Particle Contamination Wafer and Thin Film Instrumentation
from Phenom-World BV
The Phenom Pro desktop SEM is one of the most advanced imaging models in the Phenom series. With its long-life high-brightness CeB6 electron source, the Phenom Pro creates state-of-the-art images with a minimum of user maintenance intervention. The backscattered-electron detector (BSED) and... [See More]
- Measurements: Composition; Defects, dimples or film residues; Critical dimensions or Trench geometry; Particle contamination; Roughness / Waviness; Area mapping
- Mounting / Loading: Manual loading
- Form Factor: Monitor or instrument
- Technology: FIB
from SemiProbe
SemiProbe IRIS inspection systems inspect, locate and identify defects created during wafer manufacturing, probing, bumping, dicing or general handling, providing microelectronic device manufacturers with accurate, timely quality assurance and process information. The IRIS inspection system has... [See More]
- Measurements: Defects, dimples or film residues; Device, gate or circuit electrical testing; Particle contamination; Area mapping
- Mounting / Loading: Manual loading
- Form Factor: ProbingSystem
- Technology: Optical / Imaging
from Rigaku Corporation
The Rigaku MFM65 performs high-precision measurements not possible by optical or ultrasonic techniques. This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks. The... [See More]
- Measurements: Composition; Particle contamination; FilmThickness; Roughness / Waviness
- Mounting / Loading: Floor
- Form Factor: Monitor or instrument
- Technology: Reflectometer; X-ray Diffractometer; XRR, XRF, XRD
from Phenom-World BV
The Phenom ProX desktop scanning electron microscope is the ultimate all-in-one imaging and X-ray analysis system. With the Phenom ProX desktop SEM, sample structures can be physically examined and their elemental composition determined. Viewing three-dimensional images of microscopic structures... [See More]
- Measurements: Composition; Defects, dimples or film residues; Critical dimensions or Trench geometry; Particle contamination; Roughness / Waviness; Area mapping
- Mounting / Loading: Manual loading
- Form Factor: Monitor or instrument
- Technology: FIB
from Rigaku Corporation
TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3760 can measure elements from Na through U with a single-target, 3-beam X-ray system and a solid-state detector system. The TXRF 3760 includes Rigaku's patented XY θ... [See More]
- Measurements: Particle contamination; Area mapping
- Mounting / Loading: Floor
- Form Factor: Monitor or instrument
- Technology: Reflectometer; TXRF
from Phenom-World BV
The Phenom Pure desktop SEM (scanning electron microscope) is an ideal tool for making the transition from working with a light microscope to operating an electron microscope. The Phenom Pure is equipped with the basic fundamentals for meeting imaging needs. The Phenom Pure provides high-quality... [See More]
- Measurements: Composition; Defects, dimples or film residues; Critical dimensions or Trench geometry; Particle contamination; Roughness / Waviness; Area mapping
- Mounting / Loading: Manual loading
- Form Factor: Monitor or instrument
- Technology: FIB
from Rigaku Corporation
TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3800e can measure elements from S through U with a single-target, dual-beam X-ray system and a new liquid nitrogen-free detector system. The TXRF 3800e includes Rigaku's patent... [See More]
- Measurements: Particle contamination; Area mapping
- Mounting / Loading: Floor
- Form Factor: Monitor or instrument
- Technology: Reflectometer; TXRF