gas species to enable advanced fluorinated gas abatement. Its small-footprint, high-performance, ease-of-use, and low
- Applications: Specialty / Other
- Substrates / Surfaces: Semiconductors / Wafers
- Technology Type: RF Plasma (ICP)
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Supplier: Saint-Gobain Coating Solutions
Description: , Saint-Gobain has optimized the plasma gas injection & electrode shapes to enable users to meet a wide range of thermal spray requirements for optimal performance. Whether you require high powder feed rates, high deposition efficiency or high velocity, the ProPlasma HP spray
- Mounting: Machine / Reciprocator
- System Options / Components: Applicator / Gun
- Thermal Spray Technology: Plasma Spray
- Type: Component / Subsystem
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Supplier: Saint-Gobain Coating Solutions
Description: along with mass flow meters for gas regulation ProPlasma controller – features Siemens industrial touch screen control board with 30.5 cm (12”) TFT display ProPlasma PR80-8 power source – operates up to 65 kW (88 hp) up to 800 amps ProPlasma
- Mounting: Machine / Reciprocator
- System Options / Components: Feeder / Metering Unit, Controller / Sensing System, Power Supply
- Thermal Spray Technology: Plasma Spray
- Type: Complete Machine
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Supplier: Advanced Energy Industries, Inc.
Description: Lower cost of ownership than competitive solutions The Litmas® Remote Plasma Source (RPS) system delivers high concentrations of reactive gas species to enable advanced fluorinated gas abatement. Its small-footprint, high-performance, ease-of-use, and low
- Oxidizer Type: Other
- Temperature Range: 41 to 104 F
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Supplier: Linde North America, Inc.
Description: has the highest thermal conductivity of all gases. Combined with oxygen, the hydrogen flame reaches a temperature of 2834°C. It is often mixed with argon to create a range of argon/hydrogen shielding gases for TIG and plasma welding. These shielding gas mixtures are
- Hydrogen, Hydrides and Hydrogen Compounds: Hydrogen
- Product Forms: Gas
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Description: Specifies safety and performance requirements for gas consoles intended to be used with combustible gases or oxygen. These gas consoles are designed to supply gases for use in arc welding, plasma cutting, gouging and allied processes in non-explosive atmospheres.
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Description: -8:2021 specifies safety and performance requirements for gas consoles intended to be used with combustible gases or oxygen. These gas consoles are designed to supply gases for use in arc welding, plasma cutting, gouging and allied processes in non-explosive
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Description: to be used with combustible gases or oxygen. These gas consoles are designed to supply gases for use in arc welding, plasma cutting, gouging and allied processes in non-explosive atmospheres. The gas console can be external or internal to the power source
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Supplier: PTB Sales, Inc.
Description: $8,800 ASTRONi AX7670 Remote Plasma Source: rated to 3.0 slm NF3 flow rate, remote source for reactive gas by generating atomic fluorine. ASTRONi data sheet.
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Supplier: PTB Sales, Inc.
Description: $7,200 ASTeX ASTRONex Fl20620 generator. 400 kHz output, 208 3f input, 38 lbs. The MKS ASTeX ASTRONex reactive gas generator is a reactive source for chamber cleaning and other reactive gas applications. The ASTRONex uses low field toroidal plasma to dissociate input
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Supplier: CSA Group
Description: ISO 17211:2015 describes the method for the sampling and determination of selenium compounds in both vapour phase and solid phase that are entrained in flue gases carried in stacks or ducts. The selenium content in flue gas is expressed as a mass concentration of elemental selenium in
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Supplier: ESAB Welding and Cutting Products
Description: ESAB's m3 Plasma™ system takes plasma productivity to new heights. Now multiple plasma cutting and marking features are available in a single easy-to-use system. You can perform high speed plasma cutting, high precision cutting, plasma marking, thick-plate cutting,
- Duty Cycle: 1 %
- Equipment Type: Complete System
- Features & Technology: Water Cooled
- Output Current Range: 1 to 2 amps
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Supplier: American Welding Society (AWS)
Description: , gas tungsten arc welding, and plasma arc welding. Classification is based on chemical composition of the electrode for solid electrodes and rods, chemical composition of weld metal for composite stranded and composite metal cored electrodes and rods, and the as-welded or postweld
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Supplier: Gelest, Inc.
