Sputtering Target Thin Film Materials Datasheets

Molybdenum Sputtering Targets
from H.C. Starck Inc. - Fabricated Products Group

To meet the rapidly growing demands to lower cost per watt in the photovoltaic industry, H.C. Starck is actively promoting planar and rotary sputtering targets for thin films PV (TFPV) energy applications. [See More]

  • Type: Sputtering Target; Planar; Rotary or Cylindrical
  • Applications: Photovoltaic or solar cell
  • Material: Molybdenum
  • Width / OD: 125 to 135
CIG (Cu/In/Ga) Targets
from Indium Corporation

Indium Corporation has mastered the art of building targets with copper, indium, and gallium. We specialize in copper-indium-gallium (CIG) targets, as well as binary alloy targets like Cu-Ga and Cu-In and elemental targets like pure indium. All targets are made to order, per customer specifications. [See More]

  • Type: Sputtering Target
  • Applications: Semiconductors
  • Material: Copper; Copper-Induim-Gallium
  • Width / OD: 126
Aluminum Sputtering Target
from Plansee SE

Aluminum possesses very high electrical conductivity. Together with molybdenum, it is used for metallization in thin-film transistors for TFT-LCD monitors, television sets and cell phone displays. High purity. With a purity of 5N our aluminum sputtering targets are simply the best. Why is that so... [See More]

  • Type: Sputtering Target
DC Magnetron SiC Sputtering Target SiC Thin Films -- Hexaloy® SG
from Saint-Gobain High Performance Ceramics, Refractories and Hexoloy® Products

Hexoloy SG, a variant of silicon carbide containing graphitic carbon, is electrically conductive and can be readily DC magnetron sputtered. Silicon carbide thin film coatings are optically transparent, abrasion and corrosion resistant, temperature stable, and have excellent adhesion on a variety of... [See More]

  • Type: Sputtering Target
  • Applications: Decorative / Shielding; Optical Coatings; Magnetic storage; Vapor Barrier
  • Material: Hexoloy
  • Resistivity: 1
Engineered Materials -- Sputtering Materials
from Materion Corporation

Materion Microelectronics & Services ’ collection of innovative engineered materials increases manufacturing yields extends target life and offers the lowest overall cost of ownership. Materion Microelectronics & Services employs a wide range of manufacturing options to meet the needs... [See More]

  • Type: Sputtering Target; Precursor
  • Material: Various
Rhenium Pellets
from Rhenium Alloys, Inc.

Rhenium Alloys is uniquely able to convert ammonium perrhenate - or virtually any form of rhenium-bearing material - into pellets. Pellets (Rhenium Melting Stock) ... offered in two purity grades, 99.99% and 99.9% pure on a metals basis. Can be tailored to meet any specification. Rhenium Pellets are... [See More]

  • Type: EvapSource; Sputtering Target; Powder, Granule, Lumps, Flakes, etc.
  • Applications: Semiconductors
  • Material: Barrier
High Density Ceramic TCO Sputtering Target Aluminum Doped Zinc Oxide (AZO)
from Umicore Materials

For Deposition of transparent conductive oxide layers. AZO is used for (pulsed) DC magnetron sputtering of transparent conductive oxide (TCO) layers with high refractive index on substrates such as glass, polymer and metal foils etc. Thin films based on AZO are transparent, electrically conductive... [See More]

  • Type: Sputtering Target
  • Material Density: 5.3
  • Applications: Decorative / Shielding
  • Width / OD: 128