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Supplier: Advanced Energy Industries, Inc.
Description: competitive solutions The Litmas® Remote Plasma Source (RPS) system delivers high concentrations of reactive gas species to enable advanced fluorinated gas abatement. Its small-footprint, high-performance, ease-of-use, and low-cost-of-ownership solutions make it a wise
- Type: RF Plasma (ICP)
- Materials / Substrates: Semiconductors / Wafers
- Features: Specialty / Other
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Supplier: Advanced Energy Industries, Inc.
Description: competitive solutions The Litmas® Remote Plasma Source (RPS) system delivers high concentrations of reactive gas species to enable advanced fluorinated gas abatement. Its small-footprint, high-performance, ease-of-use, and low-cost-of-ownership solutions make it a wise
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Supplier: Saint-Gobain Coating Solutions
Description: has optimized the plasma gas injection & electrode shapes to enable users to meet a wide range of thermal spray requirements for optimal performance. Whether you require high powder feed rates, high deposition efficiency or high velocity, the ProPlasma HP spray gun meets your coating
- Options / Components: Applicator / Gun
- Equipment Type: Component / Subsystem
- Mounting: Machine / Reciprocator
- Type: Plasma Spray
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Description: Specifies safety and performance requirements for gas consoles intended to be used with combustible gases or oxygen. These gas consoles are designed to supply gases for use in arc welding, plasma cutting, gouging and allied processes in non-explosive atmospheres. They may be
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Supplier: Saint-Gobain Coating Solutions
Description: Saint-Gobain Coating Solutions designs & produces complete turnkey plasma spray systems, providing the integrated components that deliver maximum spray rates & deposition efficiency while significantly reducing energy consumption. The system features Saint-Gobain’s patented ProPlasma HP spray
- Equipment Type: Complete Machine
- Options / Components: Controller / Sensing System, Feeder / Metering Unit, Power Supply
- Mounting: Machine / Reciprocator
- Type: Plasma Spray
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Supplier: CSA Group
Description: ISO 17211:2015 describes the method for the sampling and determination of selenium compounds in both vapour phase and solid phase that are entrained in flue gases carried in stacks or ducts. The selenium content in flue gas is expressed as a mass concentration of elemental selenium in the
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Supplier: Plasma Etch, Inc.
Description: The generous aluminum chambers accommodates a properly sized active processing surface with our standard configurations having dual bays as few as 6 or as many as 24 plasma processing levels, each 24” by 18.” Our oxygen service vacuum pump and booster is equipped with a two point purge system
- Materials Processed: Compound Semiconductors / GaAs, Metal, Tungsten / Refractory Metal
- Type: Factory / Free Standing
- Features: Gas Control Unit, Integral Process Controller, Multiple Sources, Other
- Vacuum / Pressure Range: Medium (< 1, >10-3 torr)
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Supplier: Linde North America, Inc.
Description: Hydrogen (H2) is an odourless, colourless and tasteless gas that is produced through natural gas steam reforming or the electrolysis of water. Lighter than air, it burns with an invisible, clean (carbon-free and soot-free) flame. It is the only fuel gas that does not contain any
- Application / Function: Electronic and Semiconductor
- Product Form: Gas
- Industrial Gases: Hydrogen
- Supply Options: Other
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Supplier: PTB Sales, Inc.
Description: $8,800 ASTRONi AX7670 Remote Plasma Source: rated to 3.0 slm NF3 flow rate, remote source for reactive gas by generating atomic fluorine. ASTRONi data sheet.
