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Supplier: Daitron Co., Ltd.
Description: Ion Plating equipment of new method which achieves kinds of coating (thick film oxidized film, carbonized film, etc.) with PVD technology, previously only achievable with CVD method. Performs ionization effectively by impact between evaporating particle and thermal electron on
- Applications: CVD / PVD Films
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Supplier: CoorsTek
Description: custom engineered OEM components for: Chemical Vapor Deposition (CVD) Physical Vapor Deposition (PVD) Electrochemical Plating / Electrochemical Deposition (ECP, ECD) Atomic Layer Deposition (ALD) DEPOSITION CHAMBER COMPONENTS Everywhere process equipment is exposed to the harsh
- Features: Alumina / Aluminum Oxide, Carbide Materials, Specialty Ceramic
- Specialty Ceramic Type: Aluminum Nitride, Silicon Carbide
- Applications: Chemical / Materials Processing
- Shape / Form: Fabricated / Custom Shape
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Supplier: CoorsTek
Description: Materials TPSS, UltraClean™ Recrystallized Silicon Carbide PureSiC® CVD Silicon Carbide Coatings: CVD SiC Quartz
- Material Type: Carbide Materials, Silicon Carbide
- Shape / Form: Fabricated / Custom Shape
- Features: Other
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Supplier: CoorsTek
Description: thermal and purity properties of advanced ceramics. Recommended Diffusion & LPCVD Materials TPSS, UltraClean™ Recrystallized Silicon Carbide PureSiC® CVD Silicon Carbide Coatings: CVD SiC Quartz
- Material Type: Carbide Materials, Silicon Carbide
- Shape / Form: Fabricated / Custom Shape
- Features: Other
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Supplier: CoorsTek
Description: components for high-performance ion implant equipment. Recommended Materials for Ion Implant Processing PlasmaPure™ UC Ultra-Pure Alumina PureSiC® Ultra-Pure CVD Silicon Carbide StatSafe™ ESD-Safe Ceramics
- Features: Alumina / Aluminum Oxide, Carbide Materials, Other, Specialty Ceramic
- Applications: Electronics / RF-Microwave
- Shape / Form: Fabricated / Custom Shape
- Specialty Ceramic Type: Silicon Carbide
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Supplier: TSI Incorporated
Description: voltage to operate the piezoelectric control valve in the ‘PE’ series Turbo-Vaporizers. The 2940 features a fast response time making it a good choice for short duration vapor pulses frequently used in ALD or short pulse CVD. The 2940 features zoned ‘PID’ settings and a self-learning function
- Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
- Features: Other
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Supplier: TSI Incorporated
Description: Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in
- Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
- Features: Other
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Supplier: TSI Incorporated
Description: voltage to operate the piezoelectric control valve in the ‘PE’ series Turbo-Vaporizers. The 2940 features a fast response time making it a good choice for short duration vapor pulses frequently used in ALD or short pulse CVD. The 2940 features zoned ‘PID’ settings and a self-learning function
- Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
- Features: Other
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Supplier: TSI Incorporated
Description: voltage to operate the piezoelectric control valve in the ‘PE’ series Turbo-Vaporizers. The 2940 features a fast response time making it a good choice for short duration vapor pulses frequently used in ALD or short pulse CVD. The 2940 features zoned ‘PID’ settings and a self-learning function
- Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
- Features: Other
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Supplier: Changchun Yutai Optics Co., Ltd.
Description: CVD ZnSe is the first choice of optical components for high power CO2 lasers due to its low bulk absorption at 10.6 microns Also its high optical uniformity and low scatter make it well-suited for optical elements in high resolution thermal imaging equipment.
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Description: Chemical Vapor Deposition (CVD) process equipment. New features and capabilities simplify the chamber set up process, eliminate potential sources of operator error, and require less technician movement around the machine, resulting in increased productivity and uptime. The app-based
- Measuring Technology: Electronic
- Features: Other
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Supplier: Linde North America, Inc.
Description: Fluorine is an active element required for all dry chamber cleaning processes. Our Generation-F® on-site fluorine generators provide the lowest cost-per-clean for plasma-enhanced or thermal CVD tool dry-chamber cleaning. Fluorine is the ideal replacement for fluorine-bearing gases such as
- Output Flow Rate: 1.3333333333333328 to 26.666666666666657 SLM
- Features: Specialty / Other
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Supplier: PTB Sales, Inc.
Description: Ask for current price. The Brooks Gemini Express 5000 (GX5000) is a vacuum cluster tool integration platform for 200mm to 300mm wafers, with the capability for two load locks and three process facets. The GX5000 handles wafers without mechanical changes, and is ideally suited for PVD or CVD
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Supplier: Anton Paar
Description: multilayered stack. Typical examples include CVD, PVD, plasma spray coatings, anodic oxidation layers, chemical and galvanic deposits, polymers, paints and lacquers.
- Test Media: Adhesives / Coatings
- Display & Special Features: Graphic / Video Display
- Mounting / Loading Options: Laboratory / Batch
- Features: Other
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Supplier: Anton Paar
Description: CVD, PECVD, photoresist, paints, lacquers, and many other types of films, covering optical, micro-electronic, protective, decorative and other applications. Substrates can be hard or soft, including metal alloys, semiconductors, glass, refractive and organic materials.
- Test Media: Adhesives / Coatings
- Mounting / Loading Options: Laboratory / Batch
- Features: Other
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Supplier: Gems Sensors & Controls
Description: applications. A modular design allows special ordering of fittings, electrical cables, etc. for OEM applications. The ASIC and CVD technology enables Gems™ to offer almost any output over any pressure range. Applications: Off-Highway Vehicles Natural Gas Equipment Semiconductor
- Working Pressure Range: 0 to 6,000 psi
- Accuracy: 0.5 ±% FS
- Operating Temperature: -40 to 260 F
- Signal Output: Analog Current, Analog Voltage
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Supplier: Anton Paar
Description: The Microindentation Tester is ideally suited to the measurement of mechanical properties such as the hardness and elastic modulus of thin hard coatings, thick soft coatings and bulk materials such as PVD and CVD hard coatings and ceramic surface layers. It provides accurate and reproducible
- Force / Load Capacity: 6.744 lbs
- Stroke / Travel: 0.0393701 inch
- Features: Specialty / Other
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Supplier: Anton Paar
Description: The Microindentation Tester is ideally suited to the measurement of mechanical properties such as the hardness and elastic modulus of thin hard coatings, thick soft coatings and bulk materials such as PVD and CVD hard coatings and ceramic surface layers. It provides accurate and reproducible
- Test Media: Adhesives / Coatings
- Mounting / Loading Options: Laboratory / Batch
- Features: Other
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Supplier: Gems Sensors & Controls
Description: is housed in a rugged enclosure for harsh conditions and features superb stability by incorporating Gems'™ CVD sensing element. Applications: Off Highway Vehicles Natural Gas Equipment Semiconductor Processing Power Plants Refrigeration Robotics HVAC
- Measuring Range: 6 to 72 inch
- Maximum Operating Pressure: 750 psi
- Material Temperature Range: -40 to 300 F
- Column Height: 6 to 72 inch
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Supplier: Gems Sensors & Controls
Description: is housed in a rugged enclosure for harsh conditions and features superb stability by incorporating Gems'™ CVD sensing element. Applications: Off Highway Vehicles Natural Gas Equipment Semiconductor Processing Power Plants Refrigeration Robotics HVAC
- Working Pressure Range: 7.5 to 6,000 psi
- Accuracy: 0.15 ±% FS
- Operating Temperature: -22 to 212 F
- Pressure Measurement: Absolute, Gauge
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Description: parameters, save process readings in Excel formatted files and operate the monitor remotely. Monitors are Class 1 Equipment CE approved.
- Applications: CVD / PVD Films
- Technology: Crystal Microbalance (QCM)
- Measurements: Deposition Rate, Thickness - Film / Layer
- Mounting / Loading: Floor Mounted / Stand-alone
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Description: parameters, save process readings in Excel formatted files and operate the monitor remotely. Monitors are Class 1 Equipment CE approved.
- Applications: CVD / PVD Films
- Technology: Crystal Microbalance (QCM)
- Measurements: Deposition Rate, Thickness - Film / Layer
- Mounting / Loading: Floor Mounted / Stand-alone
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Supplier: EBARA Technologies, Inc.
Description: Gas Inlet Devices Patent gas inlet devices minimize rate of restriction and automatic gas inlet plunger removes restrictions without process interruptions Second Scrubbing Chamber Five fine spray, high velocity nozzles ensures effective removal of impurities First Scrubbing Chamber Coarse spray,
- Process: Chemical Vapor Deposition (CVD)
- Type: Cluster Tool (Multi-Chamber / Single Wafer), Factory / Free Standing
- Materials Processed: Metal, Nitrides / TiN, Polymer / Organic, Silicon, Tungsten / Refractory Metal
- Applications: Semiconductor Manufacturing
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Supplier: OSI Optoelectronics
Description: OSI Laser Diode, Inc.‘s (LDI) CVD series lasers are strained layer quantum well devices fabricated by the MOCVD process. These pulsed lasers are available with up to 140 W of peak power at 905 nm. They offer a stable output power between -40°C and +80°C. Product Features High Reliability and
- Wavelength Range: 850 to 905 nm
- Laser Power: 2,000 to 100,000 milliwatts
- Operating Temperature Range: -40 to 85 C
- Pulse Length: 100 to 200 ns
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Supplier: Electro Optical Components, Inc.
Description: Synthetic diamond made by Chemical Vapor Deposition (CVD) is a fast growing, cost effective material. Delivering the superior properties of diamond in larger sizes, at a lower cost and with increased post- processing capabilities; CVD Diamond has replaced less effective materials in
- Thickness: 0.15000000000000002 to 0.5 mm
- Wedged or Parallel?: Parallel
- Window Material: Photonics DIAMOND
- Window Type: Plane Windows
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Supplier: 3X Ceramic Parts Company Limited
Description: mechanical strength, excellent corrosion resistance, can produce large component products, in addition, because of its excellent plasma resistance is widely used in the semiconductor industry, such as CVD equipment, etching equipment and other parts.
- Density: 3.9199975259819313 g/cc
- Material Type: Alumina / Aluminum Oxide
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Description: Er:YAG laser, CO, HF laser. The DLC coating window is a technique for forming plasma in a high vacuum state and coating the product surface with carbon as the main component of diamond, which is manufactured using PVD or CVD equipment. The DLC coating serves as a window to increase the
- Features: Specialty / Other
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Supplier: Xenemetrix Ltd.
Description: RoHS Vision The Fast and Easy Method for Ensuring Compliance with Regulations for Hazardous Substances The Restriction of Hazardous Substances Directive (RoHS) restricts toxic metals in electrical and electronic equipment. Xenemetrix’s new RoHS Vision uses a high resolution detector, a
- Applications: CVD / PVD Films, Electroplated Films, Semiconductor Wafers
- Measurements: Composition
- Mounting / Loading: Floor Mounted / Stand-alone, Manual Loading
- Form Factor: Monitor / Instrument
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Supplier: Gems Sensors & Controls
Description: extends the packaging options via an all welded stainless steel back end for demanding submersible and industrial applications. The 2200 and the 2600 pressure transducers feature proven CVD sensing technology, an ASIC (amplified units), and modular packaging to provide a sensor line that can
- Working Pressure Range: 0 to 6,000 psi
- Accuracy: 0.25 ±% FS
- Operating Temperature: -40 to 260 F
- Measurement Type: Absolute, Compound, Gauge, Vacuum
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Supplier: EQYO
Description: Hydraulic Systems Swivels and Booms Downhole Applications Aerospace Manifold Gaskets Landing Gear Systems Braking Systems Flight Controls Electronics / Semiconductor Robotic Equipment CVD / DVD Chamber Precision Pumps Seals for Wet and Dry Wafer Fabrication Life Science Advanced
- O-ring Hardness (Durometer): 50 durometer
- Synthetic Rubbers: Fluoroelastomer (FKM)
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Supplier: DAS Environmental Expert GmbH
Description: Waste Gas Treatment with GIANT (burn/wet)at the Point-Of-Use Process Waste Gas Treatment with GIANT GIANT was specifically developed for treating the larger amounts of waste gases from CVD processes in the photovoltaic and flat panel display (TFT/LCD) industries. Being part of the
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Description: Pyrolytic boron nitride is a grade of hexagonal boron nitride. It is produced by the chemical vapor deposition process to create its solid body and all the boron nitride crystals grow parallel to the surface on which the vapor is deposited. Due to the nature of the CVD process, PBN parts
- Features: Specialty Ceramic
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Supplier: Changchun Yutai Optics Co., Ltd.
