Failure Analysis of Engineering Materials

The tools and techniques described in Chap. 1 are used extensively in the failure analyses of electronic systems and components. However, the unique characteristics of these systems (e.g., fine size, complex architecture, electrical phenomena) require additional methods for failure analysis. Some of these are described in detail in this section.
These may be classified as follows:
Photography and optical microscopy
X-ray/radiographic component inspection
Infrared thermography
Acoustic microimaging
Metallography
Chemical characterization
Electronic and electrical characterization
Scanning electron microscopy (SEM), energy-dispersive x-ray analysis (EDXA), and wavelength-dispersive spectrometry (WDS)
Miscellaneous techniques
Since the size range of most electronic components and the materials in them (layers) are generally very fine (and progressively getting smaller), microscopic techniques are necessary to image them. Many of these techniques are covered in detail in Chap. 1. Table 6.11 and Fig. 6.44 compare features, resolution, and depth of penetration of various microscopic techniques including some techniques that are unique in their application to electronic FA.
| Technique | Lateral resolution, ?m | Restriction on sample size | Specimen preparation | Destructive/ nondestructive | Depth of focus, ?m | Sub-surface info. | Real-time imaging | Cost factor |
|---|---|---|---|---|---|---|---|---|
| OM (good) | 0.5 | X | None | ND | 0.01 | X | 36,656 | |
| SEM-SE | 0.005 | X | None | ND | 10.0 | X | 50 300 | |
| SEM-VC |