Products & Services
See also: Categories | Featured Products | Technical Articles | More Information-
Supplier: CoorsTek
Description: Tek provides custom engineered OEM components for: Chemical Vapor Deposition (CVD) Physical Vapor Deposition (PVD) Electrochemical Plating / Electrochemical Deposition (ECP, ECD) Atomic Layer Deposition (ALD) DEPOSITION CHAMBER COMPONENTS
- Applications: Chemical / Materials Processing
- Material Type: Aluminum Nitride, Alumina / Aluminum Oxide, Carbide Materials, Silicon Carbide, Specialty Ceramic
- Shape / Form: Fabricated / Custom Shape
-
Supplier: TSI Incorporated
Description: liquid and generate a voltage to operate the piezoelectric control valve in the ‘PE’ series Turbo-Vaporizers. The 2940 features a fast response time making it a good choice for short duration vapor pulses frequently used in ALD or short pulse CVD. The 2940 features zoned
- Coating System Type: Other
- Technology / Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
-
Supplier: TSI Incorporated
Description: the liquid and generate a voltage to operate the piezoelectric control valve in the ‘PE’ series Turbo-Vaporizers. The 2940 features a fast response time making it a good choice for short duration vapor pulses frequently used in ALD or short pulse CVD. The 2940 features zoned
- Coating System Type: Other
- Technology / Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
-
-
Supplier: TSI Incorporated
Description: liquid and generate a voltage to operate the piezoelectric control valve in the ‘PE’ series Turbo-Vaporizers. The 2940 features a fast response time making it a good choice for short duration vapor pulses frequently used in ALD or short pulse CVD. The 2940 features zoned
- Coating System Type: Other
- Technology / Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
-
Supplier: CoorsTek
Description: thermal and purity properties of advanced ceramics. Recommended Diffusion & LPCVD Materials TPSS, UltraClean™ Recrystallized Silicon Carbide PureSiC® CVD Silicon Carbide Coatings: CVD SiC Quartz
- Applications: Other
- Material Type: Carbide Materials, Silicon Carbide
- Shape / Form: Fabricated / Custom Shape
-
Supplier: TSI Incorporated
Description: Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in
- Coating System Type: Other
- Technology / Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
-
Supplier: CoorsTek
Description: of advanced ceramics. Recommended Diffusion & LPCVD Materials TPSS, UltraClean™ Recrystallized Silicon Carbide PureSiC® CVD Silicon Carbide Coatings: CVD SiC Quartz
- Applications: Other
- Material Type: Specialty Ceramic
- Shape / Form: Fabricated / Custom Shape
-
Supplier: CoorsTek
Description: Process tubes are used in the reaction zones of semiconductor furnaces - requiring high purity and thermal stability. Some processing equipment uses liners within the process tubes. Smaller, traditional process tubes typically use quartz. Larger, higher performance tubes frequently use high
- Applications: Other
- Material Type: Carbide Materials, Silicon Carbide
- Shape / Form: Fabricated / Custom Shape
-
Supplier: EBARA Technologies, Inc.
Description: Gas Inlet Devices Patent gas inlet devices minimize rate of restriction and automatic gas inlet plunger removes restrictions without process interruptions Second Scrubbing Chamber Five fine spray, high velocity nozzles ensures effective removal of impurities First Scrubbing Chamber Coarse spray,
- Applications & Materials Processed: Semiconductor Manufacturing
- Coating System Type: Cluster Tool (Multi-Chamber / Single Wafer), Factory / Free Standing
- Materials Processed (Deposit or Substrate): Metal, Silicon, Nitrides / TiN, Polymer / Organic, Tungsten / Refractory Metal
- Technology / Process: Chemical Vapor Deposition (CVD)
-
Supplier: Anton Paar
Description: multilayered stack. Typical examples include CVD, PVD, plasma spray coatings, anodic oxidation layers, chemical and galvanic deposits, polymers, paints and lacquers.
- Display & Special Features: Graphic / Video Display, Laboratory / Batch
- Property Analyzed: Other
- Test Media / Material: Adhesives / Coatings
-
Supplier: Linde North America, Inc.
Description: Fluorine is an active element required for all dry chamber cleaning processes. Our Generation-F® on-site fluorine generators provide the lowest cost-per-clean for plasma-enhanced or thermal CVD tool dry-chamber cleaning. Fluorine is the ideal replacement for fluorine-bearing gases
- Generator Type: Specialty / Other
- Output Flow Rate: 1.33 to 26.67 SLM
-
Supplier: Anton Paar
Description: PVD, CVD, PECVD, photoresist, paints, lacquers, and many other types of films, covering optical, micro-electronic, protective, decorative and other applications. Substrates can be hard or soft, including metal alloys, semiconductors, glass, refractive and organic materials.
- Display & Special Features: Laboratory / Batch
- Property Analyzed: Other
- Test Media / Material: Adhesives / Coatings
-
Supplier: Xenemetrix Ltd.
Description: RoHS Vision The Fast and Easy Method for Ensuring Compliance with Regulations for Hazardous Substances The Restriction of Hazardous Substances Directive (RoHS) restricts toxic metals in electrical and electronic equipment. Xenemetrix’s new RoHS Vision uses a high
- Applications: CVD / PVD Films, Electroplated Films, Semiconductor Wafers
- Measurement Capability: Composition
- Mounting / Loading: Floor Mounted / Stand-alone, Manual Loading
- Non-contact: Yes
-
Supplier: Anton Paar
Description: The Microindentation Tester is ideally suited to the measurement of mechanical properties such as the hardness and elastic modulus of thin hard coatings, thick soft coatings and bulk materials such as PVD and CVD hard coatings and ceramic surface layers. It provides accurate and reproducible
- Display & Special Features: Laboratory / Batch
- Property Analyzed: Other
- Test Media / Material: Adhesives / Coatings
-
Supplier: Anton Paar
Description: The Microindentation Tester is ideally suited to the measurement of mechanical properties such as the hardness and elastic modulus of thin hard coatings, thick soft coatings and bulk materials such as PVD and CVD hard coatings and ceramic surface layers. It provides accurate and reproducible
- Force / Load Capacity: 6.74 lbs
- Mechanical Test: Specialty / Other
- Stroke / Travel: 0.0394 inch
-
Supplier: PTB Sales, Inc.
Description: Ask for current price. The Brooks Gemini Express 5000 (GX5000) is a vacuum cluster tool integration platform for 200mm to 300mm wafers, with the capability for two load locks and three process facets. The GX5000 handles wafers without mechanical changes, and is ideally suited for PVD or CVD
-
Description: Nor-Cal Products Deposition Monitors are used to measure the thin film (deposition) thicknesses, rate of deposition or frequency, in conjunction with the crystal sensor. Models are available which independently monitor 2 or 6 crystals. Included Windows software allows the user to change the monitor
- Applications: CVD / PVD Films
- Measurement Capability: Deposition Rate, Thickness - Film / Layer
- Mounting / Loading: Floor Mounted / Stand-alone
- Technology: Crystal Microbalance (QCM)
-
Description: Nor-Cal Products Deposition Monitors are used to measure the thin film (deposition) thicknesses, rate of deposition or frequency, in conjunction with the crystal sensor. Models are available which independently monitor 2 or 6 crystals. Included Windows software allows the user to change the monitor
- Applications: CVD / PVD Films
- Measurement Capability: Deposition Rate, Thickness - Film / Layer
- Mounting / Loading: Floor Mounted / Stand-alone
- Technology: Crystal Microbalance (QCM)
-
Supplier: WDI Wise Device Inc.
Description: ranging from infrared (1064 nm) to deep ultraviolet (266 nm). This innovation facilitates efficient trimming of metals, silicon and ITO as well as open line repair, within a single piece of repair equipment. The MIC4 is fully compatible with the ATF4, ATF5, and LLC6 linear lens changer
- Applications: CVD / PVD Films, Electroplated Films, Packaged ICs / Ceramic Substrates, Photolithography / Patterning, Other
- Form Factor: Monitor / Instrument
- Measurement Capability: Defects / ADC, Other
- Mounting / Loading: Floor Mounted / Stand-alone
-
Supplier: Rogue Valley Microdevices, Inc.
Description: facility contains processing equipment capable of volume manufacturing yet flexible enough to accommodate wafer sizes from 50mm to 200mm. We offer full Device Fabrication and Design services along with a variety of individual processes to support our growing network of satisfied customers.
- Functional / Performance: Antireflective, Chemical Resistant, Conductive, Dielectric
- Hard Coating / Treatment: Yes
- Material / Substrate Capabilities: Aluminum, Carbide, Composites, Copper / Copper Alloys, Glass, Metal, Nickel / Nickel Alloys, Precious Metals, Titanium
- Material Selection / Design Assistance: Yes
-
Supplier: Rogue Valley Microdevices, Inc.
Description: facility contains processing equipment capable of volume manufacturing yet flexible enough to accommodate wafer sizes from 50mm to 200mm. We offer full Device Fabrication and Design services along with a variety of individual processes to support our growing network of satisfied customers
- Capabilities: Dielectric / CVD Thin Film, Metallization - PVD Thin Film, Oxidation / Doping
- Location: North America, United States Only, Northwest US Only
- Materials: Silicon, Ceramic, Compound Semiconductor, Glass, Quartz, SOI, Specialty / Other
- Services: Design / Engineering, Prototyping, Pilot / Scale-Up, Production, R & D / Development, Specialty / Other
-
Supplier: Changchun Yutai Optics Co., Ltd.
Description: CVD ZnSe is the first choice of optical components for high power CO2 lasers due to its low bulk absorption at 10.6 microns Also its high optical uniformity and low scatter make it well-suited for optical elements in high resolution thermal imaging equipment.
-
Description: series Chemical Vapor Deposition (CVD) process equipment. New features and capabilities simplify the chamber set up process, eliminate potential sources of operator error, and require less technician movement around the machine, resulting in increased productivity and uptime. The
- Applications: Other
- Measuring Technology: Electronic
-
Supplier: Gems Sensors & Controls
Description: requiring high overpressure. The 6700 is housed in a rugged enclosure for harsh conditions and features superb stability by incorporating Gems'™ CVD sensing element. Applications: Off Highway Vehicles Natural Gas Equipment Semiconductor Processing Power Plants Refrigeration Robotics
- Accuracy: 0.1500 ±% FS
- Electrical Output: Analog Current
- Features: Intrinsically Safe, Submersible
- Media: Liquid
-
Supplier: Gems Sensors & Controls
Description: requiring high overpressure. The 6700 is housed in a rugged enclosure for harsh conditions and features superb stability by incorporating Gems'™ CVD sensing element. Applications: Off Highway Vehicles Natural Gas Equipment Semiconductor Processing Power Plants Refrigeration Robotics
- Device Classification: Level Gauge
- Level Measurement Type: Continuous Level
- Material Temperature Range: -40 to 300 F
- Maximum Operating Pressure: 750 psi
-
Supplier: Gems Sensors & Controls
Description: toughness via its CVD and ASIC design coupled with a thicker diaphragm. The thicker diaphragm enables these pressure transducer sensors to survive most pressure spikes caused by pump ripple, solenoid valves, etc. The 1600 series extends the packaging options by providing an all welded
- Accuracy: 0.5000 ±% FS
- Device Category: Transducer
- Electrical Output: Analog Voltage, Analog Current
- Media: Liquid
-
Supplier: OSI Optoelectronics
Description: OSI Laser Diode, Inc.‘s (LDI) CVD series lasers are strained layer quantum well devices fabricated by the MOCVD process. These pulsed lasers are available with up to 140 W of peak power at 905 nm. They offer a stable output power between -40°C and +80°C. Product
- CDRH Classification: Class IIIb
- Fiber Pigtailed: Yes
- Laser Output: Pulsed
- Laser Power: 2000 to 100000 milliwatts
-
Description: laser, Er:YAG laser, CO, HF laser. The DLC coating window is a technique for forming plasma in a high vacuum state and coating the product surface with carbon as the main component of diamond, which is manufactured using PVD or CVD equipment. The DLC coating serves as a window to
- Type: Specialty / Other
-
Description: Pyrolytic boron nitride is a grade of hexagonal boron nitride. It is produced by the chemical vapor deposition process to create its solid body and all the boron nitride crystals grow parallel to the surface on which the vapor is deposited. Due to the nature of the CVD process, PBN parts
- Material Type: Specialty Ceramic
-
Supplier: Changchun Yutai Optics Co., Ltd.
Description: CVD ZnSe is the first choice of optical components for high power CO2 lasers to its wide transmission band and low absorption in the red portion of the visible spectrum. Zinc Selenide is transparent from 600 nm - 16 µm and is ideal for IR applications. It is well-suited for optical
-
Supplier: Gems Sensors & Controls
Description: accuracy in a variety of enclosure options. The 2600 extends the packaging options via an all welded stainless steel back end for demanding submersible and industrial applications. The 2200 and the 2600 pressure transducers feature proven CVD sensing technology, an ASIC (amplified units), and
- Accuracy: 0.2500 ±% FS
- Electrical Output: Analog Voltage, Analog Current
- Features: Intrinsically Safe
- Media: Liquid
-
Supplier: Electro Optical Components, Inc.
Description: Synthetic diamond made by Chemical Vapor Deposition (CVD) is a fast growing, cost effective material. Delivering the superior properties of diamond in larger sizes, at a lower cost and with increased post- processing capabilities; CVD Diamond has replaced less effective materials in
- Materials: Photonics DIAMOND
- Thickness: 0.1500 to 0.5000 mm
- Wedged or Parallel?: Parallel
- Window Type: Plane Windows
-
Supplier: DAS Environmental Expert GmbH
Description: Waste Gas Treatment with GIANT (burn/wet)at the Point-Of-Use Process Waste Gas Treatment with GIANT GIANT was specifically developed for treating the larger amounts of waste gases from CVD processes in the photovoltaic and flat panel display (TFT/LCD) industries. Being
-
Supplier: ToneCooling Technology Co., Ltd
Description: thermal conductivity is slightly inferior to that of diamond copper. Diamond copper and diamond aluminum are currently the best heat dissipation materials in our company. Single crystal diamond and CVD diamond exhibit high thermal conductivity, but their thermal expansion coefficient is too
- Fan Airflow: 41.4 SCFM
- Fan Noise: 47.67 dB
- Fan Speed: 6800 rpm
- Fan Voltage: 12 VDC
-
Supplier: DAS Environmental Expert GmbH
Description: treatment portfolio. It was specifically developed to manage demanding waste processes like CVD processes in the semiconductor and photovoltaic industries. Longer maintenance cycles increase the system’s uptime. Proven Quality for Waste Gas Treatment with STYRAX Operating
-
Supplier: 3X Ceramic Parts Company Limited
Description: type of alumina has higher mechanical strength, excellent corrosion resistance, can produce large component products, in addition, because of its excellent plasma resistance is widely used in the semiconductor industry, such as CVD equipment, etching equipment and other parts.
- Density: 3.92 g/cc
- Material Type: Alumina / Aluminum Oxide
-
Supplier: EQYO
Description: Electronics / Semiconductor Robotic Equipment CVD / DVD Chamber Precision Pumps Seals for Wet and Dry Wafer Fabrication Life Science Advanced Analytic Equipment Solenoid Valves Surgical Instrumentation Medical Devices
- Hardness Rating (Shore A Scale): 50 durometer
- Synthetic Rubber Materials (Thermosets): Fluoroelastomer (FKM)
-
Supplier: EQYO
Description: Electronics / Semiconductor Robotic Equipment CVD / DVD Chamber Precision Pumps Seals for Wet and Dry Wafer Fabrication Life Science Advanced Analytic Equipment Solenoid Valves Surgical Instrumentation Medical Devices
- Hardness Rating (Shore A Scale): 50 durometer
- Synthetic Rubber Materials (Thermosets): Fluoroelastomer (FKM)
-
Supplier: Brooks Instrument
Description: Cost efficient retrofit/upgrade of legacy MFCs in refurbished semiconductor process tools Reduce MFC inventory in six-inch/eight-inch semiconductor fabs MOCVD for LED and power device manufacturing Solar/thin film chemical vapor deposition (CVD) systems Analytical OEM equipment
- Mass Flow Rate: 8.26E-6 to 0.8259 lbs/min
- Electrical Output: Analog Current, Analog Voltage
- Features: Controller Functions
- Flow Meter Type: Mass Flow Meter
-
Supplier: Brooks Instrument
Description: Cost efficient retrofit/upgrade of legacy MFCs in refurbished semiconductor process tools Reduce MFC inventory in six-inch/eight-inch semiconductor fabs MOCVD for LED and power device manufacturing Solar/thin film chemical vapor deposition (CVD) systems Analytical OEM equipment
- Media: Liquid, Gas / Air
- Number of Control Outputs: 1 outputs
- Number of Inputs: 1 inputs
-
Description: Technologies Inc., became an independent New York Stock Exchange-listed company in 1992. The production facility of The Pyrogenics Group is in Easton, Pennsylvania. The multi-building complex houses a variety of sophisticated equipment including two large high-temperature furnaces capable of
- Equipment Capability: Furnace, Induction, Protective Atmosphere, Vacuum Heat Treating
- Heat Treating Processes: Annealing
- Regional Preference: North America, United States Only, Northeast US Only
- Services Offered: Development Assistance, Finishing / Coating, Grinding / Machining, Laboratory Testing & Inspection
