Spectroscopic System Wafer and Thin Film Instrumentation

20 Results
EDXRF Analyzer -- EX-6600 SDD
from Xenemetrix Ltd.

EX-6600 SDD. Secondary Target EDXRF. Xenemetrix ’s EX-6600 SDD Energy Dispersive X-ray Fluorescence (EDXRF) spectrometer offers the ultimate in sensitivity and selectivity. The Silicon Drift Detector (SDD) simultaneously delivers lower electronic noise and higher count rates which translates... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF
  • Mounting / Loading: Manual loading; Floor
  • Applications: Wafer; CVD / PVD; Electroplate
In-line, Simultaneous WDXRF Spectrometer -- WaferX 300
from Rigaku Corporation

Rigaku's WaferX 300 represents the culmination of 25 years of experience in the X-ray fluorescence analysis of thin films on silicon wafers. Specifically developed as an in-process metrology tool, the system incorporates "bridge tool" technology — servicing 6", 8", as well as the latest 12"... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); WDXRF
  • Mounting / Loading: Floor
  • Applications: Wafer
Advanced Langmuir Probe -- ESPion
from Hiden Analytical

The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia. [See More]

  • Form Factor: Controller; ProbingSystem
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Etching; Ion/Electron Collection, Ion Flux
Automated Cassette-to-Cassette Thin Film Thickness Mapping System -- F60-c Series
from Filmetrics, Inc.

Automated Cassette-to-Cassette Thin-Film Thickness Mapping System for Production Environments. The Filmetrics F60-c family maps film thickness and index just like our F50 products, but it also includes a number of features intended specifically for production environments. These include automatic... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD
EDXRF Analyzer -- RoHS Vision
from Xenemetrix Ltd.

RoHS Vision. The Fast and Easy Method for Ensuring Compliance. with Regulations for Hazardous Substances. The Restriction of Hazardous Substances Directive (RoHS) restricts toxic metals in electrical and electronic equipment. Xenemetrix ’s new RoHS Vision uses a high resolution detector, a... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF
  • Mounting / Loading: Manual loading; Floor
  • Applications: Wafer; CVD / PVD; Electroplate
Simultaneous WDXRF Spectrometer -- WDA-3650
from Rigaku Corporation

The WDA-3650 X-ray fluorescence spectrometer for thin film evaluation continues Rigaku's 30-year history of XRF wafer analyzers that has mirrored the history of thin film device development. This latest XRF metrology tool contributes significantly to the process control of metal film thickness, film... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); WDXRF
  • Mounting / Loading: Floor
  • Applications: Wafer
ICP Plasma Workstation with EQP -- ICP
from Hiden Analytical

The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies. [See More]

  • Form Factor: Monitor or instrument; Controller
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Optical components or lenses; Etching
Automated Film Thickness Mapping Machine -- F50 Series
from Filmetrics, Inc.

Automated Film Thickness Mapping. The Filmetrics F50 family of products can map film thickness as quickly as two points per second. A motorized R-Theta stage accepts standard and custom chucks for samples up to 450mm in diameter. Map patterns can be polar, rectangular, or linear, or you can create... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD
EDXRF Analyzer -- S-Mobile SDD
from Xenemetrix Ltd.

S-Mobile SDD. Brings the power of laboratory spectrometer to the field. A small compact analyzer that can be taken to the job site. When the task calls for fast real time high quality results the S-Mobile meets the job description perfectly. This instrument features Silicon Drift Detector which... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF
  • Mounting / Loading: Manual loading; Floor
  • Applications: CVD / PVD; Electroplate
IG20 5 KeV Argon or Oxygen Ion Source for UHV Surface Analysis -- IG20
from Hiden Analytical

Static and Dynamic SIMSAuger Electron SpectroscopyIon Beam SputteringSurface Science StudiesRastering / Depth Profiling [See More]

  • Form Factor: Ion Beam Gun
  • Technology: FIB; Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD
Automated Film Thickness Mapping Machine -- F60-t Series
from Filmetrics, Inc.

Automated Thickess Mapping for Production Environments. The Filmetrics F60-t family maps film thickness and index just like our F50 products, but it also includes a number of features intended specifically for production environments. These include automatic notch finding, automatic on-board... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD
EDXRF Analyzer -- S-Mobile ULS
from Xenemetrix Ltd.

S-Mobile ULS. Brings the power of laboratory spectrometer to the field. This portable analyzer is specially adapted for Ultra Low Sulfur applications. Complies with the latest and most severe international standard methods for low sulfur concentration levels analysis: ASTM D7212, D4294 and ISO... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF
  • Mounting / Loading: Manual loading; Floor
  • Applications: CVD / PVD; Electroplate
IG5C 5KeV Caesium Ion Source for UHV Surface Analysis -- IG5C
from Hiden Analytical

Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package. [See More]

  • Form Factor: Ion Beam Gun
  • Technology: FIB; Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD
Microscopic Spot Measurement Instrument -- F40 Series
from Filmetrics, Inc.

Turn Your Microscope into a Film Thickness Measurement Tool. The F40 product family is for applications that require a spot size as small as 1 micron. For most microscopes the F40 simply attaches to the c-mount adapter, which is the industry standard for video camera mounting. The F40 comes complete... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD
EDXRF Analyzer -- X-Calibur SDD
from Xenemetrix Ltd.

X-Calibur SDD. Bench Top EDXRF Spectrometer. versatile, high energy resolution. Our X-Calibur SDD EDXRF spectrometer features similar configuration like X-Calibur but with Silicon Drift Detector. Thanks to SDD high count rates the instrument improves its response time thus minimizing down time. The... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF
  • Mounting / Loading: Manual loading; Floor
  • Applications: Wafer; CVD / PVD; Electroplate
Mass and Energy Analyzer -- EQP
from Hiden Analytical

The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes. [See More]

  • Form Factor: Monitor or instrument; Controller
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Optical components or lenses; Etching
Microscopic Spot Measurement Instrument -- F40-NSR
from Filmetrics, Inc.

Boost the Capabilities and Extend the Life of Your NanoSpec ™ 180/210 System. Your NanoSpec ™ has been a workhorse for your fab, but many years of use may have caused maintenance costs to balloon. The F40-NSR converts your NanoSpec ™ 180/210 into a modern-day measurement instrument... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD
EDXRF Analyzer -- X-Cite
from Xenemetrix Ltd.

X-Cite. Bench Top EDXRF Spectrometer. economical, accurate, easy to use. Xenemetrix ’s powerful X-Cite benchtop Energy Dispersive X-ray Fluorescence (EDXRF) spectrometer enables system operators to identify the elemental composition of samples. The analyzer performs non-destructive qualitative... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF
  • Mounting / Loading: Manual loading; Floor
  • Applications: Wafer; CVD / PVD; Electroplate
Mass and Energy Analyzer -- PSM
from Hiden Analytical

The PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process. [See More]

  • Form Factor: Monitor or instrument; Controller
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Ion Beam Etching, Plasma Deposition
Microscopic Spot Measurement Instrument -- F40-UV Series
from Filmetrics, Inc.

Measure Films as Thin as 4nm. The F40-UV can be configured to measure films as thin as 4nm on a spot size as small as 7 microns. It comes complete with its own UV microscope and integrated color video camera that allows exact monitoring of the film thickness measurement spot. Thickness and index can... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD