Chemical Vapor Deposition (CVD) Thin Film Equipment
from EBARA Technologies, Inc.
Gas Inlet Devices. Patent gas inlet devices minimize rate of restriction and automatic gas inlet plunger removes restrictions without process interruptions. Second Scrubbing Chamber. Five fine spray, high velocity nozzles ensures effective removal of impurities. First Scrubbing Chamber. Coarse... [See More]
- Process: Chemical Vapor Deposition
- Applications: Semiconductors
- Type: Free Standing System; Cluster Tool
- Materials Processed: Tungsten; Metal; Silicon; Polymer; Nitrides