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Supplier: Technic, Inc.
Description: Low cost wet bench design for R&D and low volume applications. Same basic cell and wafer holder design as used on our highly successful SEMCON 1500 and 2000 series. Tool features a single plating cell and dragout rinse cell. Plating and electroforming of wafers or discrete parts,
- Process / Technology: Electroplating
- Machinery Type: Laboratory / Pilot System
- Application / Industry: Semiconductor / Wafer
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Supplier: Technic, Inc.
Description: wet bench units or modular wet bench construction allow for future expansion and multiple configurations.
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Supplier: Technic, Inc.
Description: System Overview The SEMCON 4000 is an automatic loading and unloading “wet bench” type wafer Under Bump Metalization tool, designed with processes for Nickel and Gold metalization of silicon and Ga/As wafers with aluminum or copper seed layer. The Semcon 4000 tool is designed with
- Machinery Type: Automated System
- Process / Technology: Electroplating
- Application / Industry: Semiconductor / Wafer, Solar / Photovoltaic
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Supplier: Terra Universal, Inc.
Description: with a 2" (51 mm)-diameter drain valve for safe collection of overflow chemicals. An optional plenum flush feature lets you wash this sink with water as it drains. Versatile Configurations Select from among three configurations (see illustrations below). The standard bench is designed for
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Supplier: ProVent LLC
Description: hand operations are part of a larger system involving automatic equipment or pedestal mounted finishers. Portable down draft benches make setting up a new cell immediate. In general, down draft bench dust collectors do not require expensive duct work connections that add significantly to the
- Airflow: 500 to 15,000 SCFM
- Collector Type: Downdraft Table
- Features: Dust Collection System
- Applications: Metalworking Chips / Fluids
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Supplier: Accuris
Description: Draft BS EN 14972-13 Fixed firefighting systems - Water mist systems. Part 13: Test protocol for wet benches and other similar processing equipment for open nozzle systems
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Supplier: Clean Air Products
Description: applications. The Series 412 Clean Bench may vary from vertical flow benches with open interiors to exhausting clean benches with wet process, to recirculating temperature control Class 1 systems. A Clean bench can be used in conjunction with cleanrooms to create clean zones.
- Hood Face Velocity: 70 to 110 SFPM
- HEPA Filter Efficiency: 99.99%
- Air Cleanliness Class: Class 100 (ISO 5)
- Features and Options: Lighting, Pre-filter
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Supplier: Clean Air Products
Description: applications. The Series 412 Clean Bench may vary from vertical flow benches with open interiors to exhausting clean benches with wet process, to recirculating temperature control Class 1 systems. A Clean bench can be used in conjunction with cleanrooms to create clean zones.
- Hood Face Velocity: 70 to 110 SFPM
- HEPA Filter Efficiency: 99.99%
- Air Cleanliness Class: Class 100 (ISO 5)
- Features and Options: Lighting, Pre-filter
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Supplier: Mettler-Toledo Technologies GmbH
Description: Environment Wet & Harsh Wet (Bench Scale Material Number(s) 22021015
- Capacity: 3 lbs
- Width / Diameter: 9 inch
- Length: 9 inch
- Features: Battery Powered, Hostile Environment
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Supplier: Princess Auto Limited
Description: 10 in. Wet Tile Saw with Stand
- Blade Size: 10 inch
- Saw Power Source: AC Electricity / Plug-in
- Use Type: Bench Top
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Supplier: ProVent LLC
Description: Uni-Wash Wet Booth Dust Collectors are a self-contained, economical means of removing wet-able and sinkable airborne contaminants from most hand-held industrial processes and containing them within a booth environment and away from other plant processes. Metal grinding, de-burring,
- Airflow: 4,000 to 15,000 SCFM
- Collector Type: Collection Booth
- Applications: Metalworking Chips / Fluids
- Process: Wet
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Supplier: NETZSCH Premier Technologies LLC
Description: Systems & Plants The Business Unit Grinding & Dispersing of the NETZSCH Group is a leader in wet and dry processing of products from many branches of industry. Based on our know-how in machine technology and plant engineering, we are able to offer you complete solutions (turnkey plants) –
- Materials Processed: Adhesives / Sealants, Carbon / Graphite, Ceramics, Coatings / Paint, Metals / Elements, Pulp & Paper, Wood Products
- Features: Africa Only, East Asia / Pacific Only, Europe Only, Near East Only, North America, Northeast US Only, Oceania Only, South / Central America Only, South Asia Only, United States Only
- Chemicals Processed: Biochemicals / APIs, Cosmetics / Soaps, Foods / Beverages, Pharmaceuticals / Drugs, Pigments / Dyes
- Form: Bulk Solids / Granules, Liquids, Nanomaterials, Powders
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Supplier: DAS Environmental Expert GmbH
Description: Point-of-Use Waste Gas Scrubber SALIX (wet) Operating Side of the Waste Gas Scrubber SALIX by DAS SALIX is a gas scrubber system for process waste gases from wet benches that makes part of DAS´ Point-of-Use Waste Gas Treatment Portfolio. In the two-stage scrubber process pollutants are
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Supplier: NETZSCH Premier Technologies LLC
Description: Variable-speed drive via frequency inverter Flexible mode of operation suitable for continuous-pass and circulation operation Available in two confi gurations – mobile or bench top A selection of four grinding chamber volumes – 15, 50, 150 and 300 ml Operator management with password
- Type: Ball / Media Mill
- Feed: Batch, Wet
- Scale: Lab / Pilot, Production
- Applications: Pharmaceutical / Cosmetics
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Supplier: Precision Surfacing Solutions
Description: The Lapmaster model 20 (pneumatic lift) is a bench-mounted unit with a heavy duty, carbon steel weldment base. The machine is of the “ring lapper” or “planetary lapper” configuration, enabling high standards of flatness and surface finish to be routinely achieved. The model 20 is derived from
- Power: 1 to 1.5 HP
- AC Voltage & Phase: 115 / 120 V 60 Hz, 208 - 230 / 240 V 60 Hz, 460 / 480 V 60 Hz, 50 Hz / International Power, Single-Phase, Three-Phase
- Mounting: Bench
- Applications / Materials Abraded: Biotech / Medical Devices, Ceramics / Glass, Metals / Metalworking, Ophthalmic / Optical, Plastics / Composites, Semiconductors / Electronics, Wet Finishing
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Supplier: Sartorius Lab Instruments GmbH & Co. KG
Description: recombinant proteins. The SARTOFLOW® Alpha plus SU is a bench-top Crossflow system for micro- and ultrafiltration applications. All product wetted parts of the System are supplied sterile and made from Single use components. The system is suitable for use in cGMP environments for process
- Maximum Liquid Flow: 1.32086026 GPM
- Maximum Pressure: 43.51131 psi
- Application / Industry: Biopharmaceutical
- Filter Medium Material: Cellulose, Polyethersulfone (PES)
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Supplier: SAE International
Description: Wet clutch packs are widely used in today's automatic transmission systems for gear-ratio shifting. The frictional interfaces between the clutch plates are continuously lubricated with transmission fluid for both thermal and friction management. The open clutch packs shear transmission fluid
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Supplier: Cole-Parmer
Description: readings. This meter combines traditional dry/wet bulb operation with modern electronic circuitry to provide accurate readings and trouble-free operation especially in dusty environments. For hanging or bench-top use, the meter is ideal for greenhouses, paint booths, food processing,
- Operating Temperature: 41 to 122 F
- Form Factor: Meter / Indicator
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Supplier: Transcat, Inc.
