Ion Implantation and Synthesis of Materials

The p-n junction, located at the juncture between p-type and n-type material, is the basic building block for semiconductor devices. At the transition between n- and p-type materials, a potential gradient is formed to separate the regions with high and low electron and hole concentrations.
A piece of Si with joined n-type and p-type regions, each with 10 16 donors or acceptors, is shown in Fig. 9.1. In thermal equilibrium, the Fermi level, E F, is constant across the transition from n- to p-type materials. The magnitude of the difference between conduction band edges (i.e., the barrier height eV 0) is given by
| (9.1) | |
For semiconductors at room temperature ( kT ~ 0.025 eV) with 10 16 carriers cm -3 and densities of states N c and N v equal to 10 19 cm -3, the values of ( E c - E f) n and ( E f - E v) p are...