Description: J/mol Dipole moment: 0.73 debye Vapor pressure, -80 °C: 241 mm Vapor pressure, 21 °C: 14 atm (210 psia) Critical temperature: 79.3 °C Plasma polymerization yields dry process photoresist Intermediate for poly(methylsilane) precursor to silicon carbide Deposits SiC on Si and Ge at 400 - 500 °C
- Specialty Gases: Other
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Supplier: Bronkhorst USA
Description: an alternative way to control the flow. Instead of using a control valve, the Coriolis flow meter can be combined with a gear pump, thus eliminating the need of pressurising the liquid source. Alternative to Thermal Gas Mass Flow Controllers Compared to traditional thermal MFCs
- Mass Flow Rate: 3.67E-6 to 0.0073 lbs/min
- Electrical Output: Analog Current, Analog Voltage
- End Fittings: Compression
- Features: Measures Density, Measures Temperature, Controller Functions, Recorder / Totalizer Functions
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Supplier: Bronkhorst USA
Description: an alternative way to control the flow. Instead of using a control valve, the Coriolis flow meter can be combined with a gear pump, thus eliminating the need of pressurising the liquid source. Alternative to Thermal Gas Mass Flow Controllers Compared to traditional thermal MFCs
- Mass Flow Rate: 3.67E-6 to 0.0073 lbs/min
- Electrical Output: Analog Current, Analog Voltage
- End Fittings: Compression
- Features: Measures Density, Measures Temperature, Controller Functions, Recorder / Totalizer Functions
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Supplier: Bronkhorst USA
Description: alternative way to control the flow. Instead of using a control valve, the Coriolis flow meter can be combined with a gear pump, thus eliminating the need of pressurising the liquid source. Alternative to Thermal Gas Mass Flow Controllers Compared to traditional thermal MFCs
- Mass Flow Rate: 1.10E-4 to 0.1103 lbs/min
- Electrical Output: Analog Current, Analog Voltage
- End Fittings: Compression
- Features: Measures Density, Measures Temperature, Controller Functions, Recorder / Totalizer Functions
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Supplier: Bronkhorst USA
Description: an alternative way to control the flow. Instead of using a control valve, the Coriolis flow meter can be combined with a gear pump, thus eliminating the need of pressurising the liquid source. Alternative to Thermal Gas Mass Flow Controllers Compared to traditional thermal MFCs
- Mass Flow Rate: 3.67E-6 to 0.0073 lbs/min
- Electrical Output: Analog Current, Analog Voltage
- End Fittings: Compression
- Features: Measures Density, Measures Temperature, Controller Functions, Recorder / Totalizer Functions
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Supplier: American Welding Society (AWS)
Description: Presents comprehensive information on welding and related processes to include detailed information on arc welding power sources; shielded metal arc, gas tungsten arc, gas metal arc, flux cored arc, submerged arc, and plasma arc welding processes. Also included are
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Supplier: Deposition Sciences, Inc.
Description: free path length, and they stream away from the source and are deposited on the revolving substrates. In MicroDyn sputtering, a small amount of a reactive gas (usually oxygen) is also introduced into the machine during this process and microwaves are utilized to turn it into a
- Functional / Performance: Abrasion Resistant, Antireflective, Chemical Resistant, Dielectric, Heat Resistant / High Temperature, Reflective
- Hard Coating / Treatment: Yes
- Industry: Aerospace, Automotive, Electronics, Government, Medical / Healthcare, Military Specification, OEM / Industrial, Other
- Material / Substrate Capabilities: Aluminum, Metal, Nickel / Nickel Alloys, Precious Metals, Titanium, Specialty / Other
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Supplier: American Welding Society (AWS)
Description: This specification prescribes the requirements for classification of zirconium and zirconium alloy electrodes and rods for gas metal arc welding, gas tungsten arc welding, and plasma arc welding. The compositions specified for each classification represent the latest
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Supplier: American Welding Society (AWS)
Description: This specification prescribes the requirements for classifications of copper and copper-alloy electrodes and rods for gas shielded metal arc, gas shielded tungsten arc, and plasma arc welding. Classification is based on chemical composition of the filler metal. Additional
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Supplier: Intertek
Description: From laboratory testing to regulatory compliance and beyond, advance the value and marketability of your products with testing and certification services from Intertek. Today's marketplace is complicated. Globalisation has changed the world - opening up new markets, sources of supply
- Capabilities: Assays / Quantitative, Chemical Testing Services, Cleanliness Monitoring / Testing, Environmental Testing and Analysis Services, Failure Analysis, Field Sampling, Geotechnical Services, Monitoring Programs (Audits / Surveillance), Quality / Purity (Contamination - Alloys, Polymers, etc.), Reactivity
- Industry Applications: Aerospace / Aviation, Automotive, Chemical / Material Processing, Food / Beverage, Health Care / Medical, Legal / Forensics, Marine, Military, Nuclear / Utility, Pharmaceutical / Biotech, Packaging, Piping / Pressure Vessel, Semiconductors / Electronics, Structural / Construction
- Materials: Adhesives / Sealants, Asbestos / Fibers, Ceramics / Glass, Chemicals, Coatings, Composites, Concrete / Mortar, Cosmetics (Creams, Sunblocks, etc.), Fuel Cell / Battery Materials, Gases, Inorganics, Metals, Nanomaterials, Paper, Petroleum Fluids (Oil, Fuel, Distillates), Plastic / Rubber,
- Regional Preference: North America, United States Only, Northeast US Only, Southern US Only, Southwest US Only, Northwest US Only, Midwest US Only, Canada Only, South / Central America Only, Europe Only, South Asia Only, Near East Only, East Asia / Pacific Only
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Supplier: Precision Polymer Engineering Ltd.
Description: Nanofluor® Y75G is a highly fluorinated elastomer which incorporates relatively low levels of an advanced nanoparticle type filler system, producing a clean compound formulated for minimum particle generation. Nanofluor® Y75G has been tested in various plasma types and sources and
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Description: JSC œResearch Institute of Gas Discharge Devices œPLASMA� manufactures a wide range of gas-discharge ion metal vapor lasers. He-Cd (Cd vapor) laser of our manufacture is a source of CW coherent violet (441.6 nm) and UV (325 and 354 nm) radiation. He-Cd lasers operate in
- Features: Polarized Output
- Laser Power: 5 to 150 milliwatts
- Laser Type: Helium Cadmium Lasers
- Laser Wavelength: Ultraviolet, Violet
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Description: melting wax; – appliances intended to produce surface cooling effect on the skin; – facial cleaning appliances; – micro-needling appliances; – plasma pens. Appliances covered by this standard can incorporate vapour-producing devices or spray-producing devices
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Supplier: Shanghai Optics
Description: Manufacturing At Shanghai Optics we use a variety of different methods to produce high quality optical coatings. These methods include plasma sputtering, ion beam sputtering, atomic layer deposition, and evaporative deposition. Ion beam sputtering and atomic layer deposition provide the
- Coating: Antireflection, Beamsplitter, Dielectric, High-Reflector, Metal, Mirror
- Regional Preference: North America, United States Only, Northeast US Only, Southwest US Only, Canada Only, East Asia / Pacific Only
- Substrate Materials: Crystal, Glass, Metal
- Wavelength Range: UV, Visible, IR
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Supplier: Ushio America, Inc.
Description: EmArc® lighting technology is the culmination of a dedicated effort to bring together the inherent advantages of a number of gas discharge sources into a single light source. The technology equates to a critical blending of rare gas and metal additives to derive, in a
- Color Temperature: 5700 to 6900 K
- High Intensity Discharge (HID) Lamp Type: Other
- Lamp Bases: Other Lamp Bases
- Lamp Power: 160 to 600 watts
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Supplier: ASTM International
Description: laser beam (LB), electron beam (EB), or arc plasma energy sources. Feedstock typically comprises either powder or wire. Deposition typically occurs either under inert gas (arc systems or laser) or in vacuum (EB systems). Although these are the predominant methods employed in
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Supplier: Ushio America, Inc.
Description: dedicated effort to bring together the inherent advantages of a number of gas discharge sources into a single light source. The technology equates to a critical blending of rare gas and metal additives to derive, in a single source, many of the key properties and
- Color Temperature: 7800 K
- High Intensity Discharge (HID) Lamp Type: Other
- Lamp Power: 50 to 75 watts
- Mean Lumens: 750 lm
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Supplier: Sentry Air Systems, Inc.
Description: hold for precise fume source capture. With the total reach of 20? from side to side, this unit can easily access dual operator stations. This system features four cleanable Micro-Pleat Series 1 Particulate Filters that offer the ability to clean the filters with compressed air without
- Airflow: 455 SCFM
- Features: HEPA / ULPA Filters
- Minimum Particle Size Filtered: 0.3000 µm
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Supplier: Sentry Air Systems, Inc.
Description: hold for precise fume source capture. With the total reach of 20? from side to side, this unit can easily access dual operator stations. This system features four cleanable Micro-Pleat Series 1 Particulate Filters that offer the ability to clean the filters with compressed air without
- Airflow: 350 SCFM
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Supplier: ASTM International
Description: laser beam (LB), electron beam (EB), or arc plasma energy sources. Feedstock typically comprises either powder or wire. Deposition typically occurs either under inert gas (arc systems or laser) or in vacuum (EB systems). Although these are the predominant methods employed in
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Supplier: Sentry Air Systems, Inc.
Description: on particles down to 0.3 microns) Non-Cleanable (4) 42 lb. Activated Carbon Filters (4) 42 lb Specialty Blended Filter Media (acid gas, ammonia, aldehyde, and mercury) Typical Uses: Production welding (MIG, TIG, stick, plasma cutting) Grinding Powder weighing Some dust collection
- Airflow: 60 SCFM
- Features: HEPA / ULPA Filters
- Minimum Particle Size Filtered: 0.3000 µm
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Supplier: Sentry Air Systems, Inc.
