Controller Wafer and Thin Film Instrumentation
from Hiden Analytical
The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia. [See More]
- Form Factor: Controller; ProbingSystem
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Mounting / Loading: In-process, in-situ or system mounted
- Applications: Etching; Ion/Electron Collection, Ion Flux
from Advanced Energy Industries, Inc.
A field-proven solution for any dual-magnetron sputtering application with additional capabilities facilitating advanced process innovation. Achieve higher deposition rates with a more stable process through advanced ARC management. Tune your process with variable frequency and duty cycle. Tailor to... [See More]
- Form Factor: Controller
- Applications: Wafer; Magnetron Sputtering
- Mounting / Loading: Floor
from KEYENCE
SI-F Series Spectral Interference Displacement Meter. The SI-F Series Spectral Interference Displacement Meter specializes in super-high accuracy displacement measurement for thickness or position measurement or surface mapping. With resolution down to 1nm, the SI Series is able to see even the... [See More]
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Technology: Interferometer
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Applications: Wafer; Memory drive disc or head; Flat panel display; Packaged IC or substrate
from Hiden Analytical
The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies. [See More]
- Form Factor: Monitor or instrument; Controller
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Mounting / Loading: In-process, in-situ or system mounted
- Applications: Optical components or lenses; Etching
from Advanced Energy Industries, Inc.
Litmas is an all-in-one remote plasma source combining the power supply, LitmasMatch ™ matching network, and plasma chamber into one compact chassis. Small-footprint point-of-use abatement solution. Highly reliable, effective abatement with minimum utilities usage. Lower cost of ownership than... [See More]
- Form Factor: Controller
- Applications: Wafer; Photolithography; Etching
- Mounting / Loading: Floor
from KEYENCE
LT-9000 Surface Scanning Laser Confocal Sensor. The LT-9000 Surface Scanning Laser Confocal Displacement Meter excels in measuring micron-level defects or thicknesses without being affected by target color or angle. The confocal principle requires only that the light reflect off a surface and be... [See More]
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Technology: Confocal
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Applications: Wafer; Flat panel display; Packaged IC or substrate
from Hiden Analytical
The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes. [See More]
- Form Factor: Monitor or instrument; Controller
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Mounting / Loading: In-process, in-situ or system mounted
- Applications: Optical components or lenses; Etching
from KEYENCE
LK-G5000 High-Speed / High-Accuracy Laser Displacement Sensor. The LK-G5000 is a High-Speed 1D Laser Displacement Sensor for precision displacement measurement. With a sampling speed of 392 kHz, this sensor is able keep up with just about any inline process as well as account for vibration for... [See More]
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Technology: Laser Triangulation
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Applications: Wafer; Memory drive disc or head; Flat panel display; Packaged IC or substrate
from Hiden Analytical
The PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process. [See More]
- Form Factor: Monitor or instrument; Controller
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Mounting / Loading: In-process, in-situ or system mounted
- Applications: Ion Beam Etching, Plasma Deposition