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  • MICRO: Process Equipment Control- Luckman (February 2001)
    regions for NPN (negative-positive-negative) bipolar transistors. Although indium provides some important performance advantages, there are concerns that must be addressed before a fab switches to its use. Indium implantation requires the use of highly hygroscopic indium trichloride (InCl
  • What to Expect at Interphex 2007
    of Emerson Process Management, Brooks Instrument provides integrated low-flow fluid measurement and control instrumentation. The Brooks product line features a number of technologies to handle a wide range of flow challenges including Coriolis, thermal mass, variable area (rotometers) and positive
  • Evaluating the use of MEMS-based gas and fluid delivery systems
    and electromechanical counterparts. With recent MEMS innovations, the list of conventional gas and liquid control components that can be replaced with smaller, MEMS-based equivalents includes mass-flow controllers (MFCs), pressure regulators, and positive shutoff valves. It is now possible to replace
  • MICRO: Controlling particles in sputter deposition modules
    deposition (PVD) metallization process is a particular area of interest. Process costs accumulate with each layer deposited; therefore, any improvement in PVD particle control that increases device yields can have a significant effect on profitability. In the PVD metallization process, the sources
  • Metrigraphics Article in Today's Medical Developments
    is a subtractive process," says Randolph Sablich, vice president and general manager. There is no claim that one process is better than the other, but rather that each process has its own area of expertise that it addresses. Metrigraphics lives in the 75µm or smaller world and this is where their process

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