Mosfet Modeling For VLSI Simulation: Theory And Practice

6.1: Drain Current Calculations

6.1 Drain Current Calculations

Let us consider an n-channel device with uniformly doped substrate of concentration N b (cm -3), the structure and dimensions of which are shown in Figure 6.1. For the sake of simplicity we will assume this to be a large geometry device so that the short-channel and narrow-width effects can be neglected. The static and dynamic characteristics of a device under the influence of external fields in general can be described by the following three sets of coupled differential equations:

  1. The Poisson equation (2.41) for the electrostatic potential ?,

    (6.1)
  2. The current equation (2.35a) for electrons,

    (6.2a)

    which is the sum of two terms, drift due to the field and diffusion due to the concentration gradient. Similarly, for holes, we have

    (6.2b)

    These two equations, under non-equilibrium condition, become [cf. Eq. (2.36)]

    (6.3a)
    (6.3b)

    where ? n and ? p are the electron and hole quasi-Fermi potentials, respectively. The total current density J = J n + J p.

  3. The continuity equations (2.38)

    (6.4a)
    (6.4b)

As was pointed out earlier, modeling a MOSFET is a 3-dimensional (3-D) problem but for all practical purposes (unless the width W and length L are very small), we can treat the system as a 2-D problem in the x and y direction only (see Figure 6.1). Even as a 2-D problem, the equations above are fairly complex; one could solve exactly only using numerical techniques,...

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