Reflectometer Wafer and Thin Film Instrumentation

4 Results
Process XRR, XRF, and XRD Metrology FAB Tool -- MFM65
from Rigaku Corporation

The Rigaku MFM65 performs high-precision measurements not possible by optical or ultrasonic techniques. This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks. The... [See More]

  • Technology: Reflectometer; X-ray Diffractometer; XRR, XRF, XRD
  • Mounting / Loading: Floor
  • Form Factor: Monitor or instrument
  • Applications: Wafer
Thin-Film Measuring Systems -- TF Series
from StellarNet, Inc.

TF Systems for Non-Contact Film Thickness Measurements. We offer a complete line of film thickness measurement systems that can measure from 5 nm to 200 µm for analysis of single layer and/or multilayer films in less than a second. StellarNet thin film reflectometry systems consist of a portable USB... [See More]

  • Technology: Reflectometer
  • Mounting / Loading: In-process, in-situ or system mounted
  • Form Factor: Monitor or instrument
  • Applications: Wafer (optional feature); Memory drive disc or head (optional feature); CVD / PVD (optional feature); Flat panel display (optional feature); Optical components or lenses (optional feature); Polishing / CMP (optional feature); Polymer or photoresist films (optional feature); Thin-Film Photovoltaics
Surface Contamination Metrology -- TXRF 3760
from Rigaku Corporation

TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3760 can measure elements from Na through U with a single-target, 3-beam X-ray system and a solid-state detector system. The TXRF 3760 includes Rigaku's patented XY θ... [See More]

  • Technology: Reflectometer; TXRF
  • Mounting / Loading: Floor
  • Form Factor: Monitor or instrument
  • Applications: Wafer
Surface Contamination Metrology -- TXRF 3800e
from Rigaku Corporation

TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3800e can measure elements from S through U with a single-target, dual-beam X-ray system and a new liquid nitrogen-free detector system. The TXRF 3800e includes Rigaku's patent... [See More]

  • Technology: Reflectometer; TXRF
  • Mounting / Loading: Floor
  • Form Factor: Monitor or instrument
  • Applications: Wafer