IC Mask Design: Essential Layout Techniques

IC Mask Design Essential Layout Techniques

Christopher Saint
Judy Saint

McGraw-Hill
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Cataloging-in-Publication Data is on file with the Library of Congress

Copyright (c) 2002 by Christopher Saint and Judy Saint.

All rights reserved. Printed in
the United States of America. Except as permitted under the United States Copyright
Act of 1976, no part of this publication may be reproduced or distributed in any form
or by any means, or stored in a data base or retrieval system, without the prior written
permission of the publisher.

2 3 4 5 6 7 8 9 0 DOC/DOC 0 8 7 6 5 4

ISBN 0-07-138996-2

The sponsoring editor for this book was Stephen S. Chapman, the editing supervisor
was Stephen M. Smith, and the production supervisor was Sherri Souffrance. It was
set in Times Roman by TopDesk Publishers' Group.

Printed and bound by R. R. Donnelley & Sons Company.

McGraw-Hill books are available at special quantity discounts to use as premiums
and sales promotions, or for use in corporate training programs. For more informa
tion, please write to the Director of Special Sales, McGraw-Hill Professional, Two
Penn Plaza, New York, NY 10121-2298. Or contact your local bookstore.

This book is printed on recycled, acid-free paper containing a minimum of
50% recycled,...

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