Etching - Plasma / Wet Wafer and Thin Film Instrumentation
from Advanced Energy Industries, Inc.
Litmas is an all-in-one remote plasma source combining the power supply, LitmasMatch ™ matching network, and plasma chamber into one compact chassis. Small-footprint point-of-use abatement solution. Highly reliable, effective abatement with minimum utilities usage. Lower cost of ownership than... [See More]
- Applications: Wafer; Photolithography; Etching
- Mounting / Loading: Floor
- Form Factor: Controller
from Hitachi High Technologies America, Inc.
Next generation devices at 20nm and below require double-patterning, 3D (three-dimensional) structures, and complex, high-precision processes that include protective layer formation and finishing techniques for new materials. Hitachi High-Tech developed the Conductor Etch System 9000 Series to... [See More]
- Applications: Etching
- Mounting / Loading: Floor
from Hiden Analytical
The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia. [See More]
- Applications: Etching; Ion/Electron Collection, Ion Flux
- Mounting / Loading: In-process, in-situ or system mounted
- Form Factor: Controller; ProbingSystem
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
from Hitachi High Technologies America, Inc.
Conductor Etch System M-600/6000 Series is targeted for deep silicon trench etch of power devices used in mobile systems, home electrical appliances, automobiles, trains, etc. Low temperature etch technology and TM (Time Modulation) bias technology together with the ECR (Electron Cyclotron... [See More]
- Applications: Etching
- Mounting / Loading: Floor
from Hiden Analytical
The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies. [See More]
- Applications: Optical components or lenses; Etching
- Mounting / Loading: In-process, in-situ or system mounted
- Form Factor: Monitor or instrument; Controller
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
from Hitachi High Technologies America, Inc.
Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate through JDP (Joint Development Program) with device... [See More]
- Applications: Etching
- Mounting / Loading: Floor
from Hiden Analytical
The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes. [See More]
- Applications: Optical components or lenses; Etching
- Mounting / Loading: In-process, in-situ or system mounted
- Form Factor: Monitor or instrument; Controller
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)