Failure Analysis of Engineering Materials

6.4: Tools and Techniques for Electronic Failure Analysis

6.4 Tools and Techniques for Electronic Failure Analysis

The tools and techniques described in Chap. 1 are used extensively in the failure analyses of electronic systems and components. However, the unique characteristics of these systems (e.g., fine size, complex architecture, electrical phenomena) require additional methods for failure analysis. Some of these are described in detail in this section.

6.4.1 Techniques used in electronic failure analysis

These may be classified as follows:

  • Photography and optical microscopy

  • X-ray/radiographic component inspection

  • Infrared thermography

  • Acoustic microimaging

  • Metallography

  • Chemical characterization

  • Electronic and electrical characterization

  • Scanning electron microscopy (SEM), energy-dispersive x-ray analysis (EDXA), and wavelength-dispersive spectrometry (WDS)

  • Miscellaneous techniques

Since the size range of most electronic components and the materials in them (layers) are generally very fine (and progressively getting smaller), microscopic techniques are necessary to image them. Many of these techniques are covered in detail in Chap. 1. Table 6.11 and Fig. 6.44 compare features, resolution, and depth of penetration of various microscopic techniques including some techniques that are unique in their application to electronic FA.


Figure 6.44: A schematic comparison of some of the various microscopies available to the failure analyst. ( From Richards and Footner. [3])
Table 6.11: A Comparison of Some Features of Various Microscopical Techniques

Technique

Lateral resolution, ?m

Restriction on sample size

Specimen preparation

Destructive/ nondestructive

Depth of focus, ?m

Sub-surface info.

Real-time imaging

Cost factor

OM (good)

0.5

X

None

ND

0.01

X

36,656

SEM-SE

0.005

X

None

ND

10.0

X

50 300

SEM-VC

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