Description: CVD ZnSe is the first choice of optical components for high power CO2 lasers to its wide transmission band and low absorption in the red portion of the visible spectrum. Zinc Selenide is transparent from 600 nm - 16 µm and is ideal for IR applications. It is well-suited for optical elements
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Supplier: WDI Wise Device Inc.
Description: from infrared (1064 nm) to deep ultraviolet (266 nm). This innovation facilitates efficient trimming of metals, silicon and ITO as well as open line repair, within a single piece of repair equipment. The MIC4 is fully compatible with the ATF4, ATF5, and LLC6 linear lens changer products which
- Applications: CVD / PVD Films, Electroplated Films, Flat Panel Displays, Optical Components, Packaged ICs / Ceramic Substrates, Photolithography / Patterning
- Measurements: Defects / ADC
- Mounting / Loading: Floor Mounted / Stand-alone, In-situ / System Mounted
- Form Factor: Monitor / Instrument
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Supplier: Rogue Valley Microdevices, Inc.
Description: facility contains processing equipment capable of volume manufacturing yet flexible enough to accommodate wafer sizes from 50mm to 200mm. We offer full Device Fabrication and Design services along with a variety of individual processes to support our growing network of satisfied customers.
- Materials: Ceramic, Compound Semiconductor, Glass, Quartz, SOI, Silicon
- Services: Design / Engineering, Pilot / Scale-Up, Production, Prototyping, R & D / Development
- Capabilities: Dielectric / CVD Thin Film, Metallization - PVD Thin Film, Oxidation / Doping
- Features: North America, Northwest US Only, Specialty / Other, United States Only
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Featured Products Top
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Kobe city booth 6M25 Shinko Seiki has series of hard film forming equipment and they are a leading company in the development and manufacturing of DLC coating equipment by CVD processing. Using an internally developed PIG plasma source, this system can form smooth (read more)
Browse Wafer and Thin Film Instrumentation Datasheets for Daitron Co., Ltd. -
Oriental Motor is pleased to introduce our latest driver added to our DC input stepper motor driver line up, the CVD RS-485 Communication type bi-polar drivers. The CVD driver is a compact standardized 24 VDC driver providing the lowest noise and vibration available through the fully (read more)
Browse Stepper Motors (rotary) Datasheets for Oriental Motor USA -
creation time by automatically controlling electromagnetic brakes and directly importing encoder information. Two connector type options are available. Product Line-up CVD4A-KED (Straight connector type) CVD4AR-KED (Right-Angle connector (read more)
Browse DC Motors Datasheets for Oriental Motor USA -
In semiconductor equipment manufacturing, engineers often face the challenge of finding materials that can withstand plasma corrosion, extreme temperatures, and demanding precision requirements. Traditional metals cannot deliver the necessary (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
Semiconductor wafer transfer robot systems Precision inspection and metrology equipment CVD and PVD process equipment (read more)
Browse Aluminum Oxide and Alumina Ceramics Datasheets for Fountyl Technologies Pte. Ltd. -
(mm? Coating Focus lens Laser Grade CVD ZnSe 12 25.4/38.1/50.8/ 63.5/ 76.2/ 101 (read more)
Browse Optical Lenses Datasheets for Changchun Yutai Optics Co., Ltd. -
for semiconductors as an example, the precision ceramic structural components provided by coorstek cover a series of products, such as special components for photolithography machine, special components for plasma etching equipment, special components for pvd/cvd, special components for ion (read more)
Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for 3X Ceramic Parts Company Limited -
. Industry applications: Ideal for gas/chemical delivery systems, accelerators, fusion research, and PVD/CVD/etch equipment. Additional benefits (read more)
Browse Metal Ring Seals Datasheets for Sonkit (Shanghai) Industry Technology Co., Ltd. -
, subsea compressors, electronic submersible pumps, flow meters Semiconductors for PVD/CVD/etch equipment and for gas/chemical delivery systems (read more)
Browse Metal Ring Seals Datasheets for Technetics Group -
Product Overview Used in plasma etch chambers, CVD systems, and ion implantation equipment for wafer clamping and lift-pin support during processing. Fountyl silicon carbide wafer pin chucks integrate the clamping surface and lift pins into a single high-purity sintered (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd.
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Capacitive Touch Using Only an ADC (CVD) (.pdf)
This application note describes a new hardware sensing method called Capacitive Voltage Divider (CVD) which uses no external components.
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CVD-5B Metal Hardening Process
Description and case studies of a proprietary metal hardening process involving diffusion of boron into a base metal to create a metallurgical shield that effectively counteracts abrasion and corrosion.
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Hydrogen Monitoring of CVD Process Tools
Hydrogen and the hazards of hydrogen leaks are present in many areas of semiconductor manufacturing facilities. While the basic need to continuously monitor hydrogen leaks is clear, the proper selection and placement of hydrogen sensors requires careful consideration. Hydrogen, the lightest of the
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Chemical Vapor Deposition (CVD) of Diamond-Like Coatings (.pdf)
This application relates to the chemical vapor deposition of a diamond-like nanocomposite material, sometimes referred to as DLC (Diamond-Like Coating). The coating has low friction properties combined with improved hardness and wear resistance. The film is deposited in a modified plasma assisted
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How to Ensure the Purity Synthetic Diamonds Created by Chemical Vapor Disposition
Synthetic diamonds are created and used all over the world, for similar applications as naturally occurring diamonds. Recently, the method of using chemical vapor deposition (CVD) to 'grow ' diamonds in laboratory conditions has become more common.
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How to Ensure the Purity of Synthetic Diamonds Created by Chemical Vapor Deposition
Synthetic diamonds are created and used all over the world, for similar applications as naturally occurring diamonds. Recently, the method of using chemical vapor deposition (CVD) to 'grow ' diamonds in laboratory conditions has become more common.
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What Is Pyrolytic Boron Nitride?
Pyrolytic BN or PBN is short for pyrolytic boron nitride. It is a type of hexagonal boron nitride created by the chemical vapor deposition (CVD) method, is also an extremely pure boron nitride that can reach more than 99.99%, covering almost no porosity.
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
Firm rolls CVD system for diamond semis sp3 Diamond Technologies Inc. has rolled out the Model 650, a hot-filament, CVD diamond deposition reactor. Synopsys, Magma court battle set to tip-off Monday After an extended war of words that has lasted for more than 18 months, the Synopsys-Magma patent
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Automated lot dispatching in semiconductor fabrication
Due to its unique placement at the back end of the production line, this CVD equipment set was observed to improperly dispatch lots thus affecting feeds to the back end constraints and jeopardizing overall factory output commitments.
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Introduction to Microfabrication 2nd Edition
Therefore, either most plasma and CVD equipment uses inert perfluorinated pump oils (Fomblin, Krytox), or else dry pumps are employed.
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Evaluation of the simultaneous use of Cp 2 VMe 2 and CpTiCl 2 N(SiMe 3 ) 2 as precursors to ceramic thin films containing titanium and vanadium: Towards titani...
Both precursors being air‐ and moisture‐sensitive, high‐purity CVD equipment was used to reduce oxycarbide formation.
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Development of a dual-stage virtual metrology architecture for TFT-LCD manufacturing
In stage I, the glass is deposited by a five-chamber CVD equipment .
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A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing
The CVD equipment parameter data and the associated data preprocess are introduced first.
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A new defect distribution metrology with a consistent discrete exponential formula and its applications
(a) SiO2 CVD equipment #1.
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A virtual metrology system based on least angle regression and statistical clustering
…target (deposition thickness objective), the equipment is composed of three separated chambers (A, B, and C) that exhibit different behaviors, and each chamber is divided into two sub-chambers (1 and 2) (the structure of the CVD equipment is shown in Figure…
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Thin film installations for production of flat panel displays
4.2 plasma CVD installations .