Ion Implantation and Synthesis of Materials

Chapter 9: Doping, Diffusion and Defects in Ion-Implanted Si

9.1 Junctions and Transistors

The p-n junction, located at the juncture between p-type and n-type material, is the basic building block for semiconductor devices. At the transition between n- and p-type materials, a potential gradient is formed to separate the regions with high and low electron and hole concentrations.

A piece of Si with joined n-type and p-type regions, each with 10 16 donors or acceptors, is shown in Fig. 9.1. In thermal equilibrium, the Fermi level, E F, is constant across the transition from n- to p-type materials. The magnitude of the difference between conduction band edges (i.e., the barrier height eV 0) is given by

(9.1)

Figure 9.1: Schematic of a p n junction with an abrupt change in doping from N D = 10 16 donors cm -3 to N A = 10 16 acceptors cm -3 for the symmetrical step junction. The energy level and carrier concentration versus distance are shown for the transition from n- to p-type. The shaded area shows the extent of the depletion region for a junction potential of V 0 volts

For semiconductors at room temperature ( kT ~ 0.025 eV) with 10 16 carriers cm -3 and densities of states N c and N v equal to 10 19 cm -3, the values of ( E c - E f) n and ( E f - E v) p are...

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