Thickness - Film / Layer Wafer and Thin Film Instrumentation
from Imego
MERMAID is a unique measurement instrument for analysis of liquid and thin film properties using magnetoelastic resonance (MER) sensors. Dynamic events such as viscosity change, phase transitions or bio film growth can be analyzed. The MER sensor can measure properties of either a coating on top of... [See More]
- Measurements: Deposition rate; CMP, etching, process gas or plasma diagnostics; FilmThickness; Curing Rate
- Mounting / Loading: In-process, in-situ or system mounted; Floor
- Form Factor: ProbingSystem; Sensor or sensing element
- Technology: Quartz crystal microbalance; Magnetoelastic Resonance Sensors (MER)
from KEYENCE
SI-F Series Spectral Interference Displacement Meter. The SI-F Series Spectral Interference Displacement Meter specializes in super-high accuracy displacement measurement for thickness or position measurement or surface mapping. With resolution down to 1nm, the SI Series is able to see even the... [See More]
- Measurements: Flatness; FilmThickness
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Technology: Interferometer
from Rigaku Corporation
Rigaku's WaferX 300 represents the culmination of 25 years of experience in the X-ray fluorescence analysis of thin films on silicon wafers. Specifically developed as an in-process metrology tool, the system incorporates "bridge tool" technology — servicing 6", 8", as well as the latest 12"... [See More]
- Measurements: Composition; FilmThickness
- Mounting / Loading: Floor
- Form Factor: Monitor or instrument
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); WDXRF
from Filmetrics, Inc.
The Most Powerful Tool Available for Monitoring Thin-Film Deposition. Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system. Example Layers. MBE and MOCVD: Smooth and... [See More]
- Measurements: Deposition rate; Optical constants (n or k); FilmThickness
- Mounting / Loading: In-line
- Form Factor: Monitor or instrument
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
from WDI Wise Device Inc.
The LSCM has the advantages of a confocal laser scanning microscope with the size and price of an IR camera. The combination of high contrast imaging, infrared capabilities, extremely small size and low cost enables many new applications. [See More]
- Measurements: Defects, dimples or film residues; FilmThickness; Area mapping; Mask Alignment
- Mounting / Loading: In-process, in-situ or system mounted
- Form Factor: Monitor or instrument
- Technology: Optical / Imaging
from Nor-Cal Products, Inc. - The Vacuum Experts
Nor-Cal Products Deposition Monitors are used to measure the thin film (deposition) thicknesses, rate of deposition or frequency, in conjunction with the crystal sensor. Models are available which independently monitor 2 or 6 crystals. Included Windows software allows the user to change the monitor... [See More]
- Measurements: Deposition rate; FilmThickness
- Mounting / Loading: Floor
- Form Factor: Monitor or instrument
- Technology: Quartz crystal microbalance
from KEYENCE
LT-9000 Surface Scanning Laser Confocal Sensor. The LT-9000 Surface Scanning Laser Confocal Displacement Meter excels in measuring micron-level defects or thicknesses without being affected by target color or angle. The confocal principle requires only that the light reflect off a surface and be... [See More]
- Measurements: Flatness; FilmThickness
- Mounting / Loading: In-process, in-situ or system mounted; In-line; Floor
- Form Factor: Monitor or instrument; Controller; Sensor or sensing element
- Technology: Confocal
from Rigaku Corporation
The Rigaku MFM65 performs high-precision measurements not possible by optical or ultrasonic techniques. This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks. The... [See More]
- Measurements: Composition; Particle contamination; FilmThickness; Roughness / Waviness
- Mounting / Loading: Floor
- Form Factor: Monitor or instrument
- Technology: Reflectometer; X-ray Diffractometer; XRR, XRF, XRD
from Filmetrics, Inc.
Measure film thickness in-line and in real-time at up to seven locations with the F37. Example Layers. Almost any smooth and at-least-partially transparent films may be measured. This includes virtually any semiconducting material, including those used in thin-film photovoltaics. Example Layers. MBE... [See More]
- Measurements: Deposition rate; FilmThickness
- Mounting / Loading: In-line
- Form Factor: Monitor or instrument
- Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance