Sputtering Target Thin Film Materials
from Plansee SE
Aluminum possesses very high electrical conductivity. Together with molybdenum, it is used for metallization in thin-film transistors for TFT-LCD monitors, television sets and cell phone displays. High purity. With a purity of 5N our aluminum sputtering targets are simply the best. Why is that so... [See More]
- Type: Sputtering Target
from Umicore Metal Deposition Solutions
Specifications. Material Type. Precious metals. Material. Ag. Purity. 4N [See More]
- Type: Sputtering Target
- Purity: 99.99
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Material: Au, Ag, Pt, Pd; Metal;
Ag
from Rhenium Alloys, Inc.
Rhenium Alloys is uniquely able to convert ammonium perrhenate - or virtually any form of rhenium-bearing material - into pellets. Pellets (Rhenium Melting Stock) ... offered in two purity grades, 99.99% and 99.9% pure on a metals basis. Can be tailored to meet any specification. Rhenium Pellets are... [See More]
- Type: EvapSource; Sputtering Target; Powder, Granule, Lumps, Flakes, etc.
- Applications: Semiconductors
- Material: Barrier
from Materion Corporation
Materion Microelectronics & Services ’ collection of innovative engineered materials increases manufacturing yields extends target life and offers the lowest overall cost of ownership. Materion Microelectronics & Services employs a wide range of manufacturing options to meet the needs... [See More]
- Type: Sputtering Target; Precursor
- Material: Various
from Indium Corporation
Benefits. Simple. Efficient. Customizable. High throughput. Simply Efficient. Indium Corporation ’s OnSpec CIG alloy sputtering targets, made from copper (Cu), indium (In), and gallium (Ga), are used to produce high-effi ciency CIGS (Cu/In/Ga/di-selenide) solar cells. CIG targets offer tight... [See More]
- Type: Sputtering Target; Planar; Rotary or Cylindrical
- Applications: Semiconductors
- Material: Copper-Induim-Gallium
- Width / OD: 50.38 to 381
from Saint-Gobain Performance Ceramics & Refractories
Hexoloy SG, a variant of silicon carbide containing graphitic carbon, is electrically conductive and can be readily DC magnetron sputtered. Silicon carbide thin film coatings are optically transparent, abrasion and corrosion resistant, temperature stable, and have excellent adhesion on a variety of... [See More]
- Type: Sputtering Target
- Applications: Decorative / Shielding; Optical Coatings; Magnetic storage; Vapor Barrier
- Material: Hexoloy
- Resistivity: 1
from Plansee SE
The high thermal stability and resistance to oxidation of aluminum-chromium coatings means that higher feed speeds, cutting performance and metal removal rates can be achieved without difficulty. A coating of just one thousandth of a millimetre of our materials reliably protects your tools against... [See More]
- Type: Sputtering Target
from Indium Corporation
Gallium is a by-product of aluminum extracted during the processing of bauxite into alumina. It can also occasionally be found in Zn ore. We are a refiner and supplier of gallium materials. Indium Corporation supplies gallium: in the form of shot and ingot, in the form of sputtering targets, after... [See More]
- Type: EvapSource; Sputtering Target; Planar; Rotary or Cylindrical; Powder, Granule, Lumps, Flakes, etc.
- Applications: Photovoltaic or solar cell; Semiconductors
- Material: Gallium
- Purity: 99.99 to 100
from Plansee SE
The hard material coatings chromium (Cr) and chromium nitride (CrN) optimally protect engine components such as piston rings against premature wear and consequently extend the useful life of important engine parts. Chromium is used as a bonding layer for DLC coatings (Diamond Like Carbon), for... [See More]
- Type: Sputtering Target
from Indium Corporation
Germanium is extracted from germanium bearing zinc ores or from certain coal ores, collecting the flue dusts after the burning process. It can occasionally be found in copper ores. We refine germanium at our facility in the USA. [See More]
- Type: EvapSource; Sputtering Target; Powder, Granule, Lumps, Flakes, etc.
