In-situ / System Mounted Wafer and Thin Film Instrumentation
from Unitron Ltd.
Modular microscope system that readily adapts to instrumentation [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Optical / Imaging
- Form Factor: Mask Aligner
- Applications: Wafer
from Filmetrics, Inc.
Automated Cassette-to-Cassette Thin-Film Thickness Mapping System for Production Environments. The Filmetrics F60-c family maps film thickness and index just like our F50 products, but it also includes a number of features intended specifically for production environments. These include automatic... [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
- Form Factor: Monitor or instrument
- Applications: Wafer; CVD / PVD
from Imego
MERMAID is a unique measurement instrument for analysis of liquid and thin film properties using magnetoelastic resonance (MER) sensors. Dynamic events such as viscosity change, phase transitions or bio film growth can be analyzed. The MER sensor can measure properties of either a coating on top of... [See More]
- Mounting / Loading: In-process, in-situ or system mounted; Floor
- Technology: Quartz crystal microbalance; Magnetoelastic Resonance Sensors (MER)
- Form Factor: ProbingSystem; Sensor or sensing element
- Applications: CVD / PVD; Polymer or photoresist films; BioFilms
from WDI Wise Device Inc.
WDI's Laser Auto-Focus ATF6 sensor is an active optical device (incorporating a class II semiconductor laser) designed to provide focusing servo systems with fast feedback signals needed to quickly and accurately focus all types of infinity corrected microscopes. [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Optical / Imaging
- Form Factor: Sensor or sensing element
- Applications: Wafer; CVD / PVD; Flat panel display; Photolithography
from Hiden Analytical
The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia. [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Form Factor: Controller; ProbingSystem
- Applications: Etching; Ion/Electron Collection, Ion Flux
from StellarNet, Inc.
TF Systems for Non-Contact Film Thickness Measurements. We offer a complete line of film thickness measurement systems that can measure from 5 nm to 200 µm for analysis of single layer and/or multilayer films in less than a second. StellarNet thin film reflectometry systems consist of a portable USB... [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Reflectometer
- Form Factor: Monitor or instrument
- Applications: Wafer (optional feature); Memory drive disc or head (optional feature); CVD / PVD (optional feature); Flat panel display (optional feature); Optical components or lenses (optional feature); Polishing / CMP (optional feature); Polymer or photoresist films (optional feature); Thin-Film Photovoltaics
from KEYENCE
SI-F Series Spectral Interference Displacement Meter. The SI-F Series Spectral Interference Displacement Meter specializes in super-high accuracy displacement measurement for thickness or position measurement or surface mapping. With resolution down to 1nm, the SI Series is able to see even the... [See More]
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Technology: Interferometer
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Applications: Wafer; Memory drive disc or head; Flat panel display; Packaged IC or substrate
from Filmetrics, Inc.
Automated Film Thickness Mapping. The Filmetrics F50 family of products can map film thickness as quickly as two points per second. A motorized R-Theta stage accepts standard and custom chucks for samples up to 450mm in diameter. Map patterns can be polar, rectangular, or linear, or you can create... [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
- Form Factor: Monitor or instrument
- Applications: Wafer; CVD / PVD
from WDI Wise Device Inc.
The LSCM has the advantages of a confocal laser scanning microscope with the size and price of an IR camera. The combination of high contrast imaging, infrared capabilities, extremely small size and low cost enables many new applications. [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Optical / Imaging
- Form Factor: Monitor or instrument
- Applications: Wafer; CVD / PVD; Flat panel display; Packaged IC or substrate; Optical components or lenses; Photolithography
from Hiden Analytical
The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies. [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Form Factor: Monitor or instrument; Controller
- Applications: Optical components or lenses; Etching
from KEYENCE
LT-9000 Surface Scanning Laser Confocal Sensor. The LT-9000 Surface Scanning Laser Confocal Displacement Meter excels in measuring micron-level defects or thicknesses without being affected by target color or angle. The confocal principle requires only that the light reflect off a surface and be... [See More]
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Technology: Confocal
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Applications: Wafer; Flat panel display; Packaged IC or substrate
from Filmetrics, Inc.
Automated Thickess Mapping for Production Environments. The Filmetrics F60-t family maps film thickness and index just like our F50 products, but it also includes a number of features intended specifically for production environments. These include automatic notch finding, automatic on-board... [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
- Form Factor: Monitor or instrument
- Applications: Wafer; CVD / PVD
from WDI Wise Device Inc.
The LLC6 is a precise linear lens changer with 6 lens ports providing ultra fast, automatic lens changing without the need of re-qualifying the lens. It is the ideal tool for TFT-LCD and Photomask Inspection/Repair applications or other tasks where multiple optical magnifications are required. The... [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Applications: Wafer; Flat panel display
- Form Factor: Lens Changer
- Features: Noncontact; Non-destructive
from Hiden Analytical
Static and Dynamic SIMSAuger Electron SpectroscopyIon Beam SputteringSurface Science StudiesRastering / Depth Profiling [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: FIB; Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Form Factor: Ion Beam Gun
- Applications: Wafer; CVD / PVD
from KEYENCE
LK-G5000 High-Speed / High-Accuracy Laser Displacement Sensor. The LK-G5000 is a High-Speed 1D Laser Displacement Sensor for precision displacement measurement. With a sampling speed of 392 kHz, this sensor is able keep up with just about any inline process as well as account for vibration for... [See More]
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Technology: Laser Triangulation
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Applications: Wafer; Memory drive disc or head; Flat panel display; Packaged IC or substrate
from Filmetrics, Inc.
Turn Your Microscope into a Film Thickness Measurement Tool. The F40 product family is for applications that require a spot size as small as 1 micron. For most microscopes the F40 simply attaches to the c-mount adapter, which is the industry standard for video camera mounting. The F40 comes complete... [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
- Form Factor: Monitor or instrument
- Applications: Wafer; CVD / PVD
from Hiden Analytical
Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package. [See More]
- Mounting / Loading: In-process, in-situ or system mounted
- Technology: FIB; Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
- Form Factor: Ion Beam Gun
- Applications: Wafer; CVD / PVD