Chemical / Corrosive Gas High Vacuum Pumps

STP Turbomolecular Pump -- STP301C
from Edwards Vacuum

Edwards STP301 is for use in electron microscopes and semiconductor applications. Edwards rotor technology gives class-leading performance for maximum process flexibility. The STP301 has been approved for use by major equipment manufacturers in the scientific instrument, semiconductor and magnetic... [See More]

  • Application: Industrial; Chemical; Semiconductor; Ultrahigh Vacuum Applications
  • Ultimate Vacuum: 7.50E-9 to 4.88E-8
  • Configuration: Individual Vacuum Pump
  • Pumping Speed: 636
STP-XA Turbomolecular Pump -- STP-XA2703C
from Edwards Vacuum

The STP-XA2703C turbo pump offers high performance in the process range of high vacuum to 2300 sccm process flow with enhanced throughput for all gases. This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes,... [See More]

  • Application: Industrial; Chemical; Semiconductor; Ultrahigh Vacuum Applications
  • Ultimate Vacuum: 7.50E-8
  • Configuration: Individual Vacuum Pump
  • Pumping Speed: 4344 to 5615
STP-XA Turbomolecular Pump -- STP-XA3203C
from Edwards Vacuum

The STP-XA3203C turbo pump offers high performance in the process range of high vacuum to 2300 sccm process flow with enhanced throughput for all gases. This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes,... [See More]

  • Application: Industrial; Chemical; Semiconductor; Ultrahigh Vacuum Applications
  • Ultimate Vacuum: 7.50E-8
  • Configuration: Individual Vacuum Pump
  • Pumping Speed: 4873 to 6780