[1.] "New Challenges for robotics and automation," Solid State Technology, April 1994, p. 67.

[2.] Ibid.

[3.] Shiella Galatowitsch, Fabs Look to Minimize AMC, Cleanrooms, June 1999, p. 1.

[4.] Julia Sherry, Assessing Airborne Molecular Contaminant, Future Fab 9, International Issue, p. 135

[5.] Clean Room and Work Station Requirements, Federal Standard 209E, Sec. 1-5, Office of Technical Services, Dept. of Commerce, Washington, D.C.

[6.] 1997 Semiconductor Industry Association, National Technology Roadmap for Semiconductors, San Jose, CA.

[7.] A. Bonora, "Minienvironments and Their Place in the Fab of the Future," Solid State Technology, PennWell Publishing, September 1993.

[8.] Operator Training Course, Class-10 Technologies, Inc., San Jose, Calif., 1983, p. 13.

[9.] Hepa Corporation, Product Tour, www.Hepa.com/filters/tour.htm.

[10.] "SI Honors Top Fabs of 1994," Semiconductor International, April 1994, p. 78.

[11.] B. Newboe, "Minienvironments: Better Cleanrooms for Less," Semiconductor International, March 1993, p. 54.

[12.] J. Licari and L. Enlow, Hybrid Microcircuit Technology Handbook, Noyes Publications, Park Ridge, NJ, 1988, p. 281.

[13.] Dryden Engineering Product Description, Santa Clara, CA, 1995.

[14.] Ibid.

[15.] The New American Revolution, Araclean Services, La Grange, Ill., 1984, p. 9.

[16.] J. Licari and L. Enlow, Hybrid Microcircuit Technology Handbook,