- Applications: Photovoltaic or solar cell; Semiconductors
- Material: Germanium
- Purity: 99.99
from Plansee SE
Due to its high electrical conductivity, copper is becoming increasingly popular for use in large-format, high-resolution TFT-LCD television sets. Copper is used as the electrode layer in thin-film transistors. The copper layer controls the individual image dots (pixels) and therefore determines the... [See More]
- Type: Sputtering Target
from Indium Corporation
Indium metal has played a key role in technology advances since it was first investigated by Dr. William S. Murray in 1924 in Utica, NY, and with the creation of the Indium Corporation in 1934, the two have been tied together, leading, and supporting the advancement of technologies that we all rely... [See More]
- Type: EvapSource; Sputtering Target; Planar; Rotary or Cylindrical; Powder, Granule, Lumps, Flakes, etc.; Plating
- Applications: Photovoltaic or solar cell; Semiconductors
- Material: Indium
- Melting Temperature: 314
from Plansee SE
Molybdenum coatings are the crucial components of the thin-film transistors used in TFT-LCD screens. These provide instantaneous control of the individual image dots (pixels) and consequently ensure particularly sharp image quality. Molybdenum layers are also used as back contacts in CIGS solar... [See More]
- Type: Sputtering Target
from Indium Corporation
Indium Corporation is a leading global supplier of pure tin, tin alloys, and compounds. Tin metal is primarily obtained from the mineral cassiterite (SnO2) and is extracted by roasting cassiterite in a furnace with carbon. Rigorous quality standards and advanced analytical instrumentation, such as... [See More]
- Type: EvapSource; Sputtering Target; Powder, Granule, Lumps, Flakes, etc.
- Applications: Photovoltaic or solar cell; Semiconductors
- Material: Tin
- Melting Temperature: 449
from Plansee SE
Thanks to its good adherence to glass and a high level of electrical conductivity, molybdenum is a popular material for electrode layers in thin-film transistors (TFT-LCD) and touch sensors (touch panels). Both during the production process and as a component in the future displays, these layers are... [See More]
- Type: Sputtering Target
from Plansee SE
Our molybdenum tungsten alloys (MoW) offer enhanced stability against ITO, aluminum or copper etching solutions. By adding tungsten to pure molybdenum we can selectively slow down the speed of etching. We can adapt the tungsten concentration in the target precisely to meet your requirements and... [See More]
- Type: Sputtering Target
from Plansee SE
Drills, milling machines or indexable cutting inserts: Nitride and carbide titanium (Ti) and zirconium (Zr) coatings allow you to protect your tools against wear economically and reliably. In addition, zirconium is suitable for decorative coatings in brass-like colors, for example for operating... [See More]
- Type: Sputtering Target
from Plansee SE
Our targets and cathodes made from titanium-aluminum (TiAl) ensure that drills, milling machines, indexable cutting inserts and other tools are protected by a hard, oxidation-resistant nitride coating (TiAlN). High feed speeds, excellent cutting performance and impressive metal removal rates: not a... [See More]
- Type: Sputtering Target
from Plansee SE
During the machining of aluminum, particles of material may adhere to the tool tip. The result: The tool has to exert more force to remove the workpiece material and wear is accelerated. The tool tip often breaks prematurely. Not so with coatings made of titanium diboride (TiB2). These are... [See More]
- Type: Sputtering Target
from Plansee SE
Together, titanium and silicon (TiSi) make an outstanding team for nitride hard material coatings. Silicon guarantees excellent resistance to oxidation while the presence of titanium ensures particularly hard coatings. When combined, the two elements are wear resistant even at very high... [See More]
- Type: Sputtering Target
from Plansee SE
Tungsten carbide (WC) is used for the production of DLC coatings (Diamond Like Carbon). These are particularly hard and long-lasting and protect engine parts and other automotive industry components that are exposed to high stresses against wear. By reducing the coefficient of friction, DLC coatings... [See More]
- Type: Sputtering Target
from Plansee SE
Tungsten layers are components of the thin-film transistors used in TFT-LCD screens. They are used wherever large screen formats, particularly high image definition and optimized contrasts are needed. But tungsten is also used as a diffusion barrier and a conductive connector in the microelectronics... [See More]
- Type: Sputtering Target