Description: .97% efficiency on particles down to 0.3 microns) Non-Cleanable (4) 42 lb. Activated Carbon Filters (4) 42 lb Specialty Blended Filter Media (acid gas, ammonia, aldehyde, and mercury) Typical Uses: Production welding (MIG, TIG, stick, plasma cutting) Grinding Powder weighing Some dust
- Airflow: 765 SCFM
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Supplier: Northrop Grumman Corporation
Description: the universe. Black holes, intense gravitational fields resulting from the death of massive stars, produce some of the most intense X-ray sources in the universe. As stars collapse upon themselves they pull in everything around them - including light. The Chandra X-ray Observatory can
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Supplier: General Digital Corporation
Description: protect the internal electronics. AMTFT LCD Screen The VuePoint III™ integrates a color 10.4" (diagonal) LCD display, which replaces the gas plasma display of previous generation VuePoint™ models. The end user has control of setting up the text and background color of
- Color: Monochrome
- Diagonal Screen Size: 10.4 inch
- Features: Ruggedized Housing
- Mounting: Rack Mount, Stand Alone/Desktop
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Supplier: CSA Group
Description: ignite a surrounding explosive atmosphere. In rare special cases, direct laser induced breakdown of the gas at the focus of a strong beam, producing plasma and a shock wave both eventually acting as ignition source. These processes can be supported by a solid material close to
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temperature and must be considered carefully against specific applications. CVD silicon carbide has been used for many years in semiconductor processing applications, where excellent thermal shock resistance and resistance to erosion by high-energy plasmas are required. CVD properties can benefit (read more)
Browse Ultra-hard Materials Machining Datasheets for Insaco, Inc.
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Atmospheric Plasma Analysis by Molecular Beam Mass Spectrometry (.pdf)
, it is important to know the energy and identity of the impinging species. Atmospheric discharges from a number of gas mixtures have been studied using a Hiden EQP mass/energy analyser. The discharges were generated by a radio frequency driven atmospheric plasma source and sampled using a multi-stage
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Prospects for granular x-ray lithography sources
For the case of gas plasma sources , this factor should be replaced by the transmission of the gas at the appropriate pressure.
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Generation of low-temperature plasma by low-pressure arcs for synthesis of nitride coatings
Plasma was produced with two plasma sources: a DI-100 arc evaporator [13, 16] operating based on a cathode spot arc and the PINK gas plasma source operating based on a non-self-sustained arc with a hot filament, hollow cathode [11–13].
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A comparison of gas temperatures measured by ultraviolet laser scattering in atmospheric plasma sources
…Richardson Grating Laborator) [20] Herzberg G 1989 Molecular Spectra and Molecular Structure I. Spectra of Diatomic Molecules (Malabar, FL: Krieger) [21] Staack D, Farouk B, Gutsol A and Fridman A 2008 DC normal glow discharges in atmospheric pressure atomic and molecular gases Plasma Sources Sci. Technol. 17 025013 .
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Materials modification using intense ion beams
Another active diode system with a gas plasma source and constant B-flux in the A–K gap has been developed at NPI Fig. 3.
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Characteristics Of A Gas-Puff Z-Pinch Plasma X-Ray Source
(a) Lxposed by Mo target electron impact source (b) Exposed by Ne gas plasma source 2pm U on mask contrast.
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X-ray lithography, where it is now, and where it is going
In spite of the above limitations, laser generated plasma sources appear to have a better chance of success than puff gas plasma sources for x-ray li- thography applications.
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Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets
…jet’s shielding gas impact on bacterial inactivation Biointerphases 10 029506 [223] Schmidt-Bleker A, Norberg S A, Winter J, Johnsen E, Reuter S, Weltmann K and Kushner M J 2015 Propagation mechanisms of guided streamers in plasma jets: the influence of electronegativity of the surrounding gas Plasma Sources Sci. Technol. (Provisionally scheduled…
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Non-thermal plasmas in and in contact with liquids
D: Appl. Phys. 39 3805–13 [144] Staack D, Farouk B, Gutsol A and Fridman A 2008 Dc normal glow discharges in atmospheric pressure atomic and molecular gases Plasma Sources Sci. Technol. 17 025013 .
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Free-standing microwave excited plasma beam
Plasmas 8 836–45 [32] Berndt J, Makasheva K, Schl¨uter H and Shivarova A 2002 Diffusion-controlled regime of surface-wave produced plasmas in helium gas Plasma Sources Sci. Technol. 11 208–17 [33] Berndt J, Makasheva K, Schl¨uter H and Shivarova A 2002…
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An inverse pinch plasma source for plasma opening switches
[23] J. J. Moschella, R. C. Hazelton, C. Vidoli, E. J. Yadlowsky, B. V. Weber, D. C. Black, D. D. Hinshelwood, B. Moosmann, and S. J. Stephanakis, “POS experiments on hawk using an inverse pinch gas plasma source ,” in Proc. 12th…