Description: Product Highlights +/- F.S. over -20 deg to 50 deg C temperature range Pressure, Flow, and Level Versions Selectable 110 VAC, 24 VDC, or Battery Power RS-232, 4-20 mA (3-wire), SPDT relays (2 each) Bench top or panel mount (NEMA 4X) Selectable engineering units and backlight
- Working Pressure Range: 0 to 15 psi
- Type: Gauge
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Description: Applies to electrical motor-operated vacuum cleaners for wet suction, dry suction or wet and dry suction for industrial and commercial use with or without attachments, for example for suction to withdraw dust or the like from work benches and production machines. Also applies to
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Description: Applies to electrical motor-operated vacuum cleaners for wet suction, dry suction or wet and dry suction for industrial and commercial use with or without attachments, for example for suction to withdraw dust or the like from work benches and production machines. Also applies to
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Supplier: Terra Universal, Inc.
Description: As a major manufacturer of wet benches, laminar flow hoods, chemical storage systems, and other processing equipment, Terra has the fabrication and engineering capabilities to modify any system to your unique requirements. Just give us your specs!
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Supplier: CSA Group
Description: Scope This clause of part 1 is applicable except as follows: Addition: This Standard applies to electrical motor-operated vacuum cleaners and includes appliances and stationary equipment specifically designed for wet suction, dry suction, or wet and dry suction for industrial and
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Supplier: Kalamazoo Industries, Inc.
Description: Kalamazoo Industries Inc heavy duty abrasive chop saws are perfect for cutting mild steel to hardened steel such as alloys either wet or dry. We manufacture abrasive saws that range from 7" - 44" for all your cutting needs. Dry cutting for fast general purpose fabricating of angle iron, flat
- Blade Diameter: 7 to 44 inch
- Power Source: AC Power
- Operation: Bench Top, Free Standing
- Cutting type: Dry, Wet
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Supplier: Terra Universal, Inc.
Description: with a 2" (51 mm)-diameter drain valve for safe collection of overflow chemicals. An optional plenum flush feature lets you wash this sink with water as it drains. Versatile Configurations Select from among three configurations (see illustrations below). The standard bench is designed for
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Supplier: AENOR
Description: Fixed firefighting systems - Water mist systems - Part 13: Test protocol for wet benches and other similar processing equipment for open nozzle systems
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Supplier: Port Plastics, Inc.
Description: a superior aesthetic white PVC FM4910 fire propagation & smoke generation criteria for applications such as wet benches, processing tools, furniture & cabinetry in cleanroom environments.
- Features: Flame Retardant (e.g. UL 94 Rated), Other
- Chemical System: PolyVinyl Chloride (PVC)
- Type: Thermoplastic
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Supplier: Terra Universal, Inc.
Description: All polypropylene construction for superb chemical resistance Ideal for use near wet processing operations This all-polypropylene work bench resists chemical spills, making it the perfect staging area for wet cleaning and processing operations. Reinforced design holds loads up
- Length: 30 inch
- Width: 60 inch
- Load Capacity: 200 lbs
- Type: Assembly / Test Bench, Ergonomic Design
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Supplier: Port Plastics, Inc.
Description: sheet material is designed to be the most economical choice in FM 4910 materials for use in the construction of wet benches, process tools, and cleanroom furniture and cabinetry.
- Form / Shape: Film / Sheet
- Features: Other, Thermoplastic
- Chemical System: Polyvinyl Chloride (PVC)
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Supplier: Schmalz Inc.
Description: Wafer gripper for extreme fast, reliable, precise and gentle handling of wet wafers in wet bench applications Handling of wafers after etching and cleaning processes Loading and unloading of conveyor belts Fully or partially automated production of silicon wafers with maximum
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Supplier: Schmalz Inc.
Description: Wafer gripper for extreme fast, reliable, precise and gentle handling of wet wafers in wet bench applications Handling of wafers after etching and cleaning processes Loading and unloading of conveyor belts Fully or partially automated production of silicon wafers with maximum
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Supplier: SWAN Analytical USA, INC.
Description: Complete monitor for hydrazine or carbohydrazide on stainless steel mounting panel. Features Amperometric three-electrode system with extremely stable zero point. Sample conditioning with highly effective diisopropylamine. Factory tested and calibrated on wet bench.