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Supplier: SAE International
Description: Understanding the short-lived structure of the plasma that forms between the electrodes of a spark plug is crucial to the development of improved ignition models for SI engines. However, measuring the amount of energy deposited in the gas directly and non-intrusively is difficult, due
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Description: BN-AlN Ceramic is made by sintering Boron Nitride (BN) and Aluminum Nitride (AIN) powder. It has excellent electrical insulator, thermal conductivity, high strength, resistance to thermal shock, and strong resistance to halogen gas plasma, which is offers a wide range of applications,
- Specialty Ceramic Type: Boron Nitride
- Performance Features: Machinable
- Features: Other, Specialty Ceramic
- Shape / Form: Wafer / Substrate
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Supplier: SAE International
Description: conventional spark plug. These measurements were performed at the 7-BM beamline of the Advanced Photon Source at Argonne National Laboratory. The synchrotron x-ray source enables time-resolved measurements of the density change due to glow discharge in the spark gap with 153 ns
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Supplier: ESAB Welding and Cutting Products
Description: ESAB's m3 Plasma™ system takes plasma productivity to new heights. Now multiple plasma cutting and marking features are available in a single easy-to-use system. You can perform high speed plasma cutting, high precision cutting, plasma marking, thick-plate cutting,
- Duty Cycle: 1 %
- Output Current Range: 1 to 2 amps
- Equipment Type: Complete System
- Output Power Capability: DC Output
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Supplier: American Welding Society (AWS)
Description: This specification prescribes the requirements for classification of solid low-alloy steel electrodes and rods, composite stranded low-alloy steel electrodes and rods, and composite metal cored low-alloy steel electrodes and rods for gas shielded welding processes including gas metal
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Supplier: American Welding Society (AWS)
Description: This specification prescribes the requirements for classification of solid low-alloy steel electrodes and rods, composite stranded low-alloy steel electrodes and rods, and composite metal cored low-alloy steel electrodes and rods for gas shielded welding processes including gas metal
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Supplier: American Welding Society (AWS)
Description: This specification prescribes the requirements for classification of zirconium and zirconium alloy electrodes and rods for gas metal arc welding, gas tungsten arc welding, and plasma arc welding. The compositions specified for each classification represent the latest
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Supplier: American Welding Society (AWS)
Description: Presents comprehensive information on welding and related processes to include detailed information on arc welding power sources; shielded metal arc, gas tungsten arc, gas metal arc, flux cored arc, submerged arc, and plasma arc welding processes. Also included are
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Supplier: Precision Polymer Engineering Ltd.
Description: Nanofluor® Y75G is a highly fluorinated elastomer which incorporates relatively low levels of an advanced nanoparticle type filler system, producing a clean compound formulated for minimum particle generation. Nanofluor® Y75G has been tested in various plasma types and sources and
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Supplier: Gelest, Inc.
Description: Additional Properties Hydrolytic Sensitivity 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system required Application Plasma polymerization yields dry process photoresist.1 Intermediate for poly(methylsilane) precursor to silicon carbide.2
- Supply Options: Other
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Supplier: Bronkhorst USA
Description: the flow. Instead of using a control valve, the Coriolis flow meter can be combined with a gear pump, thus eliminating the need of pressurising the liquid source. Alternative to Thermal Gas Mass Flow Controllers Compared to traditional thermal MFCs, Coriolis based flow controllers
- Pipe Diameter: 0 to 0.5 inch
- Mass Flow Rate: 0.00011025 to 0.11025 lbs/min
- Operating Temperature: 32 to 158 F
- Operating Pressure: 0 to 1,450.377 psi
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Supplier: Bronkhorst USA
Description: the flow. Instead of using a control valve, the Coriolis flow meter can be combined with a gear pump, thus eliminating the need of pressurising the liquid source. Alternative to Thermal Gas Mass Flow Controllers Compared to traditional thermal MFCs, Coriolis based flow controllers
- Pipe Diameter: 0 to 0.5 inch
- Mass Flow Rate: 0.000003675 to 0.00735 lbs/min
- Operating Temperature: 32 to 158 F
- Operating Pressure: 0 to 2,900.754 psi
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Description: JSC œResearch Institute of Gas Discharge Devices œPLASMA manufactures a wide range of gas-discharge ion metal vapor lasers. He-Cd (Cd vapor) laser of our manufacture is a source of CW coherent violet (441.6 nm) and UV (325 and 354 nm) radiation. He-Cd lasers operate in
- Wavelength Range: 325 to 442 nm
- Laser Power: 5 to 150 milliwatts
- Laser Type: Helium Cadmium Lasers
- Features: Polarized Output
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Supplier: Ushio America, Inc.
Description: bring together the inherent advantages of a number of gas discharge sources into a single light source. The technology equates to a critical blending of rare gas and metal additives to derive, in a single source, many of the key properties and benefits of stand
- Lamp Power: 50 to 75 watts
- Rated Average Life: 1,000 hours
- Color Temperature: 7,800 K
- Mean Lumens: 750 lm
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Supplier: ASTM International
Description: beam (EB), or arc plasma energy sources. Feedstock typically comprises either powder or wire. Deposition typically occurs either under inert gas (arc systems or laser) or in vacuum (EB systems). Although these are the predominant methods employed in practice, the use of other
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Supplier: Deposition Sciences, Inc.
Description: target, they cause atoms or molecules to be ejected (sputtered). Due to the low gas pressure, the sputtered particles have a long mean free path length, and they stream away from the source and are deposited on the revolving substrates. In MicroDyn sputtering, a small amount of a
- Functional / Performance: Abrasion Resistant, Antireflective, Chemical Resistant, Dielectric, Heat Resistant / High Temperature, Reflective
- Industry: Aerospace, Automotive, Electronics, Government, Medical / Healthcare, Military Specification, OEM / Industrial
- Materials: Aluminum, Metal, Nickel / Nickel Alloys, Precious Metals, Titanium
- Capabilities: Hard Coating / Treatment, Material Selection / Design Assistance, Physical Vapor Deposition (PVD), Plasma Etching / Cleaning, Research & Development
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Supplier: SAE International
Description: may be described as hot-spot induced pre-ignition followed by deflagration which can induce detonation from another hot spot followed by high pressure oscillation. The sources of the hot spots which lead to pre-ignition (including oil films, deposits, gas-dynamics, etc.) may occur
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Supplier: Sentry Air Systems, Inc.
Description: gas, ammonia, aldehyde, and mercury) Typical Uses: Production welding (MIG, TIG, stick, plasma cutting) Grinding Powder weighing Some dust collection applications Chemical Fume Control
- Airflow: 765 SCFM
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Supplier: Sentry Air Systems, Inc.
Description: gas, ammonia, aldehyde, and mercury) Typical Uses: Production welding (MIG, TIG, stick, plasma cutting) Grinding Powder weighing Some dust collection applications Chemical Fume Control
- Airflow: 60 SCFM
- Minimum Particle Size Filtered: 0.3 µm
- Features: HEPA / ULPA Filters
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Supplier: Sentry Air Systems, Inc.
Description: Carbon Filters (4) 42 lb Specialty Blended Filter Media (acid gas, ammonia, aldehyde, and mercury) Typical Uses: Welding (MIG, TIG, stick, plasma cutting) Grinding Powder weighing Some dust collection applications Classroom settings Soldering and brazing stations
- Airflow: 350 SCFM
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Supplier: Sentry Air Systems, Inc.
Description: Carbon Filters (4) 42 lb Specialty Blended Filter Media (acid gas, ammonia, aldehyde, and mercury) Typical Uses: Welding (MIG, TIG, stick, plasma cutting) Grinding Powder weighing Some dust collection applications Classroom settings Soldering and brazing stations
- Airflow: 455 SCFM
- Minimum Particle Size Filtered: 0.3 µm
- Features: HEPA / ULPA Filters
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Supplier: Northrop Grumman Corporation
Description: universe. Black holes, intense gravitational fields resulting from the death of massive stars, produce some of the most intense X-ray sources in the universe. As stars collapse upon themselves they pull in everything around them - including light. The Chandra X-ray Observatory can measure the
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Supplier: CSA Group
Description: atmosphere. In rare special cases, direct laser induced breakdown of the gas at the focus of a strong beam, producing plasma and a shock wave both eventually acting as ignition source. These processes can be supported by a solid material close to the breakdown point. Note 1: See
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Supplier: UL Standards & Engagement
Description: or without galvanic isolation) or powered by batteries: - with continuous divergent light sources (for all EPLs), - with LED light sources (for EPL Gc or Dc only). NOTE 2 Continuous divergent LED light sources for other than EPL Gc or Dc are not excluded from the standard due to
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Description: facial cleaning appliances; – micro-needling appliances; – plasma pens. Appliances covered by this standard can incorporate vapour-producing devices or spray-producing devices. This standard deals with the common hazards presented by appliances that are encountered by all persons. However, in
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Supplier: Shanghai Optics
Description: optical coatings. These methods include plasma sputtering, ion beam sputtering, atomic layer deposition, and evaporative deposition. Ion beam sputtering and atomic layer deposition provide the highest spectral performance, high durability and high repeatability; but the manufacturing process
- Coating: Antireflection, Beamsplitter, Dielectric, High-Reflector, Mirror
- Features: Canada Only, East Asia / Pacific Only, North America, Northeast US Only, Southwest US Only, United States Only
- Materials: Crystal, Glass, Metal
- Wavelength Range: IR, UV, Visible
