Gas Mixture Industrial Gases

BTEX Gas Mix
from Restek

Our high-quality air monitoring gas calibration standards are provided by Spectra/Linde and Scott/Air Liquide —meeting lab requirements for two separate sources of calibration standards. [See More]

  • Composition: Mixture
  • Application / Function: Calibration Gas / Gas Standard
  • Industrial Gases: Benzene (71-43-2), Ethylbenzene (100-41-4), Toluene (108-88-3), m-Xylene (108-38-3), o-Xylene (95-47-6), p-Xylene (106-42-3)
  • Product Form: Bulk Gaseous
Aerobic Gas Mixtures | Carbon Dioxide 2.5%, Oxygen 21%, Nitrogen 76.5% -- 611800
from Linde North America, Inc.

Linde has been a quality supplier of Medical Gases, mixtures and equipment for over 50 years. Linde supplies a full line of gases for therapy, calibration, biological culture growth and various diagnostic testing requirements. Our wide range of medical gases and mixtures encompasses both in vivo... [See More]

  • Composition: Mixture
  • Application / Function: Pharmaceutical / Medical
  • Industrial Gases: Nitrogen; Oxygen; Carbon dioxide
  • Concentration: 2.5 to 76.5
Natural Gas Standard #1
from Restek

Available in three mixes, from lean to rich. Each has an extended list of C6+ components. [See More]

  • Composition: Mixture
  • Application / Function: Calibration Gas / Gas Standard
  • Industrial Gases: Nitrogen; Carbon dioxide; Butane; Ethane; Methane; Propane; Isopentane, N-Pentane, Hexanes plus
  • Concentration: 0.1000 to 94.75
Excimer Laser Gases -- Fluorine Excimer
from Linde North America, Inc.

Excimer lasers are multi-gas lasers. Output wavelength is a function of the rare gas / halogen combination. Excimer is the name of the rare gas / halide molecule. There are four wavelengths (spectral lines) that can be generated from fluorine laser gas mixtures. [See More]

  • Composition: Mixture
  • Application / Function: Laser
  • Industrial Gases: Fluorine
  • Concentration: 1
Sulfur 5-Component Mix
from Restek

6-month stability. +/- 10% accuracy. [See More]

  • Composition: Mixture
  • Application / Function: Calibration Gas / Gas Standard
  • Industrial Gases: Carbonyl sulfide, Dimethyl sulfide, Ethyl mercaptan, Hydrogen sulfide, Methyl mercaptan
  • Product Form: Bulk Gaseous
LASERLINE Gas Mixutres For Carbon Dioxide Laser, LASERMIX 201 -- 5236
from Linde North America, Inc.

The LASERLINE ® concept of high purity gas products and comprehensive services, applications know-how along with cost efficient gas supply options forms the basis for customized solutions that maximize productivity. LASERLINE includes laser cutting oxygen which enables high cutting speeds in... [See More]

  • Composition: Mixture
  • Application / Function: Laser
  • Industrial Gases: Carbon dioxide
  • Concentration: 10 to 90
SPECTRA Cymer Argon Fluoride Mixtures
from Linde North America, Inc.

Argon fluoride gas mixtures are used in 193 nm lithography applications, usually in conjunction with an inert gas mixture. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements . SPC/SQC production systems ensure product... [See More]

  • Composition: Mixture
  • Application / Function: Specialty Application; Lithography
  • Industrial Gases: Argon Flouride
  • Product Form: Bulk Gaseous
SPECTRA Cymer Argon Xenon Neon Mixtures
from Linde North America, Inc.

Argon xenon neon gas mixtures are used in 193 nm lithography applications, usually in conjunction with a halogen gas mixture. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements. SPC/SQC production systems ensure product... [See More]

  • Composition: Mixture
SPECTRA Gigaphoton Argon Fluoride Mixtures
from Linde North America, Inc.

Argon fluoride gas mixtures are used in 193 nm lithography applications, usually in conjunction with an inert gas mixture. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements . SPC/SQC production systems ensure product... [See More]

  • Composition: Mixture
SPECTRA Gigaphoton Argon Xenon Neon Mixtures
from Linde North America, Inc.

Argon xenon neon gas mixtures are used in 193 nm lithography applications, usually in conjunction with a halogen gas mixture. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements. SPC/SQC production systems ensure product... [See More]

  • Composition: Mixture
SPECTRA Hybrid Argon Fluoride Mixtures
from Linde North America, Inc.

Argon xenon neon mixture that meets all OEM specifications. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements. SPC/SQC production systems ensure product consistency and reliability of finished material. Comprehensive global... [See More]

  • Composition: Mixture
SPECTRA Hybrid Argon Xenon Neon Mixtures
from Linde North America, Inc.

Argon xenon neon mixture that meets all OEM specifications. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements. SPC/SQC production systems ensure product consistency and reliability of finished material. Comprehensive global... [See More]

  • Composition: Mixture
SPECTRA Krypton Fluoride Mixtures
from Linde North America, Inc.

Krypton fluoride mixtures are used in 248 nm lithography applications, usually in conjunction with an inert gas mixture. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements . SPC/SQC production systems ensure product... [See More]

  • Composition: Mixture
SPECTRA Krypton Neon Mixtures
from Linde North America, Inc.

Krypton neon mixtures are used in 248 nm lithography applications, usually in conjunction with a halogen gas mixture. Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the industry requirements. SPC/SQC production systems ensure product consistency... [See More]

  • Composition: Mixture
SPECTRA Lithography Gases
from Linde North America, Inc.

For over twenty years, the excimer laser industry has relied on our SPECTRA ™ lithography gases. SPECTRA gases were used in the development of the earliest lasers for lithography and are now the most widely used excimer gases for DUV photolithography in the semiconductor industry. Lasers in... [See More]

  • Composition: Mixture
  • Product Form: Bulk Gaseous
  • Application / Function: Specialty Application; Lithography
  • Supply Options: Cylinder Gaseous