-
Description: Technologies Inc., became an independent New York Stock Exchange-listed company in 1992. The production facility of The Pyrogenics Group is in Easton, Pennsylvania. The multi-building complex houses a variety of sophisticated equipment including two large high-temperature furnaces capable of
- Location: North America, United States Only, Northeast US Only
- Material / Substrate Capabilities: Carbide, Ceramic, Composites
- Recoating: Abrasives / Superabrasives, Ceramic Coating, Chemical Finish / Conversion, Dry Lubricant Coating, Hardfacing, Painting, Thin Film Coating
- Refinishing / Surface Treatment: Mirror Finishing, Sanding / Grinding, Other
-
Description: Technologies Inc., became an independent New York Stock Exchange-listed company in 1992. The production facility of The Pyrogenics Group is in Easton, Pennsylvania. The multi-building complex houses a variety of sophisticated equipment including two large high-temperature furnaces capable of
- Cleaning / Parts Washing: Burn-off / Thermal Cleaning, Pressure / Spray Washing
- Finishing / Surface Treatment: Mirror Finishing, Sanding / Grinding, Other
- Material / Substrate Capabilities: Carbide, Ceramic, Composites
- Regional Preference: North America, United States Only, Northeast US Only
-
Description: Technologies Inc., became an independent New York Stock Exchange-listed company in 1992. The production facility of The Pyrogenics Group is in Easton, Pennsylvania. The multi-building complex houses a variety of sophisticated equipment including two large high-temperature furnaces capable of
- Capacity (Mass Basis): Over 8.82E-6 lbs
- Capacity (Volume Basis): Over 3.53E-9 cubic feet
- Chemicals / Chemical Products: Lubricants / Greases
- Form: Powders, Nanomaterials, Bulk Solids / Granules
Find Suppliers by Category Top
Featured Products Top
-
Oriental Motor is pleased to introduce our latest driver added to our DC input stepper motor driver line up, the CVD RS-485 Communication type bi-polar drivers. The CVD driver is a compact standardized 24 VDC driver providing the lowest noise and vibration available through the fully (read more)
Browse Stepper Motors (rotary) Datasheets for Oriental Motor USA -
creation time by automatically controlling electromagnetic brakes and directly importing encoder information. Two connector type options are available. Product Line-up CVD4A-KED (Straight connector type) CVD4AR-KED (Right-Angle connector (read more)
Browse DC Motors Datasheets for Oriental Motor USA -
In semiconductor equipment manufacturing, engineers often face the challenge of finding materials that can withstand plasma corrosion, extreme temperatures, and demanding precision requirements. Traditional metals cannot deliver the necessary (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
. Industry applications: Ideal for gas/chemical delivery systems, accelerators, fusion research, and PVD/CVD/etch equipment. Additional benefits (read more)
Browse Metal Ring Seals Datasheets for Sonkit (Shanghai) Industry Technology Co., Ltd. -
, subsea compressors, electronic submersible pumps, flow meters Semiconductors for PVD/CVD/etch equipment and for gas/chemical delivery systems (read more)
Browse Metal Ring Seals Datasheets for Technetics Group -
for semiconductors as an example, the precision ceramic structural components provided by coorstek cover a series of products, such as special components for photolithography machine, special components for plasma etching equipment, special components for pvd/cvd, special components for ion (read more)
Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for 3X Ceramic Parts Company Limited -
(mm? Coating Focus lens Laser Grade CVD ZnSe 12 25.4/38.1/50.8/ 63.5/ 76.2/ 101 (read more)
Browse Optical Lenses Datasheets for Changchun Yutai Optics Co., Ltd. -
Fountyl manufactures electrostatic chucks (ESCs) for semiconductor wafer fabrication equipment, available in both Coulomb and Johnsen-Rahbek types. These ESCs are widely used in plasma etching, CVD, PVD, and ion implantation chambers, providing engineers with reliable wafer clamping and precise (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
traditional materials under severe chemical cleaning and high-vacuum conditions, reducing equipment downtime. (read more)
Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for Fountyl Technologies Pte. Ltd. -
This dry screw pump is designed for semiconductor applications such as Etch, CVD, Diffusion, and ALD processes that require a high gas temperature, excellent powder handling, corrosive gas tolerance, and high pumping speed. The pump temperature and nitrogen dilution can both be (read more)
Browse Vacuum Pumps and Vacuum Generators Datasheets for Busch Vacuum Solutions
Conduct Research Top
-
Capacitive Touch Using Only an ADC (CVD) (.pdf)
This application note describes a new hardware sensing method called Capacitive Voltage Divider (CVD) which uses no external components.