- pH Range: 7 to 14 pH
- Control Relays: 2
- Process Media Temperature: -22 to 140 F
- Operating Temperature: 14 to 122 F
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Supplier: Solid State Cooling Systems
Description: On-board temperature control unit; works with the Switchback Power Supply or Power Supply/Temperature Controller to replace a remote chiller. Low flow, one-pass chemical temperature control Direct cooling of process fluid in wet benches.
- Cooling Capacity: 1.1 kW
- Process Flow: 10 GPM
- Process Pressure: 100 psi
- Operating Temperature: 50 to 95 F
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available in our shop or at your facility. We offer a variety of flaw detectors ranging from thickness gauging to phased array and everything in between, magnetic yokes and probes and a new 5000 amp horizontal wet bench. We’ve also added a Post Emulsified (read more)
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without causing any damage to the material. We offer a variety of flaw detectors ranging from thickness gauging to phased array and everything in between, magnetic yokes and probes and a new 5000 amp horizontal wet bench. We’ve also added a Post Emulsified Penetrant (read more)
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. Applications - Wafer transfer robots in atmospheric EFEM and vacuum modules - Sorters and stockers -- high-cycle pick-and-place - Wet bench handling tools -- chemical bath corrosion resistance - Inspection and metrology equipment -- dimensional stability (read more)
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features -- edge grip pads, vacuum ports, and backside contact patterns machined to match wafer handling requirements. Applications - Wafer transfer robots in atmospheric and vacuum modules - Sorters, stockers, and load port automation - Wet bench wafer transfer (read more)
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handle batch sizes from 2 to 12 gallons, with a 15-gallon full holding capacity mix can. A 5 HP explosion-proof inverter-duty motor drives a pair of rectangular blades that operate with a powerful planetary kneading action suitable for thoroughly blending wet or dry materials, regardless of flow (read more)
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Indicates content that may require registration and/or purchase.
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Simulation Analysis on the Impact of Furnace Batch Size Increase in a Deposition Loop
A simulation model was constructed to assist the decision making, with the behavior of the wet benches (upstream tools) and cluster tools (downstream tools) being modeled in detail.
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MEMS Materials and Processes Handbook
with an overhead exhaust hood implemented with splashguards as part of a wet bench .
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Computational Science – ICCS 2008
We describe a symbiotic simulation control sys- tem which uses reactive what-if analysis to find a stable configuration of a wet bench tool set.
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Bottleneck-centric pull and push allocation and sequencing of wet-bench and furnace tools
push-and-then-pull bottleneck centric integrated allocation and sequencing method (P&P BCIASM), to integrate the sequencing and allocation for wafers processing by wet bench and furnace tools effectively.
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Rule execution in a Service-Oriented Architecture for distributed simulation on the Grid
In this section, we present a simulation of multi-recipes wet benches in the wafer fabrication process as a case study on the use of the rule engine.
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Handbook for Cleaning for Semiconductor Manufacturing: Fundamentals and Applications Complete Document
Wet benches consisting of immersion tanks are now equipped with recirculation and filtration units, automated filling in situ concentration monitoring, and automatic spiking systems.
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Process planning and scheduling of micromachined transducer
65.2 The total time that requires an operator is 65.2 Resources: 1 operator, 1 fume hood, 1 wet bench , 1 hot plate .
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Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks
We also compared conventional wet bench using IPA vapor drying with multi baths with PMC 2000 using direct-displacement IPA drying with an integrated wet chemical treatment in the single bath in terms of cleaning performance.
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An optimization framework for waferfab performance enhancement
A high level detailing is available for cluster, wet bench and batch tools – up to the chamber and wafer level.
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Preventive what-if analysis in symbiotic simulation
In our previous work we already used symbiotic sim- ulation in the context of semiconductor manufacturing to automatically control a wet bench toolset (WBTS), using reactive WIA (Aydt et al. 2008).