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Why Engineers Choose BN Ion source equipment operates in extremely demanding conditions: – kV-level high voltage – High operating temperature – Continuous plasma exposure – High vacuum – Corrosive gases such as O?, F?, and Cl (read more)
Browse Industrial Ceramic Materials Datasheets for Xiamen Innovacera Advanced Materials Co., Ltd. -
temperature and must be considered carefully against specific applications. CVD silicon carbide has been used for many years in semiconductor processing applications, where excellent thermal shock resistance and resistance to erosion by high-energy plasmas are required. CVD properties can benefit (read more)
Browse Ultra-hard Materials Machining Datasheets for Insaco, Inc. -
deposition method: the volatile compounds of aluminum react with nitrogen or ammonia to precipitate aluminum nitride powder from the gas phase; According to different aluminum sources, it can be divided into inorganic (aluminum halide) and organic (alkyl aluminum) chemical vapor deposition (read more)
Browse Industrial Ceramic Materials Datasheets for 3X Ceramic Parts Company Limited
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Atmospheric Plasma Analysis by Molecular Beam Mass Spectrometry (.pdf)
, it is important to know the energy and identity of the impinging species. Atmospheric discharges from a number of gas mixtures have been studied using a Hiden EQP mass/energy analyser. The discharges were generated by a radio frequency driven atmospheric plasma source and sampled using a multi-stage
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Indicates content that may require registration and/or purchase.
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Prospects for granular x-ray lithography sources
For the case of gas plasma sources , this factor should be replaced by the transmission of the gas at the appropriate pressure.
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Generation of low-temperature plasma by low-pressure arcs for synthesis of nitride coatings
Plasma was produced with two plasma sources: a DI-100 arc evaporator [13, 16] operating based on a cathode spot arc and the PINK gas plasma source operating based on a non-self-sustained arc with a hot filament, hollow cathode [11–13].
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A comparison of gas temperatures measured by ultraviolet laser scattering in atmospheric plasma sources
…Richardson Grating Laborator) [20] Herzberg G 1989 Molecular Spectra and Molecular Structure I. Spectra of Diatomic Molecules (Malabar, FL: Krieger) [21] Staack D, Farouk B, Gutsol A and Fridman A 2008 DC normal glow discharges in atmospheric pressure atomic and molecular gases Plasma Sources Sci. Technol. 17 025013 .
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Materials modification using intense ion beams
Another active diode system with a gas plasma source and constant B-flux in the A–K gap has been developed at NPI Fig. 3.
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Characteristics Of A Gas-Puff Z-Pinch Plasma X-Ray Source
(a) Lxposed by Mo target electron impact source (b) Exposed by Ne gas plasma source 2pm U on mask contrast.
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X-ray lithography, where it is now, and where it is going
In spite of the above limitations, laser generated plasma sources appear to have a better chance of success than puff gas plasma sources for x-ray li- thography applications.
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Review on VUV to MIR absorption spectroscopy of atmospheric pressure plasma jets
…jet’s shielding gas impact on bacterial inactivation Biointerphases 10 029506 [223] Schmidt-Bleker A, Norberg S A, Winter J, Johnsen E, Reuter S, Weltmann K and Kushner M J 2015 Propagation mechanisms of guided streamers in plasma jets: the influence of electronegativity of the surrounding gas Plasma Sources Sci. Technol. (Provisionally scheduled…
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Non-thermal plasmas in and in contact with liquids
D: Appl. Phys. 39 3805–13 [144] Staack D, Farouk B, Gutsol A and Fridman A 2008 Dc normal glow discharges in atmospheric pressure atomic and molecular gases Plasma Sources Sci. Technol. 17 025013 .
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Free-standing microwave excited plasma beam
Plasmas 8 836–45 [32] Berndt J, Makasheva K, Schl¨uter H and Shivarova A 2002 Diffusion-controlled regime of surface-wave produced plasmas in helium gas Plasma Sources Sci. Technol. 11 208–17 [33] Berndt J, Makasheva K, Schl¨uter H and Shivarova A 2002…
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An inverse pinch plasma source for plasma opening switches
[23] J. J. Moschella, R. C. Hazelton, C. Vidoli, E. J. Yadlowsky, B. V. Weber, D. C. Black, D. D. Hinshelwood, B. Moosmann, and S. J. Stephanakis, “POS experiments on hawk using an inverse pinch gas plasma source ,” in Proc. 12th…