-
CVD-5B Metal Hardening Process
Description and case studies of a proprietary metal hardening process involving diffusion of boron into a base metal to create a metallurgical shield that effectively counteracts abrasion and corrosion.
-
Hydrogen Monitoring of CVD Process Tools
Hydrogen and the hazards of hydrogen leaks are present in many areas of semiconductor manufacturing facilities. While the basic need to continuously monitor hydrogen leaks is clear, the proper selection and placement of hydrogen sensors requires careful consideration. Hydrogen, the lightest of the
-
Chemical Vapor Deposition (CVD) of Diamond-Like Coatings (.pdf)
This application relates to the chemical vapor deposition of a diamond-like nanocomposite material, sometimes referred to as DLC (Diamond-Like Coating). The coating has low friction properties combined with improved hardness and wear resistance. The film is deposited in a modified plasma assisted
-
How to Ensure the Purity Synthetic Diamonds Created by Chemical Vapor Disposition
Synthetic diamonds are created and used all over the world, for similar applications as naturally occurring diamonds. Recently, the method of using chemical vapor deposition (CVD) to 'grow ' diamonds in laboratory conditions has become more common.
-
How to Ensure the Purity of Synthetic Diamonds Created by Chemical Vapor Deposition
Synthetic diamonds are created and used all over the world, for similar applications as naturally occurring diamonds. Recently, the method of using chemical vapor deposition (CVD) to 'grow ' diamonds in laboratory conditions has become more common.
-
What Is Pyrolytic Boron Nitride?
Pyrolytic BN or PBN is short for pyrolytic boron nitride. It is a type of hexagonal boron nitride created by the chemical vapor deposition (CVD) method, is also an extremely pure boron nitride that can reach more than 99.99%, covering almost no porosity.
-
EETimes.com | Electronics Industry News for EEs & Engineering Managers
Firm rolls CVD system for diamond semis sp3 Diamond Technologies Inc. has rolled out the Model 650, a hot-filament, CVD diamond deposition reactor. Synopsys, Magma court battle set to tip-off Monday After an extended war of words that has lasted for more than 18 months, the Synopsys-Magma patent
More Information Top
Indicates content that may require registration and/or purchase.
-
Automated lot dispatching in semiconductor fabrication
Due to its unique placement at the back end of the production line, this CVD equipment set was observed to improperly dispatch lots thus affecting feeds to the back end constraints and jeopardizing overall factory output commitments.
-
Introduction to Microfabrication 2nd Edition
Therefore, either most plasma and CVD equipment uses inert perfluorinated pump oils (Fomblin, Krytox), or else dry pumps are employed.
-
Evaluation of the simultaneous use of Cp 2 VMe 2 and CpTiCl 2 N(SiMe 3 ) 2 as precursors to ceramic thin films containing titanium and vanadium: Towards titani...
Both precursors being air‐ and moisture‐sensitive, high‐purity CVD equipment was used to reduce oxycarbide formation.
-
Development of a dual-stage virtual metrology architecture for TFT-LCD manufacturing
In stage I, the glass is deposited by a five-chamber CVD equipment .
-
A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing
The CVD equipment parameter data and the associated data preprocess are introduced first.
-
A new defect distribution metrology with a consistent discrete exponential formula and its applications
(a) SiO2 CVD equipment #1.
-
A virtual metrology system based on least angle regression and statistical clustering
…target (deposition thickness objective), the equipment is composed of three separated chambers (A, B, and C) that exhibit different behaviors, and each chamber is divided into two sub-chambers (1 and 2) (the structure of the CVD equipment is shown in Figure…
-
Thin film installations for production of flat panel displays
4.2 plasma CVD installations .