Scintillation X-Ray Fluorescence Spectrometers

4 Results
High-Power Benchtop Sequential WDXRF Spectrometer -- Supermini
from Rigaku Corporation

As the world's only high-power benchtop sequential wavelength dispersive X-ray fluorescence (WDXRF) spectrometer for elemental analysis of fluorine (F) through uranium (U) of almost any material, the Rigaku Supermini uniquely delivers low cost-of-ownership (COA) with high resolution and lower... [See More]

  • Detector Type: Scintillation; Flow Proportional Counter
  • ICP Measurement Mode: Sequential
  • Module Type: Wavelength Dispersive
  • Optical System: Crystal
Sequential X-Ray Fluorescence Spectrometer -- XRF-1800
from Shimadzu Scientific Instruments, Inc.

Utilizing state-of-the-art technology, including enhanced local analysis technology, originally pioneered by Shimadzu in 1994, in conjunction with superb basic functions, the Lab Center XRF-1800 delivers exceptional reliability, stability, and sensitivity. With complete control, analysis and... [See More]

  • Detector Type: Scintillation
  • Excitation Source: X-Ray Tubes
  • ICP Measurement Mode: Simultaneous
  • Remote Interface: Computer Interface; Application Software Included.
In-line, Simultaneous WDXRF Spectrometer -- WaferX 300
from Rigaku Corporation

Rigaku's WaferX 300 represents the culmination of 25 years of experience in the X-ray fluorescence analysis of thin films on silicon wafers. Specifically developed as an in-process metrology tool, the system incorporates "bridge tool" technology — servicing 6", 8", as well as the latest 12"... [See More]

  • Detector Type: Scintillation; Proportional Counter
  • ICP Measurement Mode: Simultaneous
  • Module Type: Wavelength Dispersive
  • Excitation Source: X-Ray Tubes
Simultaneous WDXRF Spectrometer -- WDA-3650
from Rigaku Corporation

The WDA-3650 X-ray fluorescence spectrometer for thin film evaluation continues Rigaku's 30-year history of XRF wafer analyzers that has mirrored the history of thin film device development. This latest XRF metrology tool contributes significantly to the process control of metal film thickness, film... [See More]

  • Detector Type: Scintillation; Proportional Counter
  • ICP Measurement Mode: Simultaneous
  • Module Type: Wavelength Dispersive
  • Excitation Source: X-Ray Tubes