Optical Components Wafer and Thin Film Instrumentation
from Hiden Analytical
The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies. [See More]
- Applications: Optical components or lenses; Etching
- Mounting / Loading: In-process, in-situ or system mounted
- Form Factor: Monitor or instrument; Controller
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
from WDI Wise Device Inc.
This is the only commercially available microscope guaranteeing transmission of more then 80% for all four YAG laser harmonics: 266, 355, 532, and 1064nm - without compromising the review channel fidelity. The MIC4 microscope is instrumental in laser repair of TFT arrays over the wavelength ranging... [See More]
- Applications: CVD / PVD; Electroplate; Flat panel display; Packaged IC or substrate; Optical components or lenses; Photolithography; PV Cell, Laser Micromachining, Photomask
- Mounting / Loading: In-process, in-situ or system mounted (optional feature); Floor (optional feature)
- Form Factor: Monitor or instrument
- Technology: Optical / Imaging
from Hiden Analytical
The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes. [See More]
- Applications: Optical components or lenses; Etching
- Mounting / Loading: In-process, in-situ or system mounted
- Form Factor: Monitor or instrument; Controller
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
from WDI Wise Device Inc.
The LSCM has the advantages of a confocal laser scanning microscope with the size and price of an IR camera. The combination of high contrast imaging, infrared capabilities, extremely small size and low cost enables many new applications. [See More]
- Applications: Wafer; CVD / PVD; Flat panel display; Packaged IC or substrate; Optical components or lenses; Photolithography
- Mounting / Loading: In-process, in-situ or system mounted
- Form Factor: Monitor or instrument
- Technology: Optical / Imaging